摘要:
A ultrasonic transducer of the invention comprises: a transducer cell including a first electrode and a second electrode disposed separated from the first electrode by an air gap portion; and an electret for applying a potential difference between the first electrode and the second electrode. The electret is disposed in a region where at least a part thereof does not overlap with the transducer cell when viewed from a transmitting direction of ultrasonic waves.
摘要:
An ultrasound transducer includes a substrate, an ultrasound transducer cell placed on one surface of the substrate and having a lower electrode, a first gap portion placed on the lower electrode and an upper electrode placed on the first gap portion, a first conductive layer placed on the other surface of the substrate and electrically connected to one of the lower electrode and the upper electrode, an electret film placed on the first conductive layer, an insulating layer placed on the electret film, and a second conductive layer placed on the insulating layer and electrically connected to the one of the lower electrode and the upper electrode not electrically connected to the first conductive layer.
摘要:
An ultrasound transducer includes a substrate and a lower electrode layer, a lower insulating layer, an upper insulating layer, and an upper electrode layer. The lower insulating layer and the upper insulating layer are arranged to be opposed to each other via an air gap section. The upper insulating layer and the lower insulating layer are different in a material and thickness and satisfy Equation 1 below. In Equation 1, K1 represents a relative dielectric constant of the lower insulating layer, K2 represents a relative dielectric constant of the upper insulating layer, T1 represents thickness of the lower insulating layer, T2 represents thickness of the upper insulating layer, ρ1(x) represents a charge density distribution in the lower insulating layer, and ρ2(y) represents a charge density distribution in the upper insulating layer. 1 K 1 ∫ 0 T 1 x × ρ 1 ( x ) x = 1 K 2 ∫ 0 T 2 y × ρ 2 ( y ) y ( Equation 1 )
摘要:
An ultrasonic transducer according to the present invention includes: two or more ultrasonic transducer cells, each of which has a lower electrode, a first insulating layer placed on the lower electrode, a cavity placed on the first insulating layer, a second insulating layer placed on the cavity, and an upper electrode placed above the second insulating layer; channels which communicate the cavities with each other; the second insulating layer placed on the channels; holes formed in the second insulating layer placed on the channels; and sealing portions which seal the holes, where that part of the sealing portions which enters the channels is the same in cross-sectional shape as the holes.
摘要:
A capacitive micromachined ultrasonic transducer (cMUT) device, comprising: a cMUT formed on a semiconductor substrate; a DC high-voltage generation unit that is provided on the semiconductor substrate and that is for generating a DC high-voltage signal to be superposed on a driving signal for the cMUT; a driving signal generation unit that is provided on the semiconductor substrate and that is for generating the driving signal; and a superposition unit that is provided on the semiconductor substrate and that is for branching the DC high-voltage signal output from the DC high-voltage generation unit and for superposing one of the branched DC high-voltage signals on the other of the branched DC high-voltage signals via the driving signal generation unit.
摘要:
An ultrasonic transducer according to the present invention includes: two or more ultrasonic transducer cells, each of which has a lower electrode, a first insulating layer placed on the lower electrode, a cavity placed on the first insulating layer, a second insulating layer placed on the cavity, and an upper electrode placed above the second insulating layer; channels which communicate the cavities with each other; the second insulating layer placed on the channels; holes formed in the second insulating layer placed on the channels; and sealing portions which seal the holes, where that part of the sealing portions which enters the channels is the same in cross-sectional shape as the holes.
摘要:
An ultrasonic transducer cell according to the present invention includes: a substrate; a charge holding portion provided on the substrate; a lower electrode provided on the charge holding portion and used to input and output a signal; and a vibration membrane provided above the lower electrode to be separated from the lower electrode with a cavity, and configured to include at least an insulating film and an upper electrode provided on the insulating film.
摘要:
A data signal loading circuit (i) which includes: a comparator CMP1 receiving clock signal CKP and reverse-phase signal CKN of clock signal CKP, and outputting clock signal CLP1 which is in phase with clock signal CKP, and clock signal CLN 1 having a reverse phase of clock signal CKP; a comparator CMP 2 having a non-inverting input terminal receiving clock signal CLP1, and an inverting input terminal receiving clock signal CLN1; and a comparator CMP3 having an inverting input terminal receiving clock signal CLP 1, and a non-inverting input terminal receiving clock signal CLN 1, and (ii) which, by using output signals CL1 and CL2 of the comparator CMP2 and the comparator CMP3 as clock signals for latch circuits L1 and L2, equalizes delay times for the rise or fall of clock signals CL1 and CL2 inputted to the latch circuits L1 and L2, and (iii) has low power consumption.
摘要:
A semiconductor circuit including an input terminal, an impedance converting portion configured to receive an input signal from the input terminal and to output an output signal corresponding to the input signal, an input impedance of the semiconductor circuit being higher than an output impedance of the semiconductor circuit, a detecting portion connected to a node between the input terminal and the impedance converting portion, and configured to detect whether the input signal is higher than a predetermined threshold, and a variable impedance connected to a reference voltage and the node, an impedance of the variable impedance configured to decrease after the input signal is detected as higher than the predetermined threshold.
摘要:
According to a method of manufacturing a semiconductor device, a short-circuit wiring is formed in a region on a wafer including a dicing region, and electrode pads for input and output signals of a plurality of devices disposed in a semiconductor device forming region are electrically short-circuited by the short-circuit wiring, so that occurrence of plasma damage is suppressed even if the wafer is subjected to various plasma processes. When the wafer subjected to the plasma processes is cut along the dicing region to separate a semiconductor device, the electrical short-circuit of the electrode pads by the short-circuit wiring is released, so that the functionally unwanted short-circuit of the devices or the like is appropriately released.