摘要:
A laminated electronic device comprises two or more wiring layers including a first wiring layer and a second wiring layer, an insulating layer interposed between the first wiring layer and second wiring layer, and a through conductor extending through the insulating layer for electrically connecting a first conductor disposed on the first wiring layer to a second conductor disposed on the second wiring layer. The through conductor includes divergent sections at both ends, which have a diameter gradually increased toward the first conductor or second conductor.
摘要:
An extraction unit extracts a metal pattern constituting a semiconductor integrated circuit from layout data. A setting unit sets up a region including the metal pattern extracted by the extraction unit. An evaluation unit calculates the metal coverage rate of the region and to evaluate whether the metal coverage rate is equal to or more than a predetermined value. An insertion unit inserts a dummy metal pattern into the region when the metal coverage rate is evaluated as a value smaller than the predetermined value by the evaluation unit.
摘要:
A designing device for a semiconductor integrated circuit of an embodiment includes a low-order hierarchy wiring design portion configured to design a first wiring; and a high-order hierarchy wiring design portion configured to design a second wiring. The low-order hierarchy wiring design portion divides the first functional block into a plurality of small regions, calculates a number of wiring layers required for wiring in the functional block for each of the plurality of small regions and sets the number as the number of low-order hierarchy wiring layers, sets wiring layers in the number of the low-order hierarchy wiring layers from the wiring layer located on the lowermost part as a low-order hierarchy wiring region for each of the plurality of small regions, and places the first wiring in the low-order hierarchy wiring region.