Shape measuring apparatus and method
    2.
    发明授权
    Shape measuring apparatus and method 失效
    形状测量装置及方法

    公开(公告)号:US6026583A

    公开(公告)日:2000-02-22

    申请号:US988397

    申请日:1997-12-10

    IPC分类号: G01B11/00 G01B11/24

    CPC分类号: G01B11/005 G01B11/24

    摘要: A shape measuring apparatus includes an object measuring device, a holding base, a reference plane measuring device, and a length measuring unit. The holding base holds an object-to-be-measured on its surface and has a reference plane provided on its back side so that a measured surface of the object and the reference plane can be simultaneously scanned by the object measuring device and the reference plane measuring device, respectively. Therefore, the object and the reference plane can sway integrally with each other, and the accuracy of measurement of the measured surface is not influenced by any moving straightness deviation of the holding base unless any change occurs in relative positions of the reference plane and the measured surface. Therefore, the shape of the measured surface can be measured with the flatness accuracy of the reference plane.

    摘要翻译: 一种形状测量装置,包括物体测量装置,保持基座,基准平面测量装置和长度测量单元。 保持基座在其表面上保持要测量的物体,并且具有设置在其背面的参考平面,使得物体和参考平面的测量表面可以被物体测量装置和参考平面同时扫描 测量装置。 因此,物体和参考平面可以彼此一体摆动,并且测量表面的测量精度不受保持基座的任何移动直线度偏差的影响,除非在参考平面的相对位置和测量的相对位置发生变化 表面。 因此,可以用参考平面的平坦度精度来测量被测表面的形状。

    Configuration measuring apparatus and method
    3.
    发明授权
    Configuration measuring apparatus and method 失效
    配置测量装置和方法

    公开(公告)号:US06934036B2

    公开(公告)日:2005-08-23

    申请号:US10140815

    申请日:2002-05-09

    摘要: Arranged on both sides of a thin plate are optical displacement gauges that irradiate measurement lights onto surfaces of the thin plate and receive the measurement lights reflected by the surface so as to measure displacements of the surfaces of the thin plate. Variation of thickness of the thin plate is obtained on the basis of the displacements of the surfaces of the thin plate measured by each of the optical displacement gauges. Each of the optical displacement gauges detects the displacement of a respective surface of the thin plate with high accuracy by irradiating the measurement light to the thin plate two times.

    摘要翻译: 在薄板的两侧排列的是光学位移计,其将测量光照射到薄板的表面上,并接收由表面反射的测量光,以测量薄板表面的位移。 基于由每个光学位移计测量的薄板的表面的位移,获得薄板厚度的变化。 每个光学位移计通过将测量光照射到薄板两次来高精度地检测薄板的各个表面的位移。

    Method and apparatus for transferring a thin plate
    4.
    发明授权
    Method and apparatus for transferring a thin plate 失效
    传递薄板的方法和装置

    公开(公告)号:US07029224B2

    公开(公告)日:2006-04-18

    申请号:US10384791

    申请日:2003-03-11

    IPC分类号: B25J17/02

    摘要: A method for transferring a thin plate is provided, in which three or more grasping claws of a transfer arm grasp the periphery of the thin plate in order to transfer it to a predetermined transfer position, and three or more holding claws hold the periphery of the thin plate in the transfer position. The transfer arm rotates about a shaft which is in a direction of a vector sum of a first vector perpendicular to a surface of the thin plate before transfer, and a second vector perpendicular to the surface of the thin plate after the transfer, to transfer the thin plate with changing the posture thereof.

    摘要翻译: 提供一种用于传送薄板的方法,其中传送臂的三个或更多个把持爪抓住薄板的周边以便将其传送到预定的传送位置,并且三个或更多个夹持爪保持 薄板处于转移位置。 传送臂围绕转轴旋转,该轴在转印之前沿垂直于薄板的表面的第一矢量的矢量方向和在转印之后垂直于薄板表面的第二矢量转动, 改变其姿势的薄板。

    Profilometer and method for measuring, and method for manufacturing object of surface profiling
    5.
    发明授权
    Profilometer and method for measuring, and method for manufacturing object of surface profiling 有权
    曲面测量仪和测量方法,以及表面成型对象的制造方法

    公开(公告)号:US06763319B2

    公开(公告)日:2004-07-13

    申请号:US10159565

    申请日:2002-05-31

    IPC分类号: G01B1124

    CPC分类号: G01B5/012

    摘要: A stylus having a curvature radius of 1 mm or less is attached to the extremity of a probe. When the profile of an object is measured with high precision by causing the stylus to follow a measurement surface of the object, a reference ball for calibration is first measured, thereby surface profiling the object. From the measurement data, a contact position where the stylus contacts with the object is determined. A positional error caused by a curvature radius of the stylus is corrected by using an angle of inclination of the measurement surface in that contact position. The amount of profile error in the contact position is extracted by using the profile error data pertaining to the stylus determined by measurement of the reference ball. The amount of profile error is added to the measurement data, thereby correcting the profile error caused by the curvature radius of the stylus.

    摘要翻译: 将具有1mm或更小的曲率半径的触针连接到探针的末端。 当通过使触针跟随对象的测量表面来高精度地测量对象的轮廓时,首先测量用于校准的参考球,从而对对象进行表面轮廓。 从测量数据确定触针与对象接触的接触位置。 通过使用在该接触位置的测量表面的倾斜角来校正由触针的曲率半径引起的位置误差。 通过使用与通过测量参考球确定的触控笔有关的简档误差数据来提取接触位置中的轮廓误差量。 轮廓误差量被添加到测量数据中,从而校正由触针的曲率半径引起的轮廓误差。

    Apparatus and method for measuring flatness of thin plate
    6.
    发明授权
    Apparatus and method for measuring flatness of thin plate 失效
    测量薄板平整度的装置和方法

    公开(公告)号:US06710883B2

    公开(公告)日:2004-03-23

    申请号:US10140883

    申请日:2002-05-09

    IPC分类号: G01B902

    CPC分类号: G01B11/2441 G01B11/306

    摘要: The invention measures a thickness variation at a high accuracy around a wide range of a thin plate by a comparatively large spot diameter between 0.5 mm and 2 mm. A polarization beam splitter separating a laser beam emitted from a laser generator and transmitting through an isolator into a measurement light and a reference light is provided. A quarter wavelength plate is provided between the polarization beam splitter and a measurement surface, and between the polarization beam splitter and a reference surface. A focusing and reflecting means for focusing and reflecting the measurement light reflected by the measurement surface and reflected by the polarization beam splitter, and the reference light reflecting by the reference surface and transmitting through the polarization beam splitter is provided. A half mirror reflecting the measurement light and the reference light which return from the polarization beam splitter is provided. A light receiving portion receiving the measurement light and the reference light which are reflected by the half mirror so as to interfere, converting an interference light intensity change into an electric signal, and counting the electric signal so as to measure a flatness of the measurement surface is provided.

    摘要翻译: 本发明通过0.5mm至2mm之间的较大的光点直径来测量薄板宽范围内的高精度的厚度变化。 提供了将从激光发生器发射的激光束分离并通过隔离器传输到测量光和参考光的偏振分束器。 四分之一波长板设置在偏振分束器和测量表面之间以及偏振分束器与参考表面之间。 提供了用于聚焦和反射由测量表面反射并由偏振分束器反射的测量光以及由参考表面反射并通过偏振分束器透射的参考光的聚焦和反射装置。 提供了反射从偏振分束器返回的测量光和参考光的半反射镜。 接收由半反射镜反射的测量光和参考光的光接收部分,其干涉,将干涉光强度变化转换成电信号,并对电信号进行计数,以便测量测量表面的平坦度 被提供。

    Alignment apparatus for use in exposure system for optically
transferring pattern onto object
    7.
    发明授权
    Alignment apparatus for use in exposure system for optically transferring pattern onto object 失效
    用于将图案光学转印到物体上的曝光系统中的对准装置

    公开(公告)号:US5329354A

    公开(公告)日:1994-07-12

    申请号:US872216

    申请日:1992-04-22

    CPC分类号: G03F9/70

    摘要: An alignment apparatus for use in an exposure system for exposing fine patterns on a wafer, the alignment apparatus comprising a light source optical system for emitting coherent alignment light, a positional deviation detecting optical system for receiving the alignment light reflected from the wafer, and a light-receiving optical system for detecting a positional deviation of the wafer on the basis of the alignment light received by the positional deviation detecting optical system. These three optical systems are arranged to be coupled through flexible optical fibers to each other. This coupling arrangement using the flexible optical fiber can reduce the size of the positional deviation detecting optical system whereby the positional deviation detecting optical system can be disposed directly under a projection lens of the exposure system, thereby accurately effecting the alignment of the wafer with respect to the projection lens.

    摘要翻译: 一种用于曝光系统中用于在晶片上曝光精细图案的对准装置,该对准装置包括用于发射相干对准光的光源光学系统,用于接收从晶片反射的对准光的位置偏差检测光学系统,以及 光接收光学系统,用于基于由位置偏差检测光学系统接收到的对准光检测晶片的位置偏差。 这三个光学系统被布置成通过柔性光纤彼此耦合。 使用柔性光纤的这种耦合布置可以减小位置偏差检测光学系统的尺寸,由此位置偏移检测光学系统可以直接设置在曝光系统的投影透镜下方,从而精确地实现晶片相对于 投影镜头。

    Magnetic resonance imaging apparatus and vibrational error magnetic field reduction method
    9.
    发明授权
    Magnetic resonance imaging apparatus and vibrational error magnetic field reduction method 有权
    磁共振成像装置和振动误差磁场还原法

    公开(公告)号:US09453897B2

    公开(公告)日:2016-09-27

    申请号:US13817680

    申请日:2011-08-18

    摘要: Regardless of the measurement conditions, the degradation of the image quality due to a vibrational error magnetic field, which is generated by the vibration of the mechanical structure of an MRI apparatus, is reduced. In order to do so, error magnetic field image data indicating an error magnetic field distribution is acquired on the basis of an echo signal measured using a pulse sequence having a test gradient magnetic field, a parameter value of a damped vibration function showing a vibrational error magnetic field is calculated using the error magnetic field image data, and a correction magnetic field is calculated on the basis of the calculated parameter value of the damped vibration function showing the vibrational error magnetic field.

    摘要翻译: 不管测量条件如何,减少了由MRI装置的机械结构的振动产生的由振动误差磁场引起的图像质量的劣化。 为了这样做,基于使用具有测试梯度磁场的脉冲序列测量的回波信号,获得表示误差磁场分布的误差磁场图像数据,显示振动误差的阻尼振动函数的参数值 使用误差磁场图像数据计算磁场,并且基于计算出的表示振动误差磁场的阻尼振动函数的参数值来计算校正磁场。

    GRADIENT COIL DEVICE AND MAGNETIC RESONANCE IMAGING DEVICE
    10.
    发明申请
    GRADIENT COIL DEVICE AND MAGNETIC RESONANCE IMAGING DEVICE 有权
    梯度线圈装置和磁共振成像装置

    公开(公告)号:US20130335088A1

    公开(公告)日:2013-12-19

    申请号:US13979542

    申请日:2012-01-13

    IPC分类号: G01R33/385

    CPC分类号: G01R33/385 G01R33/4215

    摘要: A gradient coil device includes a major axis gradient coil, having an ellipse in a cross section generating a gradient magnetic field inclined in a major axis direction of the ellipse at a magnetic field space; and a minor axis gradient coil, having an ellipse in a cross section generating a gradient magnetic field inclined in a minor axis direction of the ellipse at the magnetic field space. A length of the minor axis field coil in the center axis direction is shorter than a length of the major axis gradient coil in the center axis direction. A maximum value of a residual magnetic field generated by the minor axis gradient coil at a space outside the magnetic field space is equal to or smaller than a maximum value of a residual magnetic field generated by the major axis gradient coil at a space outside the magnetic field space.

    摘要翻译: 梯度线圈装置包括长轴梯度线圈,在截面上具有椭圆形状,在磁场空间产生沿椭圆的长轴方向倾斜的梯度磁场; 以及短轴倾斜线圈,在截面中具有椭圆形状,在磁场空间产生在椭圆的短轴方向上倾斜的倾斜磁场。 短轴励磁线圈的中心轴方向的长度比中心轴方向的长轴梯度线圈的长度短。 在磁场空间外的空间处由短轴梯度线圈产生的剩余磁场的最大值等于或小于在磁性空间外的空间处由长轴梯度线圈产生的残余磁场的最大值 场地空间。