公开(公告)号：US20200071118A1

公开(公告)日：2020-03-05

申请号：US16678438

申请日：2019-11-08

申请人： Ken Sawada ,  Shigeru Mizuno ,  Hiroyuki Kuno ,  Takuya Fukuhara

发明人： Ken Sawada ,  Shigeru Mizuno ,  Hiroyuki Kuno ,  Takuya Fukuhara

IPC分类号： B65H45/14

摘要： A sheet processing apparatus that forms a folding line on a sheet includes first and second folding rollers that form a folding line on the sheet by rotating a bent sheet while pinching from sheet surfaces and a first pressing unit that presses the second folding roller against the first folding roller in an arbitrary portion in a rotating shaft direction of the second folding roller.

公开(公告)号：US10124981B2

公开(公告)日：2018-11-13

申请号：US15613583

申请日：2017-06-05

申请人： Ken Sawada ,  Shigeru Mizuno ,  Hiroyuki Kuno ,  Takuya Fukuhara

发明人： Ken Sawada ,  Shigeru Mizuno ,  Hiroyuki Kuno ,  Takuya Fukuhara

IPC分类号： B65H45/14

摘要： A sheet processing apparatus that forms a folding line on a sheet includes first and second folding rollers that form a folding line on the sheet by rotating a bent sheet while pinching from sheet surfaces and a first pressing unit that presses the second folding roller against the first folding roller in an arbitrary portion in a rotating shaft direction of the second folding roller.

公开(公告)号：US09688502B2

公开(公告)日：2017-06-27

申请号：US14706153

申请日：2015-05-07

申请人： Ken Sawada ,  Shigeru Mizuno ,  Hiroyuki Kuno ,  Takuya Fukuhara

发明人： Ken Sawada ,  Shigeru Mizuno ,  Hiroyuki Kuno ,  Takuya Fukuhara

IPC分类号： B65H45/14

CPC分类号： B65H45/14 ,  B65H2220/08 ,  B65H2511/224 ,  B65H2801/27

摘要： A sheet processing apparatus that forms a folding line on a sheet includes first and second folding rollers that form a folding line on the sheet by rotating a bent sheet while pinching from sheet surfaces and a first pressing unit that presses the second folding roller against the first folding roller in an arbitrary portion in a rotating shaft direction of the second folding roller.

公开(公告)号：US10519000B2

公开(公告)日：2019-12-31

申请号：US16116161

申请日：2018-08-29

申请人： Ken Sawada ,  Shigeru Mizuno ,  Hiroyuki Kuno ,  Takuya Fukuhara

发明人： Ken Sawada ,  Shigeru Mizuno ,  Hiroyuki Kuno ,  Takuya Fukuhara

IPC分类号： B65H45/14

摘要： A sheet processing apparatus that forms a folding line on a sheet includes first and second folding rollers that form a folding line on the sheet by rotating a bent sheet while pinching from sheet surfaces and a first pressing unit that presses the second folding roller against the first folding roller in an arbitrary portion in a rotating shaft direction of the second folding roller.

公开(公告)号：US20240034580A1

公开(公告)日：2024-02-01

申请号：US18356639

申请日：2023-07-21

申请人： Yusuke Tanaka ,  Kentaroh Fukami ,  Shigeyuki Itoh ,  Atsushi Kuriyama ,  Yuuki Nakagawa ,  Yiru Chen ,  Ken Sawada ,  Takuya Fukuhara ,  Ryoh Suzuki ,  Yasuo Ohba ,  Akikazu Iwata

发明人： Yusuke Tanaka ,  Kentaroh Fukami ,  Shigeyuki Itoh ,  Atsushi Kuriyama ,  Yuuki Nakagawa ,  Yiru Chen ,  Ken Sawada ,  Takuya Fukuhara ,  Ryoh Suzuki ,  Yasuo Ohba ,  Akikazu Iwata

IPC分类号： B65H5/06

CPC分类号： B65H5/062 ,  B65H2404/6111 ,  B65H2403/94 ,  B65H2402/44 ,  B65H2801/03 ,  B65H2801/24

摘要： A sheet processing apparatus includes a first guide plate and a second guide plate facing with a given space in a thickness direction and having second and third openings, a sheet conveyance passage between the first and second guide plates, and a sheet conveyor including a drive source, a drive roller, a first driven roller, and a second driven roller. The drive roller protrudes from the first guide plate toward the sheet conveyance passage through the first opening. The first driven roller faces the drive roller and protrudes from the second guide plate toward the sheet conveyance passage through the second opening. The second driven roller protrudes from the second guide plate toward the sheet conveyance passage through the third opening. The second driven roller is disposed at a position shifted from the drive roller in a width direction orthogonal to the sheet conveyance direction and the thickness direction.

公开(公告)号：US20230348223A1

公开(公告)日：2023-11-02

申请号：US18304590

申请日：2023-04-21

申请人： Takuya Fukuhara ,  Ken Sawada ,  Ryoh Suzuki ,  Kentaroh Fukami ,  Atsushi Kuriyama ,  Yusuke Tanaka ,  Yuuki Nakagawa ,  Yasuo Ohba ,  Akikazu Iwata

发明人： Takuya Fukuhara ,  Ken Sawada ,  Ryoh Suzuki ,  Kentaroh Fukami ,  Atsushi Kuriyama ,  Yusuke Tanaka ,  Yuuki Nakagawa ,  Yasuo Ohba ,  Akikazu Iwata

IPC分类号： B65H39/06

CPC分类号： B65H39/06 ,  B65H2513/10 ,  B65H2513/51

摘要： A sheet processing apparatus includes a sheet conveyance passage, a sheet circulation passage, a first conveyor, a second conveyor, a third conveyor, and circuitry. In the sheet circulation passage, a sheet is circulated to be overlaid with a following sheet in the sheet conveyance passage. The circuitry circulates the sheet in the sheet circulation passage to overlay the sheet with the following sheet conveyed after the sheet in the first sheet conveyance passage, at an upstream position of the first sheet conveyance passage, and adjusts a sheet conveyance speed of the third conveyor to circulate the sheet, based on a reduction amount that is obtained when a preceding amount of a leading end of the following sheet with respect to a leading end of the sheet is reduced while the following sheet is temporarily stopped due to a temporary stop of the first conveyor.

公开(公告)号：US08786061B2

公开(公告)日：2014-07-22

申请号：US13439025

申请日：2012-04-04

申请人： Ken Sawada

发明人： Ken Sawada

IPC分类号： H01L23/58 ,  H01L23/552 ,  H01L23/48 ,  H01L23/52 ,  H01L29/40

CPC分类号： H01L23/5384 ,  H01L23/5225 ,  H01L23/5286 ,  H01L23/552 ,  H01L23/66 ,  H01L24/34 ,  H01L25/0657 ,  H01L2223/6616 ,  H01L2223/6627 ,  H01L2225/06537 ,  H01L2225/06544 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/00 ,  H01L2224/37099 ,  H01L2224/37599 ,  H01L2224/8385

摘要： A semiconductor device includes a first semiconductor substrate and a second semiconductor substrate laminated with an insulating layer, a first transmission line formed on the first semiconductor substrate, the first transmission line including a signal line and a ground, a second transmission line formed on the second semiconductor substrate, the second transmission line including a signal line and a ground, a first via layer for the signal lines, the first via layer for the signal lines being formed of a conductor layer formed within a via hole, a first via layer for the grounds, the first via layer for the grounds being formed of a conductor layer formed within a via hole, and a second via layer for the grounds, the second via layer for the grounds being formed of a conductor layer formed within a via hole.

摘要翻译： 半导体器件包括第一半导体衬底和层压有绝缘层的第二半导体衬底，形成在第一半导体衬底上的第一传输线，包括信号线和接地的第一传输线，形成在第二半导体衬底上的第二传输线 半导体衬底，第二传输线包括信号线和接地，用于信号线的第一通孔层，用于信号线的第一通孔层由形成在通孔内的导体层形成，第一通孔层用于 接地，用于由形成在通孔内的导体层形成的接地的第一通孔层和用于接地的第二通孔层，用于接地的第二通孔层由形成在通孔内的导体层形成。

公开(公告)号：US20100051854A1

公开(公告)日：2010-03-04

申请号：US12531772

申请日：2008-03-11

申请人： Ken Sawada ,  Yuji Shimomura ,  Katsuya Takigawa

发明人： Ken Sawada ,  Yuji Shimomura ,  Katsuya Takigawa

IPC分类号： C09K5/00 ,  C10M129/74

CPC分类号： C10M105/38 ,  C10M2207/2835 ,  C10N2220/028 ,  C10N2220/306 ,  C10N2230/02 ,  C10N2230/06 ,  C10N2230/08 ,  C10N2240/30

摘要： The refrigerating machine oil of the invention is characterized by comprising an ester of a polyhydric alcohol and fatty acids with a content of a C10-C13 branched fatty acid of 50% by mole or greater. The working fluid composition for a refrigerating machine of the invention is characterized in that the working fluid composition comprises an ester of a polyhydric alcohol and fatty acids with a content of a C10-C13 branched fatty acid of 50% by mole or greater, and a refrigerant.

摘要翻译： 本发明的冷冻机油的特征在于，含有多元醇的酯和C10〜C13支链脂肪酸的含量为50摩尔％以上的脂肪酸。 本发明的制冷机的工作流体组合物的特征在于，工作流体组合物含有多元醇的酯和碳数为C 10〜C 13的支链脂肪酸的脂肪酸为50摩尔％以上， 制冷剂

公开(公告)号：US20090200507A1

公开(公告)日：2009-08-13

申请号：US12293846

申请日：2007-03-20

申请人： Kazuo Tagawa ,  Ken Sawada ,  Yuji Shimomura ,  Katsuya Takigawa ,  Jiro Hashimoto ,  Masataka Negishi

发明人： Kazuo Tagawa ,  Ken Sawada ,  Yuji Shimomura ,  Katsuya Takigawa ,  Jiro Hashimoto ,  Masataka Negishi

IPC分类号： C09K5/00

CPC分类号： C10M105/38 ,  C10M171/008 ,  C10M2207/2835 ,  C10N2220/306 ,  C10N2230/02 ,  C10N2230/06 ,  C10N2240/30

摘要： The base oil for the refrigerating machine oil used with a carbon dioxide refrigerant of the invention is characterized by comprising a complete ester of a fatty acid in which the proportion of C14-C22 branched fatty acid is 40-100% by mole and a polyhydric alcohol. The refrigerating machine oil used with a carbon dioxide refrigerant according to the invention is characterized by comprising the base oil for the refrigerating machine oil used with a carbon dioxide refrigerant according to the invention. The base oil for the refrigerating machine oil used with a carbon dioxide refrigerant and the refrigerating machine oil used with a carbon dioxide refrigerant according to the invention, when used together with a carbon dioxide refrigerant, exhibit excellent stability and electrical insulating properties, and have suitable compatibility with refrigerants while allowing adequate lubricity to be exhibited without increasing the viscosity of the base oil.

摘要翻译： 本发明的与二氧化碳制冷剂一起使用的制冷机油的基础油，其特征在于，含有脂肪酸的完全酯，其中C14-C22支链脂肪酸的比例为40〜100摩尔％，多元醇 。 与根据本发明的二氧化碳制冷剂一起使用的冷冻机油的特征在于包括用于根据本发明的二氧化碳制冷剂的冷冻机油的基础油。 与二氧化碳制冷剂一起使用的冷冻机油的基础油和本发明的与二氧化碳制冷剂一起使用的冷冻机油与二氧化碳制冷剂一起使用时，具有优异的稳定性和电绝缘性， 与制冷剂的相容性同时允许显示足够的润滑性而不增加基础油的粘度。

公开(公告)号：US07429446B2

公开(公告)日：2008-09-30

申请号：US10804179

申请日：2004-03-19

申请人： Ken Sawada ,  Kozo Makiyama

发明人： Ken Sawada ,  Kozo Makiyama

IPC分类号： G03F7/26

CPC分类号： G03F7/40 ,  G03F7/023

摘要： A photoresist film 12 is formed on a substrate 10. In the photoresist film 12, an opening 13 having higher hydrophilicity and higher affinity with a chemical liquid 16 for swelling the photoresist film at upper part of the sidewall is formed down to the substrate 10. The chemical liquid 16 is reacted with the photoresist film 12 with the opening formed in to swell the photoresist film 16 to thereby reverse-taper the sidewall of the opening. Whereby the photoresist film having an opening diameter beyond a resolution of the photoresist material and the sidewall of the opening reverse-tapered can be easily formed.

摘要翻译： 在基板10上形成光刻胶膜12。 在光致抗蚀剂膜12中，向衬底10形成与侧壁上部的光致抗蚀剂膜膨胀的化学液体16亲水性高，亲和性高的开口13。 化学液体16与光致抗蚀剂膜12反应，其中形成有开口以使光致抗蚀剂膜16膨胀，从而使开口的侧壁反向锥形化。 由此可以容易地形成具有超过光致抗蚀剂材料的分辨率的开口直径和反向锥形开口的侧壁的光致抗蚀剂膜。