公开(公告)号：US20130014786A1

公开(公告)日：2013-01-17

申请号：US13546372

申请日：2012-07-11

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

IPC分类号： B08B3/04 ,  F17D1/00

CPC分类号： H01L21/02041 ,  H01L21/67051 ,  H01L21/6719 ,  Y02E60/34 ,  Y10T137/0318 ,  Y10T137/598

摘要： A top plate 32 is provided with a top plate rotation mechanism configured to rotate the top plate 32 in a horizontal plane. An outside cup peripheral case 50 disposed around a cup 40 is configured to move between an upper position, in which a top end of the cylinder 50 is positioned above the cup 40, and a lower position located below the upper position. A nozzle support arm 82 configured to support a nozzle 82a is moved, in a horizontal direction, between an advanced position, in which the arm 82 is advanced into the outside cup peripheral case 50 via a side opening 50m formed in a side surface of the outside cup peripheral case 50 when the cylinder 50 is located in the upper position, and a retracted position, in which the arm 82 is retracted outward from the outside cup peripheral case 50.

摘要翻译： 顶板32设置有顶板旋转机构，其被配置为使顶板32在水平面中旋转。 设置在杯40周围的外杯周边壳体50被构造成在缸体50的上端位于杯40的上方的位置和位于上部位置下方的下部位置之间移动。 构造成支撑喷嘴82a的喷嘴支撑臂82在水平方向上在前进位置之间移动，在前进位置，臂82经由形成在外侧杯外周壳50的侧面中的侧开口50m前进到外杯外壳50 当圆筒50位于上部位置时，外侧杯形外壳50以及从外侧杯状外壳50向外侧缩回的缩回位置。

公开(公告)号：US09691602B2

公开(公告)日：2017-06-27

申请号：US13546372

申请日：2012-07-11

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

IPC分类号： H01L21/02 ,  H01L21/67

CPC分类号： H01L21/02041 ,  H01L21/67051 ,  H01L21/6719 ,  Y02E60/34 ,  Y10T137/0318 ,  Y10T137/598

摘要： A top plate is provided with a top plate rotation mechanism configured to rotate the top plate in a horizontal plane. An outside cup peripheral case disposed around a cup is configured to move between an upper position, in which a top end of the cylinder is positioned above the cup, and a lower position located below the upper position. A nozzle support arm configured to support a nozzle is moved, in a horizontal direction, between an advanced position, in which the arm is advanced into the outside cup peripheral case via a side opening formed in a side surface of the outside cup peripheral case when the cylinder is located in the upper position, and a retracted position, in which the arm is retracted outward from the outside cup peripheral case.

公开(公告)号：US09177838B2

公开(公告)日：2015-11-03

申请号：US13546394

申请日：2012-07-11

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

IPC分类号： B08B3/00 ,  H01L21/67 ,  G03F7/42

CPC分类号： H01L21/67051 ,  G03F7/423

摘要： A top plate 32 is provided to be moved in a horizontal direction between an advanced position, in which the top plate 32 covers from above a substrate W held by a substrate holding unit 21, and a retracted position that is retracted from the advanced position. An air hood 70 configured to supply a purified gas downward is provided to be lifted between a lower position, in which the air hood covers from above the substrate W held by the substrate holding unit 21, and an upper position located above the lower position.

摘要翻译： 顶板32设置成在顶板32从由基板保持单元21保持的基板W上方覆盖的前进位置和从前进位置缩回的缩回位置之间沿水平方向移动。 被配置为向下供给净化气体的空气罩70被设置为在从由基板保持单元21保持的基板W的上方覆盖着空气罩的下部位置和位于下部位置上方的上部位置之间提升。

公开(公告)号：US09640383B2

公开(公告)日：2017-05-02

申请号：US13985679

申请日：2012-07-11

申请人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

发明人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

IPC分类号： H01L21/02 ,  H01L21/67 ,  G03F7/42

CPC分类号： H01L21/02057 ,  G03F7/42 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67115

摘要： A liquid treatment apparatus includes a substrate holding member that holds a substrate horizontally, a rotation mechanism that rotates the substrate holding member; a chemical liquid nozzle that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate that covers the substrate held by the substrate holding member from above the substrate; and at least one LED lamp that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength through the top plate from above the top plate.

公开(公告)号：US20130319476A1

公开(公告)日：2013-12-05

申请号：US13985679

申请日：2012-07-11

申请人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

发明人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

IPC分类号： H01L21/02

CPC分类号： H01L21/02057 ,  G03F7/42 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67115

摘要： A liquid treatment apparatus includes a substrate holding member (22) that holds a substrate (W) horizontally, a rotation mechanism (25) that rotates the substrate holding member; a chemical liquid nozzle (56a) that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate (50) that covers the substrate held by the substrate holding member from above the substrate; and at least one LED lamp (62) that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength through the top plate from above the top plate.

摘要翻译： 液体处理装置包括：水平地保持基板（W）的基板保持部件（22）;使基板保持部件旋转的旋转机构（25）; 向由所述基板保持部件保持的所述基板供给化学液体的化学液体喷嘴（56a） 顶板（50），其从所述基板的上方覆盖由所述基板保持部件保持的基板; 以及至少一个LED灯（62），其通过从所述顶板的上方通过所述顶板照射预定波长的光而在化学液体处理期间加热所述基板。

公开(公告)号：US09768010B2

公开(公告)日：2017-09-19

申请号：US13823205

申请日：2012-08-01

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya

IPC分类号： H01L21/02 ,  H01L21/465 ,  H01L21/67 ,  H01L21/687

CPC分类号： H01L21/02041 ,  H01L21/465 ,  H01L21/67051 ,  H01L21/6719 ,  H01L21/68785 ,  H01L21/68792

摘要： A liquid treatment apparatus includes a substrate holder (21) that holds a substrate horizontally and rotates the substrate, a treatment liquid nozzle (82) that supplies a treatment liquid to the substrate held by the substrate holder, a cup (40) that is arranged outside of a peripheral edge of the substrate held by the substrate holder and receives the treatment liquid which has been supplied to the substrate by the treatment liquid nozzle, a top plate (32) that covers the substrate held by the substrate holder from above, a top plate rotation driving mechanism that rotates the top plate, and a liquid receiving member (130) that surrounds a peripheral edge of the top plate and has a circular liquid receiving space (132).

公开(公告)号：US09711380B2

公开(公告)日：2017-07-18

申请号：US13593666

申请日：2012-08-24

申请人： Norihiro Ito ,  Takashi Nagai

发明人： Norihiro Ito ,  Takashi Nagai

IPC分类号： H01L21/67 ,  H01L21/02 ,  B08B3/02 ,  B08B3/08

CPC分类号： H01L21/67017 ,  B08B3/022 ,  B08B3/08 ,  H01L21/02057 ,  H01L21/67051 ,  H01L21/67109

摘要： Disclosed are a liquid processing apparatus and a liquid processing method. The liquid processing apparatus includes an ejection port ejecting a first liquid to a wafer, a first liquid supply mechanism supplying sulphuric acid to the ejection port, and a second liquid supply mechanism supplying hydrogen peroxide solution to the ejection port. The first liquid supply mechanism includes a first temperature adjustment mechanism maintaining the first liquid heated to a first temperature, a second temperature adjustment mechanism connected to the first temperature adjustment mechanism, and an ejection line connecting the second temperature adjustment mechanism with the ejection port. The second temperature adjustment mechanism includes a second circulation line and a second heater. The ejection line connects the second circulation line through a switching valve at a location further downstream than the second heater.

公开(公告)号：US20130048609A1

公开(公告)日：2013-02-28

申请号：US13593666

申请日：2012-08-24

申请人： Norihiro Ito ,  Takashi Nagai

发明人： Norihiro Ito ,  Takashi Nagai

IPC分类号： B08B3/10 ,  B05C11/10 ,  B05C5/00 ,  B08B3/02 ,  B44C1/22

CPC分类号： H01L21/67017 ,  B08B3/022 ,  B08B3/08 ,  H01L21/02057 ,  H01L21/67051 ,  H01L21/67109

摘要： Disclosed are a liquid processing apparatus and a liquid processing method. The liquid processing apparatus includes an ejection port ejecting a first liquid to a wafer, a first liquid supply mechanism supplying sulphuric acid to the ejection port, and a second liquid supply mechanism supplying hydrogen peroxide solution to the ejection port. The first liquid supply mechanism includes a first temperature adjustment mechanism maintaining the first liquid heated to a first temperature, a second temperature adjustment mechanism connected to the first temperature adjustment mechanism, and an ejection line connecting the second temperature adjustment mechanism with the ejection port. The second temperature adjustment mechanism includes a second circulation line and a second heater. The ejection line connects the second circulation line through a switching valve at a location further downstream than the second heater.

摘要翻译： 公开了一种液体处理装置和液体处理方法。 液体处理装置包括将第一液体喷射到晶片的喷射口，向喷射口供给硫酸的第一液体供给机构以及向喷射口供给过氧化氢溶液的第二液体供给机构。 第一液体供给机构包括：第一温度调节机构，保持被加热到第一温度的第一液体;连接到第一温度调节机构的第二温度调节机构;以及将第二温度调节机构与排出口连接的喷出线。 第二温度调节机构包括第二循环线和第二加热器。 喷射管线通过切换阀将第二循环管路连接在比第二加热器更下游的位置处。

公开(公告)号：US09012902B2

公开(公告)日：2015-04-21

申请号：US14007440

申请日：2012-03-09

申请人： Nobuhiro Ide ,  Norihiro Ito ,  Hiroya Tsuji ,  Yuko Suzuka

发明人： Nobuhiro Ide ,  Norihiro Ito ,  Hiroya Tsuji ,  Yuko Suzuka

IPC分类号： H01L51/50 ,  H01L51/52

CPC分类号： H01L51/5008 ,  H01L51/5044 ,  H01L51/5278

摘要： Provided is an organic electroluminescent element superior in long-term durability and lifetime characteristics. The organic electroluminescent element has a structure where plurality of light-emitting layers formed via an intermediate layer are interposed between a positive electrode and a negative electrode. The intermediate layer has a mixed layer, a first layer, and a hole-injection layer which are formed in this order from the positive electrode to the negative electrode, the mixed layer containing an electron-donating substance and an electron-transporting organic material, and the first layer being made of an electron-transporting material. The first layer has a thickness in a range of 0.2 to 2.0 nm. The hole-injection layer consists of an electro-accepting organic material.

摘要翻译： 提供了长期耐久性和寿命特性优异的有机电致发光元件。 有机电致发光元件具有通过中间层形成的多个发光层插入在正极和负极之间的结构。 中间层具有从正极到负极的顺序形成的混合层，第一层和空穴注入层，含有供电子物质和电子传输有机材料的混合层， 并且第一层由电子传输材料制成。 第一层的厚度为0.2〜2.0nm。 空穴注入层由电接收有机材料构成。

公开(公告)号：US08950414B2

公开(公告)日：2015-02-10

申请号：US12837840

申请日：2010-07-16

申请人： Norihiro Ito

发明人： Norihiro Ito

IPC分类号： H01L21/00 ,  H01L21/67

CPC分类号： H01L21/6708 ,  H01L21/67051 ,  H01L21/67248 ,  Y10S134/902

摘要： The liquid processing apparatus includes: a liquid supply mechanism; a supply line connected to the liquid supply mechanism, the supply line having a discharge opening for discharging a temperature-regulated liquid; a processing unit supporting the discharge opening of the supply line; a return line configured to return the liquid supplied to the supply line to the liquid supply mechanism; and a liquid-supply switching valve configured to switch between supply of the liquid, which is used in a processing of an object to be processed in the processing unit, and stoppage of the liquid supply. The liquid-supply switching valve is disposed on the supply line on a route of the liquid returning from the supply line to the liquid supply mechanism through the return line.

摘要翻译： 液体处理装置包括：液体供给机构; 连接到液体供给机构的供给管线，供给管线具有用于排出温度调节液体的排出口; 支撑供给管线的排出口的处理单元; 返回管线，被配置为将供应到所述供应管线的液体返回到所述液体供应机构; 以及液体供给切换阀，其配置为在所述处理单元中的被处理物的处理中使用的液体的供给与所述液体供给的停止之间切换。 液体供给切换阀通过返回管路从供给管路返回到液体供给机构的液体的路线配置在供给管路上。