公开(公告)号：US20130014786A1

公开(公告)日：2013-01-17

申请号：US13546372

申请日：2012-07-11

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

IPC分类号： B08B3/04 ,  F17D1/00

CPC分类号： H01L21/02041 ,  H01L21/67051 ,  H01L21/6719 ,  Y02E60/34 ,  Y10T137/0318 ,  Y10T137/598

摘要： A top plate 32 is provided with a top plate rotation mechanism configured to rotate the top plate 32 in a horizontal plane. An outside cup peripheral case 50 disposed around a cup 40 is configured to move between an upper position, in which a top end of the cylinder 50 is positioned above the cup 40, and a lower position located below the upper position. A nozzle support arm 82 configured to support a nozzle 82a is moved, in a horizontal direction, between an advanced position, in which the arm 82 is advanced into the outside cup peripheral case 50 via a side opening 50m formed in a side surface of the outside cup peripheral case 50 when the cylinder 50 is located in the upper position, and a retracted position, in which the arm 82 is retracted outward from the outside cup peripheral case 50.

摘要翻译： 顶板32设置有顶板旋转机构，其被配置为使顶板32在水平面中旋转。 设置在杯40周围的外杯周边壳体50被构造成在缸体50的上端位于杯40的上方的位置和位于上部位置下方的下部位置之间移动。 构造成支撑喷嘴82a的喷嘴支撑臂82在水平方向上在前进位置之间移动，在前进位置，臂82经由形成在外侧杯外周壳50的侧面中的侧开口50m前进到外杯外壳50 当圆筒50位于上部位置时，外侧杯形外壳50以及从外侧杯状外壳50向外侧缩回的缩回位置。

公开(公告)号：US09640383B2

公开(公告)日：2017-05-02

申请号：US13985679

申请日：2012-07-11

申请人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

发明人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

IPC分类号： H01L21/02 ,  H01L21/67 ,  G03F7/42

CPC分类号： H01L21/02057 ,  G03F7/42 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67115

摘要： A liquid treatment apparatus includes a substrate holding member that holds a substrate horizontally, a rotation mechanism that rotates the substrate holding member; a chemical liquid nozzle that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate that covers the substrate held by the substrate holding member from above the substrate; and at least one LED lamp that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength through the top plate from above the top plate.

公开(公告)号：US09691602B2

公开(公告)日：2017-06-27

申请号：US13546372

申请日：2012-07-11

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

IPC分类号： H01L21/02 ,  H01L21/67

CPC分类号： H01L21/02041 ,  H01L21/67051 ,  H01L21/6719 ,  Y02E60/34 ,  Y10T137/0318 ,  Y10T137/598

摘要： A top plate is provided with a top plate rotation mechanism configured to rotate the top plate in a horizontal plane. An outside cup peripheral case disposed around a cup is configured to move between an upper position, in which a top end of the cylinder is positioned above the cup, and a lower position located below the upper position. A nozzle support arm configured to support a nozzle is moved, in a horizontal direction, between an advanced position, in which the arm is advanced into the outside cup peripheral case via a side opening formed in a side surface of the outside cup peripheral case when the cylinder is located in the upper position, and a retracted position, in which the arm is retracted outward from the outside cup peripheral case.

公开(公告)号：US09177838B2

公开(公告)日：2015-11-03

申请号：US13546394

申请日：2012-07-11

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

IPC分类号： B08B3/00 ,  H01L21/67 ,  G03F7/42

CPC分类号： H01L21/67051 ,  G03F7/423

摘要： A top plate 32 is provided to be moved in a horizontal direction between an advanced position, in which the top plate 32 covers from above a substrate W held by a substrate holding unit 21, and a retracted position that is retracted from the advanced position. An air hood 70 configured to supply a purified gas downward is provided to be lifted between a lower position, in which the air hood covers from above the substrate W held by the substrate holding unit 21, and an upper position located above the lower position.

摘要翻译： 顶板32设置成在顶板32从由基板保持单元21保持的基板W上方覆盖的前进位置和从前进位置缩回的缩回位置之间沿水平方向移动。 被配置为向下供给净化气体的空气罩70被设置为在从由基板保持单元21保持的基板W的上方覆盖着空气罩的下部位置和位于下部位置上方的上部位置之间提升。

公开(公告)号：US20130319476A1

公开(公告)日：2013-12-05

申请号：US13985679

申请日：2012-07-11

申请人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

发明人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

IPC分类号： H01L21/02

CPC分类号： H01L21/02057 ,  G03F7/42 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67115

摘要： A liquid treatment apparatus includes a substrate holding member (22) that holds a substrate (W) horizontally, a rotation mechanism (25) that rotates the substrate holding member; a chemical liquid nozzle (56a) that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate (50) that covers the substrate held by the substrate holding member from above the substrate; and at least one LED lamp (62) that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength through the top plate from above the top plate.

摘要翻译： 液体处理装置包括：水平地保持基板（W）的基板保持部件（22）;使基板保持部件旋转的旋转机构（25）; 向由所述基板保持部件保持的所述基板供给化学液体的化学液体喷嘴（56a） 顶板（50），其从所述基板的上方覆盖由所述基板保持部件保持的基板; 以及至少一个LED灯（62），其通过从所述顶板的上方通过所述顶板照射预定波长的光而在化学液体处理期间加热所述基板。

公开(公告)号：US09711380B2

公开(公告)日：2017-07-18

申请号：US13593666

申请日：2012-08-24

申请人： Norihiro Ito ,  Takashi Nagai

发明人： Norihiro Ito ,  Takashi Nagai

IPC分类号： H01L21/67 ,  H01L21/02 ,  B08B3/02 ,  B08B3/08

CPC分类号： H01L21/67017 ,  B08B3/022 ,  B08B3/08 ,  H01L21/02057 ,  H01L21/67051 ,  H01L21/67109

摘要： Disclosed are a liquid processing apparatus and a liquid processing method. The liquid processing apparatus includes an ejection port ejecting a first liquid to a wafer, a first liquid supply mechanism supplying sulphuric acid to the ejection port, and a second liquid supply mechanism supplying hydrogen peroxide solution to the ejection port. The first liquid supply mechanism includes a first temperature adjustment mechanism maintaining the first liquid heated to a first temperature, a second temperature adjustment mechanism connected to the first temperature adjustment mechanism, and an ejection line connecting the second temperature adjustment mechanism with the ejection port. The second temperature adjustment mechanism includes a second circulation line and a second heater. The ejection line connects the second circulation line through a switching valve at a location further downstream than the second heater.

公开(公告)号：US20130048609A1

公开(公告)日：2013-02-28

申请号：US13593666

申请日：2012-08-24

申请人： Norihiro Ito ,  Takashi Nagai

发明人： Norihiro Ito ,  Takashi Nagai

IPC分类号： B08B3/10 ,  B05C11/10 ,  B05C5/00 ,  B08B3/02 ,  B44C1/22

CPC分类号： H01L21/67017 ,  B08B3/022 ,  B08B3/08 ,  H01L21/02057 ,  H01L21/67051 ,  H01L21/67109

摘要： Disclosed are a liquid processing apparatus and a liquid processing method. The liquid processing apparatus includes an ejection port ejecting a first liquid to a wafer, a first liquid supply mechanism supplying sulphuric acid to the ejection port, and a second liquid supply mechanism supplying hydrogen peroxide solution to the ejection port. The first liquid supply mechanism includes a first temperature adjustment mechanism maintaining the first liquid heated to a first temperature, a second temperature adjustment mechanism connected to the first temperature adjustment mechanism, and an ejection line connecting the second temperature adjustment mechanism with the ejection port. The second temperature adjustment mechanism includes a second circulation line and a second heater. The ejection line connects the second circulation line through a switching valve at a location further downstream than the second heater.

摘要翻译： 公开了一种液体处理装置和液体处理方法。 液体处理装置包括将第一液体喷射到晶片的喷射口，向喷射口供给硫酸的第一液体供给机构以及向喷射口供给过氧化氢溶液的第二液体供给机构。 第一液体供给机构包括：第一温度调节机构，保持被加热到第一温度的第一液体;连接到第一温度调节机构的第二温度调节机构;以及将第二温度调节机构与排出口连接的喷出线。 第二温度调节机构包括第二循环线和第二加热器。 喷射管线通过切换阀将第二循环管路连接在比第二加热器更下游的位置处。

公开(公告)号：US08970460B2

公开(公告)日：2015-03-03

申请号：US12999864

申请日：2010-03-31

申请人： Hiroshi Yaguma ,  Motoya Kumagai ,  Takashi Nagai ,  Sukenori Itou

发明人： Hiroshi Yaguma ,  Motoya Kumagai ,  Takashi Nagai ,  Sukenori Itou

IPC分类号： G09G3/36

CPC分类号： G09G3/3696 ,  G09G3/3688 ,  G09G2310/0291 ,  G09G2310/0297 ,  G09G2310/08 ,  G09G2330/021 ,  G09G2330/025 ,  G09G2330/026 ,  G09G2330/04

摘要： A voltage amplifier circuit (300) comprises: an input voltage generating unit (302) that generates an input voltage (VL1) based on a set value (SL); an operational amplifier (303) that amplifies the input voltage (VL1) such that the input voltage (VL1) becomes equal to a feedback voltage (VL3), thereby generating an output voltage (VL2); a feedback resistor unit (304) that performs a voltage division between the output voltage (VL2) applied to one end of the feedback resistor unit and a reference voltage (VL4) applied to the other end of the feedback resistor unit, thereby generating the feedback voltage (VL3); a selector control unit (305) that generates a selector control signal (SS) based on the set value (SL); and a selector (306) that selects, based on the selector control signal SS, the reference voltage (VL4) from a plurality of candidates (GND/VR).

摘要翻译： 电压放大器电路（300）包括：输入电压产生单元，基于设定值（SL）产生输入电压（VL1）; 放大输入电压（VL1）使得输入电压（VL1）变为等于反馈电压（VL3）的运算放大器（303），从而产生输出电压（VL2）; 反馈电阻器单元（304），其在施加到反馈电阻器单元的一端的输出电压（VL2）和施加到反馈电阻器单元的另一端的参考电压（VL4）之间进行分压，从而产生反馈 电压（VL3）; 选择器控制单元，其基于所述设定值（SL）生成选择器控制信号（SS）; 以及基于选择器控制信号SS从多个候选（GND / VR）中选择参考电压（VL4）的选择器（306）。

公开(公告)号：US20110163490A1

公开(公告)日：2011-07-07

申请号：US12678385

申请日：2009-07-08

申请人： Takashi Nagai ,  Wataru Takahashi ,  Takayasu Ohara ,  Seiji Iwai

发明人： Takashi Nagai ,  Wataru Takahashi ,  Takayasu Ohara ,  Seiji Iwai

IPC分类号： B23Q1/64

CPC分类号： H02G11/006 ,  B23K37/0452 ,  H02G11/02

摘要： A positioner includes a housing, a table, a drive portion, a cylinder, a first winder, and a first cord. The cylinder includes a first opening at the rotation center of the table, and a second opening opposite and connected to the first opening. The first winder is disposed outside the second opening of the cylinder. The first cord includes a first lead-out portion and a first wound portion. The first lead-out portion enters the second opening, passes through the cylinder, and is led out from the table. The first wound portion is wound around the first winder according to the rotation of the table. Thus, the positioner can increase the number of air tubes or wires led out onto the table without increasing its size.

摘要翻译： 定位器包括壳体，工作台，驱动部分，气缸，第一卷绕器和第一帘线。 圆筒包括在工作台的旋转中心处的第一开口和与第一开口相对并连接的第二开口。 第一卷绕机设置在圆筒的第二开口的外侧。 第一帘线包括第一导出部分和第一卷绕部分。 第一个引出部分进入第二个开口，穿过圆筒，并从桌子上引出。 第一卷绕部分根据工作台的旋转缠绕在第一卷绕机上。 因此，定位器可以增加引导到桌子上的空气管或电线的数量而不增加其尺寸。

公开(公告)号：US20080213680A1

公开(公告)日：2008-09-04

申请号：US10586562

申请日：2005-02-25

申请人： Takashi Nagai

发明人： Takashi Nagai

IPC分类号： G03G9/083 ,  G03G13/06

CPC分类号： G03G13/08 ,  G03G9/0827 ,  G03G9/09708 ,  G03G2215/0609

摘要： The present invention provides a toner for electrostatic latent image development and a method of magnetic monocomponent development using the toner which can prevent the toner adhesion to a photoconductor for a long time period and can obtain an image having high quality by maintaining functions of the toner for a long time period or by favorably adjusting the conveying property of the toner on a developing sleeve. In a toner for electrostatic latent image development which contains toner particles and inorganic particles and a method of development using the toner, the toner particles exhibit a shape factor SF-1 which satisfies the relationship 115≦SF-1≦150 and a shape factor SF-2 which satisfies the relationship 115≦SF-2≦145 and, at the same time, a quantity of inorganic particles which are in a floating state is set to a value which falls within a range from 10 weight % to 25 weight % with respect to the total quantity of the inorganic particles.

摘要翻译： 本发明提供了一种用于静电潜像显影的调色剂和使用调色剂的磁性单组分显影方法，其可以防止调色剂长时间粘附到感光体上，并且可以通过保持调色剂的功能来获得具有高质量的图像 或者通过有利地调节显影套筒上的调色剂的输送性能。 在包含调色剂颗粒和无机颗粒的静电潜像显影用调色剂和使用调色剂的显影方法中，调色剂颗粒呈现满足关系115 <= SF-1 <= 150的形状因子SF-1和形状 满足关系115 <= SF-2 <= 145的因子SF-2，并且同时将处于浮动状态的无机颗粒的量设定为在10重量％以下的范围内的值 相对于无机粒子的总量为25重量％。