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    Photosensitive material processing apparatus and sealing structure for processing section of the apparatus
    1.
    发明授权
    Photosensitive material processing apparatus and sealing structure for processing section of the apparatus 有权
    感光材料处理装置和装置处理部分的密封结构

    公开(公告)号：US6149320A

    公开(公告)日：2000-11-21

    申请号：US274352

    申请日：1999-03-23

    申请人： Kazuo Ichikawa ,  Shinichi Miyamoto ,  Kenichi Miyamoto ,  Tomoyuki Takiue ,  Yutaka Takeo ,  Susumu Yoshida ,  Hisao Kanzaki

    发明人： Kazuo Ichikawa ,  Shinichi Miyamoto ,  Kenichi Miyamoto ,  Tomoyuki Takiue ,  Yutaka Takeo ,  Susumu Yoshida ,  Hisao Kanzaki

    IPC分类号： G03D3/00 ,  G03F7/30 ,  G03D13/00

    CPC分类号： G03F7/3042

    摘要： A box-shaped shielding cover is disposed at the surface of a developing solution contained in a developing tank and the bottom wall of the cover ensures that contact between the developing solution and the air is kept to a minimum and that deterioration of the processing solution due to carbon dioxide and evaporation of the water are controlled. Moreover, the close contact between the top portion of the peripheral wall of the shielding cover and the top cover covering the top portion of the PS plate processor cuts off the flow of air over the developing tank (the air flowing from the insertion aperture to the discharge aperture). Accordingly, the airtightness of the seal in the developing section is enhanced, there is minimal deterioration of the developing solution due to carbon dioxide, and the rate of replenishment of the developing solution is reduced.

    摘要翻译： 在显影槽中包含的显影液的表面设置有箱形的屏蔽罩，并且盖的底壁确保显影液与空气之间的接触保持最小，并且处理液的劣化由于 对二氧化碳和水的蒸发进行控制。 此外，屏蔽罩的周壁的顶部和覆盖PS板处理器的顶部的顶盖之间的紧密接触切断了显影槽上的空气流（从插入孔流到 放电孔径）。 因此，显影部中的密封件的气密性增强，由于二氧化碳而导致的显影液的劣化降低，显影液的补充量降低。

    Device for forming an inserting hole for an endoscope
    3.
    发明授权
    Device for forming an inserting hole for an endoscope 失效
    用于形成内窥镜插入孔的装置

    公开(公告)号：US4981482A

    公开(公告)日：1991-01-01

    申请号：US349769

    申请日：1989-05-10

    申请人： Kazuo Ichikawa

    发明人： Kazuo Ichikawa

    IPC分类号： A61B1/313 ,  A61M25/06

    CPC分类号： A61B1/00135 ,  A61B1/313 ,  A61M25/06

    摘要： A tube device for forming a fistula is constructed in such a way that the tube device is composed of a metallic guide wire, a small diameter tube to which the guide wire can be inserted in its center, a medium diameter tube covering the outer periphery of the small diameter tube, a medium-large diameter tube covering the outer periphery of the small diameter tube and having an outer diameter larger than the medium diameter tube, a large diameter tube covering the outer periphery of the small diameter tube and having an outer diameter larger than the medium-large diameter tube, a large diameter drainage tube covering the outer periphery of the small diameter tube and having an outer diameter equal to that of the large diameter tube, and an extra large diameter tube covering the outer periphery of the large diameter drainage tube. An outer diameter of each tip portion of the small diameter tube, medium diameter tube, medium-large diameter tube and large diameter tube is gradually reduced towards ends thereof to be taper-shaped. These tubes are exchanged and inserted in the order of their diameters, i.e. from small diameter to large diameter, by means of a guide wire. The extra large diameter tube necessary for the insertion of the endscope can be inserted in a short time with an extreme safety since the tapered surface of the tip portion of the tube applies the pressure to the liver tissue to expand it gradually.

    摘要翻译： 用于形成瘘管的管装置被构造成使得管装置由金属导丝，导丝可以插入其中心的小直径管，覆盖外围的中径管 小直径管，覆盖小直径管的外周并具有比中等直径管大的外径的中大直径管，覆盖小直径管的外周的大直径管，具有外径 大于中大直径管，大直径排水管覆盖小直径管的外周，外径等于大直径管的外径，外径大的管覆盖大直径管的外周 直径排水管。 小直径管，中径管，中大直径管和大直径管的每个末端部分的外径朝向其端部逐渐减小为锥形。 这些管子通过导丝以其直径，即从小直径到大直径的顺序交换和插入。 由于管的尖端部分的锥面向肝组织施加压力以逐渐扩张，所以能够在极短的时间内插入用于插入内镜的特大直径的管。

    Hot-air circulation cooking oven
    6.
    发明授权
    Hot-air circulation cooking oven 失效
    热风循环烹饪炉

    公开(公告)号：US4780596A

    公开(公告)日：1988-10-25

    申请号：US26997

    申请日：1987-03-17

    申请人： Kazufumi Matsushima ,  Yoshinari Arabori ,  Kazuo Ichikawa

    发明人： Kazufumi Matsushima ,  Yoshinari Arabori ,  Kazuo Ichikawa

    IPC分类号： F24C15/32 ,  F27D7/04 ,  A21B1/26

    CPC分类号： F24C15/325

    摘要： A cooking oven includes a box-like casing defining a heating chamber wherein food in placed. A rear plate of the casing has a recess projecting outward, a number of suction holes cut in the bottom of the recess, and a number of discharge holes cut in sections located above and below the recess. A cover is fixed to the outer surface of the rear plate to define a storing chamber. In the storing chamber are arranged a fan for drawing air in the heating chamber into the storing chamber and discharging the air into the heating chamber, and a heater for heating the sucked air. The cover has a first air-directing section for directing part of the hot air from the fan in a direction parallel to the top plate of the casing, and a second air-directing section for directing part of the hot air in a direction different from the direction of the hot air directed by the first air-directing section.

    摘要翻译： 烹饪炉包括限定加热室的盒状壳体，其中放置食物。 壳体的后板具有向外突出的凹部，在凹部的底部切割的多个吸入孔以及位于凹部上方和下方的多个排出孔。 盖子固定到后板的外表面以限定储存室。 在储存室中设置有用于将加热室内的空气吸入储存室并将空气排放到加热室中的风扇和用于加热吸入空气的加热器。 所述盖具有第一导风部分，用于沿着平行于所述壳体的顶板的方向引导来自所述风扇的部分热空气，以及第二导风部分，用于将部分热空气沿不同于 由第一导风部分引导的热空气的方向。

    CVD system and substrate cleaning method
    10.
    发明申请
    CVD system and substrate cleaning method 审中-公开
    CVD系统和基板清洗方法

    公开(公告)号：US20080044589A1

    公开(公告)日：2008-02-21

    申请号：US11907366

    申请日：2007-10-11

    申请人： Kazuo Ichikawa ,  Hiroshi Tanabe ,  Katsuhisa Yuda

    发明人： Kazuo Ichikawa ,  Hiroshi Tanabe ,  Katsuhisa Yuda

    IPC分类号： C08J7/18

    CPC分类号： C23C16/0245 ,  H01L29/4908

    摘要： An insulating film deposition chamber 40 has a plasma generator 14 having a plasma generation chamber 21 separated from the film deposition chamber 13 in which the substrate is arranged. A material gas is directly supplied to the film deposition chamber, and radicals are introduced into the film deposition chamber from the plasma generator, and a thin film is deposited on the substrate. Further, a cleaning gas feeder is added to the plasma generator. A cleaning gas is introduced through the cleaning gas feeder to produce plasma at the plasma generator to generate radicals, and the radicals are introduced into the film deposition chamber and irradiate the substrate to clean it.

    摘要翻译： 绝缘膜沉积室40具有等离子体发生器14，其具有与沉积室13分离的等离子体产生室21，其中布置有基板。 将材料气体直接供给到成膜室，并且从等离子体发生器将自由基引入成膜室，并在基板上沉积薄膜。 此外，将清洁气体供给器添加到等离子体发生器。 通过清洁气体供给器引入清洁气体以在等离子体发生器处产生等离子体以产生自由基，并将自由基引入成膜室并照射基板以进行清洁。