公开(公告)号：US20050016818A1

公开(公告)日：2005-01-27

申请号：US10859340

申请日：2004-06-03

申请人： Kazuhiko Ito ,  Kazutoshi Ishimaru ,  Jun Ookura ,  Michio Kinoshita ,  Yuichi Douki

发明人： Kazuhiko Ito ,  Kazutoshi Ishimaru ,  Jun Ookura ,  Michio Kinoshita ,  Yuichi Douki

IPC分类号： H01L21/68 ,  B05B12/12 ,  B05B13/02 ,  H01L21/00

CPC分类号： H01L21/67259 ,  B05B12/122 ,  B05B13/0228 ,  Y10S414/136

摘要： A substrate processing apparatus can align a substrate with a high precision and a high speed by monitoring a mark formed on a surface of the substrate; operating an amount of misalignment between the center of the substrate and a rotation center of a substrate support member; determining a presence of the misalignment and adjusting the substrate such that the center of the substrate coincides with the rotation center of the substrate support member.

公开(公告)号：US06973370B2

公开(公告)日：2005-12-06

申请号：US10859340

申请日：2004-06-03

申请人： Kazuhiko Ito ,  Kazutoshi Ishimaru ,  Jun Ookura ,  Michio Kinoshita ,  Yuichi Douki

发明人： Kazuhiko Ito ,  Kazutoshi Ishimaru ,  Jun Ookura ,  Michio Kinoshita ,  Yuichi Douki

IPC分类号： H01L21/68 ,  B05B12/12 ,  B05B13/02 ,  H01L21/00 ,  G06F7/00

CPC分类号： H01L21/67259 ,  B05B12/122 ,  B05B13/0228 ,  Y10S414/136

摘要： A substrate processing apparatus can align a substrate with a high precision and a high speed by monitoring a mark formed on a surface of the substrate; operating an amount of misalignment between the center of the substrate and a rotation center of a substrate support member; determining a presence of the misalignment and adjusting the substrate such that the center of the substrate coincides with the rotation center of the substrate support member.

摘要翻译： 基板处理装置可以通过监视形成在基板的表面上的标记来对准基板的高精度和高速度; 操作所述基板的中心与基板支撑构件的旋转中心之间的未对准量; 确定不对准的存在并调整衬底，使得衬底的中心与衬底支撑构件的旋转中心重合。

公开(公告)号：US20120158355A1

公开(公告)日：2012-06-21

申请号：US13405766

申请日：2012-02-27

申请人： Toshiyuki Matsumoto ,  Tomohide Minami ,  Yuichi Douki ,  Koji Mahara

发明人： Toshiyuki Matsumoto ,  Tomohide Minami ,  Yuichi Douki ,  Koji Mahara

IPC分类号： G06F15/00 ,  G01K1/00 ,  G01N19/10

CPC分类号： G01B7/003 ,  H01L21/67259

摘要： A position alignment of a transfer point of a transfer arm is performed by using a position detecting method. The method includes: detecting electrostatic capacitances in relation with a reference object for position alignment by a plurality of electrostatic capacitance detecting electrodes provided on a surface of the substrate body; communicating with each electrostatic capacitance detecting electrode and controlling a detection of each electrostatic capacitance detecting electrode; and calculating coordinates (x, y) of the reference object with respect to the substrate body based on a preset relationship between electrostatic capacitance values of multiple electrostatic capacitance detecting electrodes and a position of the reference object with respect to the substrate body.

摘要翻译： 通过使用位置检测方法来执行传送臂的传送点的位置对准。 所述方法包括：通过设置在所述基板主体的表面上的多个静电电容检测电极来检测与参考对象相关的静电电容以进行位置对准; 与每个静电电容检测电极连通并控制每个静电电容检测电极的检测; 并且基于多个静电电容检测电极的静电电容值与所述基准对象相对于所述基板主体的位置之间的预设关系来计算所述基准对象相对于所述基板主体的坐标（x，y）。

公开(公告)号：US20120148378A1

公开(公告)日：2012-06-14

申请号：US13399449

申请日：2012-02-17

申请人： Akira MURATA ,  Suguru Enokida ,  Yuichi Douki

发明人： Akira MURATA ,  Suguru Enokida ,  Yuichi Douki

IPC分类号： H01L21/677

CPC分类号： H01L21/67742 ,  H01L21/67754 ,  H01L21/68707

摘要： A substrate transfer apparatus includes forks that are vertically spaced apart from each other with a predetermined distance. When the forks take out the substrates from the first substrate containing part, each of the forks lifts the substrate and supports the same by moving upward from a pre-loading position located below the substrate to be taken out by a predetermined unloading stroke amount. A value of the predetermined distance is set to be equal to the sum of the distance between the substrates contained in the first substrate containing part and the unloading stroke amount.

摘要翻译： 基板传送装置包括彼此垂直间隔开预定距离的叉。 当叉从第一基板容纳部分取出基板时，每个叉子提升基板并且通过从位于基板下方的预加载位置向上移动以通过预定的卸载行程量被取出来支撑基板。 将预定距离的值设定为等于包含在第一基板容纳部中的基板与卸载行程量之间的距离之和。

公开(公告)号：US20120063765A1

公开(公告)日：2012-03-15

申请号：US13225985

申请日：2011-09-06

申请人： Shinichi HAYASHI ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

发明人： Shinichi HAYASHI ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

IPC分类号： G03D5/00

CPC分类号： G03F7/3021 ,  G03F7/162 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67745

摘要： A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.

摘要翻译： 一种处理块，包括一组液体处理相关单元块，布置在该组单位块的载体块侧的第一加热处理相关块，以及布置在该单元块的界面块侧的第二加热处理相关块 单位块组。 液体处理单元块组包括用于形成防反射膜和抗蚀剂膜的预处理的双重单元块，用于形成上层膜的后处理和进行曝光之前的清洁操作的双倍单位块，以及用于 发展。 第一加热工艺相关块加热涂覆有抗蚀剂液体和已经显影的基底的基底。 第二加热处理相关块加热已经暴露但尚未显影的基板，已经形成有抗反射膜的基板和已经形成有上层膜的基板。

公开(公告)号：US20070274811A1

公开(公告)日：2007-11-29

申请号：US11790568

申请日：2007-04-26

申请人： Akira Murata ,  Suguru Enokida ,  Yuichi Douki

发明人： Akira Murata ,  Suguru Enokida ,  Yuichi Douki

IPC分类号： H01L21/677

CPC分类号： H01L21/67742 ,  H01L21/67754 ,  H01L21/68707

摘要： A substrate transfer apparatus includes forks that are vertically spaced apart from each other with a predetermined distance. When the forks take out the substrates from the first substrate containing part, each of the forks lifts the substrate and supports the same by moving upward from a pre-loading position located below the substrate to be taken out by a predetermined unloading stroke amount. A value of the predetermined distance is set to be equal to the sum of the distance between the substrates contained in the first substrate containing part and the unloading stroke amount.

摘要翻译： 基板传送装置包括彼此垂直间隔开预定距离的叉。 当叉从第一基板容纳部分取出基板时，每个叉子提升基板并且通过从位于基板下方的预加载位置向上移动以通过预定的卸载行程量被取出来支撑基板。 将预定距离的值设定为等于包含在第一基板容纳部中的基板与卸载行程量之间的距离之和。

公开(公告)号：US08755935B2

公开(公告)日：2014-06-17

申请号：US13405918

申请日：2012-02-27

申请人： Yuichi Douki ,  Tokutarou Hayashi ,  Naruaki Iida ,  Suguru Enokida

发明人： Yuichi Douki ,  Tokutarou Hayashi ,  Naruaki Iida ,  Suguru Enokida

IPC分类号： B25J9/06 ,  H01L21/67 ,  B25J9/04 ,  B25J9/02

CPC分类号： H01L21/68 ,  H01L21/6715 ,  H01L21/67748 ,  H01L21/681 ,  H01L21/68707 ,  H01L22/10 ,  H01L2924/0002 ,  H01L2924/00

摘要： A substrate holder positioning method, capable of positioning a substrate holder without using any positioning jig, includes: measuring a first position of a substrate held on a substrate holder included in a substrate carrying mechanism; carrying the substrate held on the substrate holder to a substrate rotating unit for holding and rotating the substrate; turning the substrate held by the substrate rotating unit through a predetermined angle by the substrate rotating unit; transferring the substrate turned by the substrate rotating unit from the substrate rotating unit to the substrate holder; measuring a second position of the substrate transferred from the substrate rotating unit to the substrate holder; determining the position of the center of rotation of the substrate rotating unit on the basis of the first and the second position; and positioning the substrate holder on the basis of the position of the center of rotation.

摘要翻译： 一种能够在不使用任何定位夹具的情况下定位基板支架的基板支架定位方法，包括：测量保持在基板承载机构中的基板保持器上的基板的第一位置; 将保持在所述基板保持器上的所述基板承载到用于保持和旋转所述基板的基板旋转单元; 通过基板旋转单元将由基板旋转单元保持的基板转动预定角度; 将由基板旋转单元转动的基板从基板旋转单元传送到基板保持器; 测量从所述基板旋转单元转移到所述基板保持器的所述基板的第二位置; 基于第一位置和第二位置确定基板旋转单元的旋转中心的位置; 并且基于旋转中心的位置来定位衬底保持器。

公开(公告)号：US20090115422A1

公开(公告)日：2009-05-07

申请号：US12254998

申请日：2008-10-21

申请人： Toshiyuki Matsumoto ,  Tomohide Minami ,  Koji Mahara ,  Yuichi Douki

发明人： Toshiyuki Matsumoto ,  Tomohide Minami ,  Koji Mahara ,  Yuichi Douki

IPC分类号： G01R29/12

CPC分类号： H01L21/67259 ,  H01L21/68

摘要： A transfer point of a transfer arm is detected accurately and stably by using a position detecting wafer having an electrostatic capacitance sensor. A position detecting wafer S is formed in a wafer shape transferable by a transfer arm 20 and includes an electrostatic capacitance sensor 50 for detecting a relative position with respect to a reference object by detecting an electrostatic capacitance in relation with the reference object for a position detection. The electrostatic capacitance sensor 50 includes a detection electrode 52 for forming the electrostatic capacitance in relation with the reference object, and the detection electrode 52 is installed on a rear surface of a main body of the wafer shape. Installed on the main body is a guard electrode 100 covering the detecting electrode 52 when viewed from a front surface thereof, for blocking an electric field oriented toward the detection electrode 52 from the front surface.

摘要翻译： 通过使用具有静电电容传感器的位置检测晶片，准确稳定地检测转移臂的转印点。 位置检测用晶片S形成为可由传送臂20转印的晶片形状，并且包括静电电容传感器50，用于通过检测与参考对象相关的位置检测的静电电容来检测相对于参考对象的相对位置 。 静电电容传感器50包括用于与参考对象相关地形成静电电容的检测电极52，并且检测电极52安装在晶片形状的主体的后表面上。 安装在主体上的是从其前表面观察时覆盖检测电极52的保护电极100，用于阻挡从前表面朝向检测电极52的电场。

公开(公告)号：US08149005B2

公开(公告)日：2012-04-03

申请号：US12182239

申请日：2008-07-30

申请人： Toshiyuki Matsumoto ,  Tomohide Minami ,  Yuichi Douki ,  Koji Mahara

发明人： Toshiyuki Matsumoto ,  Tomohide Minami ,  Yuichi Douki ,  Koji Mahara

IPC分类号： G01R31/00 ,  G01R31/312

CPC分类号： G01B7/003 ,  H01L21/67259

摘要： A position alignment of a transfer point of a transfer arm is performed by using a position detecting wafer capable of being loaded into an apparatus having a thin transfer port. The position detecting wafer S includes an electrostatic capacitance detecting sensor 50 for detecting an electrostatic capacitance in relation with a reference object for the position alignment. The electrostatic capacitance detecting sensor 50 includes a plurality of electrostatic capacitance detecting electrodes 52, each forming the electrostatic capacitance in relation with the reference object; and a control circuit 51 for controlling a detection of the electrostatic capacitance by each electrostatic capacitance detecting electrode 52, while communicating with each electrostatic capacitance detecting electrode 52. The electrostatic capacitance detecting electrodes 52 are provided on a rear surface of the position detecting wafer S, and the control circuit 51 is provided on a front surface of the position detecting wafer S.

摘要翻译： 通过使用能够加载到具有薄的传送端口的设备的位置检测晶片来执行传送臂的传送点的位置对准。 位置检测用晶片S包括：静电电容检测传感器50，用于检测与位置对准的基准对象有关的静电电容。 静电电容检测传感器50包括多个静电电容检测电极52，每个静电电容检测电极形成与参考对象相关的静电电容; 以及控制电路51，用于在与每个静电电容检测电极52通信的同时控制每个静电电容检测电极52的静电电容的检测。静电电容检测电极52设置在位置检测晶片S的后表面上， 并且控制电路51设置在位置检测晶片S的前表面上。

公开(公告)号：US20120057862A1

公开(公告)日：2012-03-08

申请号：US13221072

申请日：2011-08-30

申请人： Shinichi HAYASHI ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

发明人： Shinichi HAYASHI ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

IPC分类号： G03D5/00

CPC分类号： H01L21/6715 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67745

摘要： A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit bock for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.

摘要翻译： 通过在接口块的侧面上的载体块，一组液体处理相关单元块和加热块的侧面上布置加热处理相关块来形成处理块，从 载波块到接口块的一侧。 一组液相处理相关单元块由以下组成：一组用于涂覆膜的单元块，其通过向上堆叠用于抗反射膜的单元块，用于抗蚀剂膜的单元块和用于上部的单元块 层膜，按顺序; 以及用于显影的单元块相对于用于涂膜的单元块组在上下方向上彼此堆叠。 每个液体处理相关单元块的液体处理模块布置在用于基板的传送路径的右侧和左侧。