公开(公告)号：US10352875B2

公开(公告)日：2019-07-16

申请号：US13881593

申请日：2011-02-10

申请人： Kazuhiko Fukazawa ,  Yoshihiko Fujimori

发明人： Kazuhiko Fukazawa ,  Yoshihiko Fujimori

IPC分类号： G01N21/95 ,  G03F9/00 ,  G03F7/20 ,  H01L21/66

摘要： A surface inspection apparatus (1) has a stage (5) for supporting a wafer (10) on which predetermined patterns have been formed by exposure using an exposure device (100); an illumination system (20) for irradiating an illuminating light on the surface of the wafer (10) supported by the stage (5); an imaging device (35) for detecting light from the surface of the wafer (10) on which illuminating light has been irradiated, and outputting a detection signal; and an image processing unit (40) for determining the focus state during exposure, on the basis of the detection signal sent from the imaging device (35).

公开(公告)号：US09240356B2

公开(公告)日：2016-01-19

申请号：US13325195

申请日：2011-12-14

申请人： Kazuhiko Fukazawa ,  Yoshihiko Fujimori ,  Shinsuke Takeda

发明人： Kazuhiko Fukazawa ,  Yoshihiko Fujimori ,  Shinsuke Takeda

IPC分类号： H01L21/66 ,  G02B26/08 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20 ,  G01N21/94

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N2021/95615 ,  G02B26/0808 ,  G03F7/70341 ,  G03F7/70641 ,  G03F7/70783 ,  H01L22/12

摘要： A surface inspection apparatus includes: an irradiation unit; a detection unit configured to detect a first detection signal according to a first light beam and a second detection signal according to a second light beam; a providing unit which is configured to provide a first reference data and a second reference data; and a determination unit which is configured to determine a processing condition of the pattern in the substrate as an inspection object substrate, based on consistency between the first detection signal and the first reference data, and consistency between the second detection signal and the second reference data.

摘要翻译： 表面检查装置包括：照射单元; 检测单元，被配置为根据第二光束检测根据第一光束的第一检测信号和第二检测信号; 提供单元，被配置为提供第一参考数据和第二参考数据; 以及确定单元，其被配置为基于所述第一检测信号和所述第一参考数据之间的一致性以及所述第二检测信号和所述第二参考数据之间的一致性来确定所述基板中的图案的处理状况作为检查对象基板 。

公开(公告)号：US09196550B2

公开(公告)日：2015-11-24

申请号：US13325195

申请日：2011-12-14

申请人： Kazuhiko Fukazawa ,  Yoshihiko Fujimori ,  Shinsuke Takeda

发明人： Kazuhiko Fukazawa ,  Yoshihiko Fujimori ,  Shinsuke Takeda

IPC分类号： H01L21/66 ,  G02B26/08 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20 ,  G01N21/94

摘要： A surface inspection apparatus includes: an irradiation unit; a detection unit configured to detect a first detection signal according to a first light beam and a second detection signal according to a second light beam; a providing unit which is configured to provide a first reference data and a second reference data; and a determination unit which is configured to determine a processing condition of the pattern in the substrate as an inspection object substrate, based on consistency between the first detection signal and the first reference data, and consistency between the second detection signal and the second reference data.

公开(公告)号：US20130217154A1

公开(公告)日：2013-08-22

申请号：US13881593

申请日：2011-02-10

申请人： Kazuhiko Fukazawa ,  Yoshihiko Fujimori

发明人： Kazuhiko Fukazawa ,  Yoshihiko Fujimori

IPC分类号： G01N21/95

CPC分类号： G01N21/9501 ,  G03F7/70641 ,  G03F9/7026 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A surface inspection apparatus (1) has a stage (5) for supporting a wafer (10) on which predetermined patterns have been formed by exposure using an exposure device (100); an illumination system (20) for irradiating an illuminating light on the surface of the wafer (10) supported by the stage (5); an imaging device (35) for detecting light from the surface of the wafer (10) on which illuminating light has been irradiated, and outputting a detection signal; and an image processing unit (40) for determining the focus state during exposure, on the basis of the detection signal sent from the imaging device (35).

摘要翻译： 表面检查装置（1）具有用于通过使用曝光装置（100）通过曝光来支撑已经形成了预定图案的晶片（10）的台（5）; 照射系统（20），用于照射由所述台（5）支撑的所述晶片（10）的表面上的照明光; 用于检测来自已照射了照明光的晶片（10）的表面的光并输出检测信号的成像装置（35） 以及用于根据从成像装置（35）发送的检测信号来确定曝光期间的聚焦状态的图像处理单元（40）。

公开(公告)号：US08223328B2

公开(公告)日：2012-07-17

申请号：US13241029

申请日：2011-09-22

申请人： Kazuhiko Fukazawa

发明人： Kazuhiko Fukazawa

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  G01N2021/9513 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： A surface inspecting apparatus includes an illumination optical system irradiating linearly polarized light to a wafer surface under a plurality of inspection conditions; an imaging optical system capturing an image of the wafer formed by polarization components having an oscillation direction different from that of the linearly polarized light as part of reflected light from the wafer surface irradiated by the linearly polarized light under the plurality of inspection conditions; and an image-processing apparatus for extracting for individual pixels an image having the smallest signal intensity from among images of the wafer captured under the plurality of inspection conditions by the imaging optical system, and for inspecting for the presence of defects in a repeated pattern of the wafer based on an inspection image of the wafer generated by connecting each of the extracted pixels.

摘要翻译： 表面检查装置包括在多个检查条件下将线偏振光照射到晶片表面的照明光学系统; 成像光学系统，在多个检查条件下，拍摄由具有与所述线偏振光照射的晶片表面反射的光的反射光的振荡方向不同于所述线偏振光的振荡方向的偏振成分所形成的图像， 以及图像处理装置，用于通过成像光学系统从在多个检查条件下捕获的晶片的图像中提取具有最小信号强度的图像的各个像素，并且用于检查在重复图案中是否存在缺陷 基于通过连接每个所提取的像素而产生的晶片的检查图像的晶片。

公开(公告)号：US07643137B2

公开(公告)日：2010-01-05

申请号：US11243425

申请日：2005-10-05

申请人： Mari Sugihara ,  Takeo Oomori ,  Kazuhiko Fukazawa

发明人： Mari Sugihara ,  Takeo Oomori ,  Kazuhiko Fukazawa

IPC分类号： G01N21/00

CPC分类号： G01N21/95692

摘要： A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing element provided in either one of the illumination optical system or the receiving optical system.

摘要翻译： 用于检查作为待检查对象的基板的缺陷的缺陷检查装置包括用于照射基板的照明光学系统，用于从基板接收衍射光的接收光学系统和设置在照明光学器件中的任一个中的偏振元件 系统或接收光学系统。

公开(公告)号：US20060192953A1

公开(公告)日：2006-08-31

申请号：US11410944

申请日：2006-04-26

申请人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

发明人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01B11/30 ,  G01N21/21 ,  G01N21/956 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component.

公开(公告)号：US06654113B2

公开(公告)日：2003-11-25

申请号：US09950074

申请日：2001-09-12

申请人： Kazuhiko Fukazawa ,  Takeo Oomori

发明人： Kazuhiko Fukazawa ,  Takeo Oomori

IPC分类号： G01N2188

CPC分类号： G01N21/956 ,  G01N21/9501 ,  G01N2021/9513

摘要： The surface inspection apparatus according to the present invention obtains images of a test piece by capturing images of the test piece with an image-capturing device while varying at least one apparatus condition (e.g., the wafer tilt angle) through apparatus condition adjustment and determines an optimal setting at which a surface inspection is to be conducted on the test piece based upon the images thus obtained. As a result, the optimal setting for the inspection can be accurately ascertained with ease even when the pitch of a pattern formed at the surface of the test piece is not known, thereby making it possible to perform a surface inspection while sustaining high levels of accuracy and efficiency at all times.

公开(公告)号：US20080316475A1

公开(公告)日：2008-12-25

申请号：US12222500

申请日：2008-08-11

申请人： Kazuhiko Fukazawa ,  Takeo Oomori

发明人： Kazuhiko Fukazawa ,  Takeo Oomori

IPC分类号： G01N21/88

CPC分类号： G01N21/956

摘要： An apparatus and a method for defect inspection enables a reduction in the amount of noise light from an underlying layer and a good defect inspection reliably. The apparatus includes an illumination device that irradiates, with illumination light, a substrate to be inspected including a resist layer having cyclic patterns formed on the upper layer, and an optical image forming system that forms an image of the substrate to be inspected according to light that emerges from the substrate to be inspected by the irradiation with illumination light. The wavelength of the illumination light is set so that intensity of the light from the surface of the resist layer, among the light emerged from the substrate to be inspected, is greater than that of light that has passed through the surface of the cyclic pattern layer formed below the resist layer.

摘要翻译： 用于缺陷检查的装置和方法能够可靠地减少来自下层的噪声光的量和良好的缺陷检查。 该装置包括照明装置，照明装置照射包括具有形成在上层上的循环图案的抗蚀剂层的被检查基板，以及形成根据光检查的基板的图像的光学图像形成系统 从通过照射光的照射检查的基板出现。 照明光的波长被设定为使得从被检查的基板出射的光中的来自抗蚀剂层的表面的光的强度大于通过循环图案层的表面的光的强度 形成在抗蚀剂层下面。

公开(公告)号：US07298471B2

公开(公告)日：2007-11-20

申请号：US11410944

申请日：2006-04-26

申请人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

发明人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01B11/30 ,  G01N21/21 ,  G01N21/956 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component.

摘要翻译： 表面检查装置和表面检查方法旨在可靠地处理更精细的重复间距而不缩短照明光的波长。 为此，该装置包括以线性偏振光照射形成在要检查的基板表面上的重复图案的单元，该单元设置为倾斜角度，该倾斜角度与第一振动平面的相交线的方向之间的角度 基板表面上的线偏振光和重复图案的重复方向，从垂直于线偏振光的振动平面的偏振光分量中提取出的光从具有重复图案的光中发出的光 镜面方向，以及根据偏振光分量的光强度检测重复图案的缺陷的单元。