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    Color Filter, Process For Manufacturing Color Filter, And Liquid Crystal Display Device
    4.
    发明申请
    Color Filter, Process For Manufacturing Color Filter, And Liquid Crystal Display Device 审中-公开
    彩色滤光片，制造滤色片及液晶显示装置

    公开(公告)号：US20090009694A1

    公开(公告)日：2009-01-08

    申请号：US11664921

    申请日：2005-10-07

    申请人： Hideaki Ito ,  Hideyuki Nakamura ,  Mitsutoshi Tanaka ,  Haruhiko Yoshino

    发明人： Hideaki Ito ,  Hideyuki Nakamura ,  Mitsutoshi Tanaka ,  Haruhiko Yoshino

    IPC分类号： G02F1/1335 ,  G02B5/22 ,  B05D5/06 ,  B32B37/14

    CPC分类号： G02B5/223 ,  C09D7/41 ,  G02F1/133514

    摘要： A color filter including colored pixels of at least two or more colors, in which the colored pixels contain at least pigment particles, the contrast of each colored pixel is not lower than 2000 and the difference between the contrast of the colored pixel having the lowest contrast and the contrast of the colored pixel having the highest contrast among the colored pixels of two or more colors is not more than 600; a process for manufacturing the same; and a liquid crystal display device using the color filter.

    摘要翻译： 一种滤色器，包括至少两种或多种颜色的彩色像素，其中着色像素至少含有颜料颗粒，每个着色像素的对比度不低于2000，并且具有最低对比度的彩色像素的对比度之间的差异 两色以上彩色像素之间具有最高对比度的彩色像素的对比度不大于600; 其制造方法; 以及使用该滤色器的液晶显示装置。

    Process of producing patterned birefringent product
    5.
    发明授权
    Process of producing patterned birefringent product 有权
    生产图案双折射产品的方法

    公开(公告)号：US08236387B2

    公开(公告)日：2012-08-07

    申请号：US11943037

    申请日：2007-11-20

    申请人： Ichiro Amimori ,  Hideki Kaneiwa ,  Shinichi Morishima ,  Haruhiko Yoshino ,  Hidetoshi Tomita

    发明人： Ichiro Amimori ,  Hideki Kaneiwa ,  Shinichi Morishima ,  Haruhiko Yoshino ,  Hidetoshi Tomita

    IPC分类号： C08F2/46 ,  C08F2/48 ,  C08J7/18 ,  C08J7/04

    CPC分类号： G02B5/3083 ,  B42D25/364 ,  B42D25/391 ,  B42D25/455 ,  B42D2033/26 ,  G02B5/30 ,  G02B5/3016

    摘要： A process of readily producing a patterned birefringent product excellent in resolution and heat-resistance is provided. Said process comprises at least the following steps [1] to [3] in order: [1] preparing a birefringence pattern builder which comprises an optically anisotropic layer comprising a polymer, and said optically anisotropic layer has a retardation disappearance temperature in the range higher than 20° C., at said retardation disappearance temperature in-plane retardation becomes 30% or lower of the retardation at 20° C. of the same optically anisotropic layer, and said retardation disappearance temperature rises by light exposure; [2] subjecting the birefringence pattern builder to patterned light exposure; [3] heating the laminated structure obtained after the step [2] at 50° C. or higher and 400° C. or lower.

    摘要翻译： 提供了易于产生分辨率和耐热性优异的图案化双折射产品的方法。 所述方法至少包括以下步骤[1]至[3]：[1]制备双折射图案生成剂，其包含包含聚合物的光学各向异性层，并且所述光学各向异性层在较高的范围内具有延迟消失温度 在所述相位消失温度面内相位差为相同的光学各向异性层的20℃的相位差的30％以下时，所述延迟消失温度由于曝光而上升， [2]对双折射图案构造器进行图案化曝光; [3]将步骤[2]得到的叠层结构体在50℃以上且400℃以下进行加热。

    Process of Producing Patterned Birefringent Product
    6.
    发明申请
    Process of Producing Patterned Birefringent Product 有权
    生产图案双折射产品的工艺

    公开(公告)号：US20080143926A1

    公开(公告)日：2008-06-19

    申请号：US11943037

    申请日：2007-11-20

    申请人： Ichiro Amimori ,  Hideki Kaneiwa ,  Shinichi Morishima ,  Haruhiko Yoshino ,  Hidetoshi Tomita

    发明人： Ichiro Amimori ,  Hideki Kaneiwa ,  Shinichi Morishima ,  Haruhiko Yoshino ,  Hidetoshi Tomita

    IPC分类号： G02F1/13363 ,  B29D11/00 ,  G02F1/13

    CPC分类号： G02B5/3083 ,  B42D25/364 ,  B42D25/391 ,  B42D25/455 ,  B42D2033/26 ,  G02B5/30 ,  G02B5/3016

    摘要： A process of readily producing a patterned birefringent product excellent in resolution and heat-resistance is provided. Said process comprises at least the following steps [1] to [3] in order: [1] preparing a birefringence pattern builder which comprises an optically anisotropic layer comprising a polymer, and said optically anisotropic layer has a retardation disappearance temperature in the range higher than 20° C., at said retardation disappearance temperature in-plane retardation becomes 30% or lower of the retardation at 20° C. of the same optically anisotropic layer, and said retardation disappearance temperature rises by light exposure; [2] subjecting the birefringence pattern builder to patterned light exposure; [3] heating the laminated structure obtained after the step [2] at 50° C. or higher and 400° C. or lower.

    摘要翻译： 提供了易于产生分辨率和耐热性优异的图案化双折射产品的方法。 所述方法至少包括以下步骤[1]至[3]：[1]制备双折射图案生成剂，其包含包含聚合物的光学各向异性层，并且所述光学各向异性层在较高的范围内具有延迟消失温度 在所述相位消失温度面内相位差为相同的光学各向异性层的20℃的相位差的30％以下时，所述延迟消失温度由于曝光而上升， [2]对双折射图案构造器进行图案化曝光; [3]将步骤[2]得到的叠层结构体在50℃以上且400℃以下进行加热。