公开(公告)号：US20080268374A1

公开(公告)日：2008-10-30

申请号：US11632163

申请日：2005-07-14

Applicant: Tomoko Tashiro ,  Morimasa Sato ,  Yoshiharu Sasaki ,  Yuichi Wakata ,  Takashi Takayanagi

Inventor： Tomoko Tashiro ,  Morimasa Sato ,  Yoshiharu Sasaki ,  Yuichi Wakata ,  Takashi Takayanagi

IPC: G03F7/20 ,  G03C1/00

CPC classification number: G03F7/031 ,  G03F7/0045 ,  G03F7/028 ,  G03F7/029 ,  G03F7/0295

Abstract: A photosensitive composition having an extremely constant photosensitivity distribution relative to an exposure light having a wavelength of 400 nm to 410 nm, and excelling in pattern reproductivity, suppressing variations in pattern formation; a pattern forming material and a photosensitive laminate with the photosensitive composition laminated thereon; and a pattern forming apparatus and a pattern forming process.The photosensitive composition contains a binder, a polymerizable compound, and a photopolymerization initiator; the photosensitive composition has a maximum spectral sensitivity in the wavelength range of 380 nm to 420 nm; the minimum exposure dose S400 capable of forming a pattern at a wavelength of 400 nm of the photosensitive composition is 300 mJ/cm2 or less; the minimum exposure dose S410 capable of forming a pattern at a wavelength of 410 nm of the photosensitive composition is 300 mJ/cm2 or less; and S400 and S410 satisfy the relation 0.6

Abstract translation: 相对于波长为400nm〜410nm的曝光光具有极不均匀的感光性分布，图案再现性优异的感光性组合物，抑制图案形成的变化; 图案形成材料和感光层压体，其上层压有感光组合物; 以及图案形成装置和图案形成工序。 光敏组合物含有粘合剂，可聚合化合物和光聚合引发剂; 光敏组合物在380nm至420nm的波长范围内具有最大光谱灵敏度; 能够形成光敏组合物的波长400nm的图案的最小曝光量S 400> 300mJ / cm 2以下; 能够形成感光性组合物的波长410nm的图案的最小曝光量S 410为300mJ / cm 2以下; 并且S＆lt; 400＆gt;和＆lt; S＆lt; 410＆lt;满足关系式0.6＆lt; S＆lt; 400＆gt;＆lt; 410＆lt; 1.6。

公开(公告)号：US20070252927A1

公开(公告)日：2007-11-01

申请号：US11715403

申请日：2007-03-08

Applicant: Mitsuyoshi Ichihashi ,  Hisashi Okamura ,  Morimasa Sato ,  Shinichi Morishima

Inventor： Mitsuyoshi Ichihashi ,  Hisashi Okamura ,  Morimasa Sato ,  Shinichi Morishima

IPC: G02F1/1335

CPC classification number: G02F1/13363 ,  G02F2001/133565 ,  G02F2001/133633 ,  G02F2001/133638 ,  G02F2203/09 ,  G02F2413/02 ,  G02F2413/09

Abstract: A novel liquid crystal display is disclosed. The liquid crystal display comprises a backlight, a pair of substrates, a liquid crystal layer disposed between the pair of substrates, a color filter, reflective portions, transmissive portions, and a retardation layer disposed between the pair of substrates in each of the transmissive portions. The retardation layer comprises a liquid crystal material fixed in a hybrid state, and the retardation layer has a retardation which varies depending on a wavelength of the color filter.

Abstract translation: 公开了一种新型液晶显示器。 液晶显示器包括背光源，一对基板，设置在一对基板之间的液晶层，滤色器，反射部分，透射部分和设置在每个透射部分中的一对基板之间的延迟层 。 延迟层包括以混合状态固定的液晶材料，并且延迟层具有根据滤色器的波长而变化的延迟。

公开(公告)号：US20070159584A1

公开(公告)日：2007-07-12

申请号：US11710476

申请日：2007-02-26

Applicant: Morimasa Sato

Inventor： Morimasa Sato

IPC: G02F1/1337

CPC classification number: G03F7/0007 ,  G02B5/201 ,  G03F7/095

Abstract: An image forming method of the invention is an image forming method comprising the steps of exposing, through a photo mask, a substrate, on which a first negative photosensitive resin layer and second negative photosensitive resin layer are formed, wherein the photo mask is a photo mask having at least two light transmittable patterns, and the photosensitivity ratio of the first negative photosensitive resin layer to the second negative photosensitive resin layer is more than 1. This method makes it possible to form an image easily, which is used suitably by a reflection and transmission LCD display wherein the film thickness of a colored layer is partially varied in each pixel, and to easily form a spacer and a projection for orientation control.

公开(公告)号：US5750292A

公开(公告)日：1998-05-12

申请号：US676837

申请日：1996-07-08

Applicant: Morimasa Sato ,  Takekatsu Sugiyama

Inventor： Morimasa Sato ,  Takekatsu Sugiyama

IPC: G03F7/004 ,  C07D251/24 ,  C08F2/44 ,  C08F2/48 ,  C08K5/3477 ,  C08K5/3492 ,  C08L33/00 ,  C08L33/04 ,  G02B5/20 ,  G03C7/12 ,  G03F7/00 ,  G03F7/031 ,  G03F7/40 ,  G03C3/00 ,  C07D251/00

CPC classification number: G03F7/031 ,  C07D251/24 ,  G03C7/12 ,  G03F7/0007 ,  G03F7/40

Abstract: A compound represented by the following general formula (1) and a photosensitive resin composition comprising the compound of formula (1): ##STR1## The compound of formula (1) normally has a low ultraviolet absorption, but has a high ultraviolet absorption when heat-treated. The present invention also provides a photosensitive resin layer composition which has a low ultraviolet absorption in an appropriate wavelength range such that ultraviolet rays reach sufficiently deep into the film to effect curing when exposed to light, but which has a high ultraviolet absorption when subsequently processed.

Abstract translation: 由以下通式（1）表示的化合物和包含式（1）化合物的光敏树脂组合物：（1）式（1）化合物通常具有低的紫外吸收，但具有高的紫外线 热处理时吸收。 本发明还提供一种感光性树脂层组合物，其在适当的波长范围内具有低的紫外线吸收，使得紫外线充分深入到膜中以在曝光时实现固化，但是当其后处理时具有高的紫外线吸收。

公开(公告)号：US5663212A

公开(公告)日：1997-09-02

申请号：US191927

申请日：1994-02-04

Applicant: Yuichi Wakata ,  Morimasa Sato ,  Ken Iwakura ,  Yuuichi Fukushige

Inventor： Yuichi Wakata ,  Morimasa Sato ,  Ken Iwakura ,  Yuuichi Fukushige

IPC: G03F7/027 ,  G03F7/09 ,  C08K5/00 ,  C08J3/28 ,  G03C1/73 ,  G03F7/00

CPC classification number: G03F7/027 ,  G03F7/091 ,  Y10S430/111 ,  Y10S522/907

Abstract: A light-sensitive resin composition which can be developed in an alkaline aqueous solution and has an excellent image-forming performance and a sufficient UV absorbance after an image formation is disclosed. The light-sensitive resin composition includes (1) a photopolymerization initiator or a photopolymerization initiator system, (2) an addition-polymerizable monomer having an ethylenically unsaturated double bond, (3) a high molecular binder which is soluble in an alkaline aqueous solution and insoluble in water, and (4) at least one of the compounds which substantially do not absorb light in a specified UV region and which, when subjected to treatment with an aqueous alkali solution and/or to heating, are capable of absorbing light in that region and have substantially no absorption in the visible region.

Abstract translation: 公开了可以在碱性水溶液中显影并且在成像后具有优异的成像性能和足够的UV吸光度的感光树脂组合物。 感光性树脂组合物包括（1）光聚合引发剂或光聚合引发剂体系，（2）具有烯属不饱和双键的可加成聚合单体，（3）可溶于碱性水溶液的高分子粘合剂和 不溶于水，以及（4）至少一种在特定UV区域基本上不吸收光的化合物中的至少一种，当用碱水溶液和/或加热处理时，其能够吸收光，因为 并且在可见光区域基本上没有吸收。

公开(公告)号：US5409800A

公开(公告)日：1995-04-25

申请号：US217754

申请日：1994-03-25

Applicant: Morimasa Sato ,  Masayuki Iwasaki ,  Fumiaki Shinozaki ,  Koji Inoue

Inventor： Morimasa Sato ,  Masayuki Iwasaki ,  Fumiaki Shinozaki ,  Koji Inoue

IPC: G03F3/10 ,  G03F7/16 ,  G03F7/34 ,  H05K3/00 ,  G03C1/805

CPC classification number: G03F7/161 ,  G03F3/10 ,  G03F7/346 ,  H05K3/0079

Abstract: A photosensitive transfer material comprises a temporary substrate having provided thereon an alkali-soluble thermoplastic resin layer, an intermediate layer, and a photosensitive resin layer in this order, the interlaminar adhesion in the transfer material being the smallest at the interface between the thermoplastic resin layer and the temporary substrate. The photosensitive resin layer can be transferred to a permanent substrate without involving failure due to fine dust, air bubbles or unevenness of the permanent substrate. An image can be formed with the transfer material by adhering the transfer material to a permanent substrate at least under heat and, after stripping the temporary substrate, imagewise exposing the photosensitive resin layer to light, and processing the transferred layers to develop the photosensitive resin layer. If the thermoplastic resin layer and the intermediate layer are first removed with a processing method with which the photosensitive resin layer is not substantially developed and then the photosensitive resin layer is developed using a processing solution other than used for revmoving the thermoplastic resin layer and the intermediate layer, excessive fatigue of the developing solution for the photosensitive resin layer and unevenness of development can be prevented.

Abstract translation: 光敏转印材料包括依次设置有碱溶性热塑性树脂树脂层，中间层和感光性树脂层的临时基材，在热塑性树脂层之间的界面处，转印材料中的层间粘合力最小 和临时衬底。 可以将感光性树脂层转印到永久性基板上，而不会由于细小的灰尘，气泡或永久基板的不均匀性而导致故障。 可以通过至少在加热下将转印材料粘附到永久性基板上，并且在剥离临时基板之后，使感光性树脂层成像曝光，并且处理转印层以显影感光性树脂层 。 如果首先用感光性树脂层未显影的处理方法去除热塑性树脂层和中间层，然后使用除了用于将热塑性树脂层和中间体的旋转以外的处理溶液使感光性树脂层显影 可以防止感光性树脂层的显影液的过度疲劳和显影不均匀。

公开(公告)号：US20090040433A1

公开(公告)日：2009-02-12

申请号：US12162581

申请日：2007-02-02

Applicant: Yasuhiro Aiki ,  Shinichi Morishima ,  Morimasa Sato ,  Mitsuyoshi Ichihashi

Inventor： Yasuhiro Aiki ,  Shinichi Morishima ,  Morimasa Sato ,  Mitsuyoshi Ichihashi

IPC: G02F1/13363 ,  G02B5/20 ,  B05D5/06

CPC classification number: G02F1/133516 ,  G02F1/13363 ,  G02F2001/133565 ,  G02F2413/02 ,  G02F2413/07 ,  G02F2413/09

Abstract: A novel liquid crystal display device is disclosed. The liquid crystal display device comprises a first substrate, a second substrate, liquid crystal held between the first substrate and the second substrate, patterned layers divided into fine areas, disposed on the first substrate, comprising at least a patterned color filter layer and a patterned first optically anisotropic layer laminated in the direction of the normal line of the substrate, and a barrier wall disposed at a boundary portion of the adjacent fine areas of the patterned layers.

Abstract translation: 公开了一种新颖的液晶显示装置。 液晶显示装置包括第一基板，第二基板，保持在第一基板和第二基板之间的液晶，设置在第一基板上的被划分成精细区域的图案化层，至少包括图案化滤色器层和图案化图案 在基板的法线方向上层压的第一光学各向异性层和设置在图案化层的相邻细小区域的边界部分的阻挡壁。

公开(公告)号：US20080118867A1

公开(公告)日：2008-05-22

申请号：US11596056

申请日：2005-05-09

Applicant: Morimasa Sato ,  Tomoko Tashiro ,  Masanobu Takashima ,  Shinichiro Serizawa

Inventor： Morimasa Sato ,  Tomoko Tashiro ,  Masanobu Takashima ,  Shinichiro Serizawa

IPC: G03F7/039 ,  G03F7/26 ,  G03B27/54

CPC classification number: G03F7/2008 ,  G03F7/0007 ,  G03F7/001 ,  G03F7/029 ,  G03F7/0295 ,  G03F7/031 ,  G03F7/033 ,  G03F7/09

Abstract: The objects of the present invention are to provide pattern forming materials capable of effectively suppressing sensitivity drop of photosensitive layers as well as capable of forming highly fine and precise patterns, pattern forming apparatuses equipped with the pattern forming materials, and pattern forming processes utilizing the pattern forming materials. In order to attain the objects, a pattern forming material is provided which comprises a support, and a photosensitive layer on the support, wherein the photosensitive layer comprises a polymerization inhibitor, a binder, a polymerizable compound, and a photopolymerization initiator, the photosensitive layer is exposed by means of a laser beam and developed by means of a developer to form a pattern, and the minimum energy of the laser beam is 0.1 mJ/cm2 to 10 mJ/cm2, which is required to yield substantially the same thickness of photosensitive layer subsequent to the developing as the thickness of the photosensitive layer prior to the exposing.

Abstract translation: 本发明的目的是提供能够有效抑制感光层的灵敏度下降以及能够形成高精度和精确图案的图案形成材料，配备有图案形成材料的图案形成装置和利用图案的图案形成工艺 成型材料。 为了达到上述目的，提供了一种图案形成材料，其包括载体和载体上的感光层，其中感光层包含聚合抑制剂，粘合剂，可聚合化合物和光聚合引发剂，感光层 通过激光束曝光并通过显影剂显影以形成图案，并且激光束的最小能量为0.1mJ / cm 2至10mJ / cm 2 需要在曝光之前在感光层的厚度显影之后产生基本上相同厚度的感光层。

公开(公告)号：US07195847B2

公开(公告)日：2007-03-27

申请号：US10372231

申请日：2003-02-25

Applicant: Morimasa Sato

Inventor： Morimasa Sato

IPC: G02B5/20

CPC classification number: G03F7/0007 ,  G02B5/201 ,  G03F7/095

Abstract: An image forming method of the invention is an image forming method comprising the steps of exposing, through a photo mask, a substrate, on which a first negative photosensitive resin layer and second negative photosensitive resin layer are formed, wherein the photo mask is a photo mask having at least two light transmittable patterns, and the photosensitivity ratio of the first negative photosensitive resin layer to the second negative photosensitive resin layer is more than 1. This method makes it possible to form an image easily, which is used suitably by a reflection and transmission LCD display wherein the film thickness of a colored layer is partially varied in each pixel, and to easily form a spacer and a projection for orientation control.

Abstract translation: 本发明的图像形成方法是一种图像形成方法，包括以下步骤：通过光掩模曝光形成有第一负感光性树脂层和第二负型感光性树脂层的基板，其中，所述光掩模为照片 具有至少两个可透光图案的掩模，并且第一负感光性树脂层与第二负型感光性树脂层的光敏比大于1.该方法使得可以容易地形成图像，其被适当地用于反射 以及透明LCD显示器，其中着色层的膜厚度在每个像素中部分变化，并且容易地形成间隔件和用于取向控制的突起。

公开(公告)号：US5622794A

公开(公告)日：1997-04-22

申请号：US354870

申请日：1994-12-09

Applicant: Morimasa Sato ,  Masayuki Iwasaki ,  Haruhiko Yoshino

Inventor： Morimasa Sato ,  Masayuki Iwasaki ,  Haruhiko Yoshino

IPC: G03F7/004 ,  C08F2/50 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/00 ,  G03F7/027 ,  G03F7/029 ,  G03F7/34 ,  G03F7/38 ,  G03F9/00

CPC classification number: G03F7/0007 ,  C08F2/50 ,  G02F1/133512 ,  G03F7/027

Abstract: A light-shielding photosensitive resin composition comprising (1) an alkali-soluble binder, (2) a photo-polymerization initiator, (3) an addition-polymerizing monomer having one or more ethylenic, unsaturated double bonds, and (4) one or more colorants, wherein said photo-polymerization initiator is substantially insensitive to light having a wavelength of 400 nm or longer. The composition is preferably coated on a temporary support to form a transfer material. Using the composition or the transfer material, a flat, light-shielding film having a high optical density may be formed on a color filter by self-alignment exposure without using an optical filter.

Abstract translation: 一种遮光性感光性树脂组合物，其特征在于，含有（1）碱溶性粘合剂，（2）光聚合引发剂，（3）具有1个以上烯键式不饱和双键的加成聚合单体和（4） 更多着色剂，其中所述光聚合引发剂对波长为400nm或更长的光基本不敏感。 该组合物优选涂覆在临时载体上以形成转印材料。 使用组合物或转印材料，可以通过自对准曝光而不使用滤光器而在滤色器上形成具有高光密度的平坦的遮光膜。