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    Method of processing resist, semiconductor device, and method of producing the same
    3.
    发明授权
    Method of processing resist, semiconductor device, and method of producing the same 有权
    抗蚀剂的加工方法，半导体装置及其制造方法

    公开(公告)号：US08410616B2

    公开(公告)日：2013-04-02

    申请号：US12659970

    申请日：2010-03-26

    申请人： Kozo Makiyama ,  Ken Sawada

    发明人： Kozo Makiyama ,  Ken Sawada

    IPC分类号： H01L21/302 ,  H01L23/48 ,  H01L29/76

    CPC分类号： G03F7/40 ,  H01L21/0273 ,  H01L21/28114 ,  H01L21/76802 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A surface component film (2) is etched using a resist (3) as a mask, and the surface component film (2) is patterned according to the shape of an aperture (3a). This results in a step portion (4) having the same shape as the aperture (3a), with the sidewall (4a) of the step portion (4) exposed through the aperture (3a). The aperture (3a) is spin-coated with a shrink agent, reacted at a first temperature, and developed to shrink the aperture (3a). To control the shrinkage with high accuracy, in the first round of reaction, the aperture is shrunk by, for example, about half of the desired shrinkage. The aperture (3a) is further spin-coated with a shrink agent, reacted at a second temperature, and developed to shrink the aperture (3a). In this embodiment, the second-round shrink process will result in the desired aperture length. The second temperature is adjusted based on the shrinkage in the first round. With respect to a resist using short-wavelength light (short-wavelength resist) or a resist using electron beam (electron beam resist), a minute aperture can be obtained with stable shrink effect and accurate control of the length thereof.

    摘要翻译： 使用抗蚀剂（3）作为掩模蚀刻表面成分膜（2），根据孔（3a）的形状对表面成分膜（2）进行图案化。 这导致台阶部分（4）具有与孔（3a）相同的形状，台阶部分（4）的侧壁（4a）通过孔（3a）露出。 孔（3a）用收缩剂旋涂，在第一温度下反应并显影以收缩孔（3a）。 为了高精度地控制收缩，在第一轮反应中，孔径例如缩小了所需收缩的大约一半。 孔（3a）进一步用收缩剂进行旋涂，在第二温度下反应并显影以收缩孔（3a）。 在该实施例中，第二次收缩过程将导致期望的孔径长度。 第二个温度根据第一轮的收缩率进行调整。 对于使用短波长光（短波长抗蚀剂）的抗蚀剂或使用电子束（电子束抗蚀剂）的抗蚀剂，可以获得具有稳定的收缩效果和其长度的精确控制的微小孔径。

    Refrigerating machine oil for carbon dioxide refrigerant
    10.
    发明授权
    Refrigerating machine oil for carbon dioxide refrigerant 有权
    二氧化碳制冷剂冷冻机油基础油和二氧化碳制冷剂制冷机油

    公开(公告)号：US07993543B2

    公开(公告)日：2011-08-09

    申请号：US12293846

    申请日：2007-03-20

    申请人： Kazuo Tagawa ,  Ken Sawada ,  Yuji Shimomura ,  Katsuya Takigawa ,  Jiro Hashimoto ,  Masataka Negishi

    发明人： Kazuo Tagawa ,  Ken Sawada ,  Yuji Shimomura ,  Katsuya Takigawa ,  Jiro Hashimoto ,  Masataka Negishi

    IPC分类号： C09K5/04

    CPC分类号： C10M105/38 ,  C10M171/008 ,  C10M2207/2835 ,  C10N2220/306 ,  C10N2230/02 ,  C10N2230/06 ,  C10N2240/30

    摘要： The base oil for the refrigerating machine oil used with a carbon dioxide refrigerant of the invention is characterized by comprising a complete ester of a fatty acid in which the proportion of C14-C22 branched fatty acid is 40-100% by mole and a polyhydric alcohol. The refrigerating machine oil used with a carbon dioxide refrigerant according to the invention is characterized by comprising the base oil for the refrigerating machine oil used with a carbon dioxide refrigerant according to the invention. The base oil for the refrigerating machine oil used with a carbon dioxide refrigerant and the refrigerating machine oil used with a carbon dioxide refrigerant according to the invention, when used together with a carbon dioxide refrigerant, exhibit excellent stability and electrical insulating properties, and have suitable compatibility with refrigerants while allowing adequate lubricity to be exhibited without increasing the viscosity of the base oil.

    摘要翻译： 本发明的与二氧化碳制冷剂一起使用的制冷机油的基础油，其特征在于，含有脂肪酸的完全酯，其中C14-C22支链脂肪酸的比例为40〜100摩尔％，多元醇 。 与根据本发明的二氧化碳制冷剂一起使用的冷冻机油的特征在于包括用于根据本发明的二氧化碳制冷剂的冷冻机油的基础油。 与二氧化碳制冷剂一起使用的冷冻机油的基础油和本发明的与二氧化碳制冷剂一起使用的冷冻机油与二氧化碳制冷剂一起使用时，具有优异的稳定性和电绝缘性， 与制冷剂的相容性同时允许显示足够的润滑性而不增加基础油的粘度。