Semiconductor device
    7.
    发明授权
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US08786061B2

    公开(公告)日:2014-07-22

    申请号:US13439025

    申请日:2012-04-04

    申请人: Ken Sawada

    发明人: Ken Sawada

    摘要: A semiconductor device includes a first semiconductor substrate and a second semiconductor substrate laminated with an insulating layer, a first transmission line formed on the first semiconductor substrate, the first transmission line including a signal line and a ground, a second transmission line formed on the second semiconductor substrate, the second transmission line including a signal line and a ground, a first via layer for the signal lines, the first via layer for the signal lines being formed of a conductor layer formed within a via hole, a first via layer for the grounds, the first via layer for the grounds being formed of a conductor layer formed within a via hole, and a second via layer for the grounds, the second via layer for the grounds being formed of a conductor layer formed within a via hole.

    摘要翻译: 半导体器件包括第一半导体衬底和层压有绝缘层的第二半导体衬底,形成在第一半导体衬底上的第一传输线,包括信号线和接地的第一传输线,形成在第二半导体衬底上的第二传输线 半导体衬底,第二传输线包括信号线和接地,用于信号线的第一通孔层,用于信号线的第一通孔层由形成在通孔内的导体层形成,第一通孔层用于 接地,用于由形成在通孔内的导体层形成的接地的第一通孔层和用于接地的第二通孔层,用于接地的第二通孔层由形成在通孔内的导体层形成。

    BASE OIL OF REFRIGERATING MACHINE OIL FOR CARBON DIOXIDE REFRIGERANT AND REFRIGERATING MACHINE OIL FOR CARBON DIOXIDE REFRIGERANT
    9.
    发明申请
    BASE OIL OF REFRIGERATING MACHINE OIL FOR CARBON DIOXIDE REFRIGERANT AND REFRIGERATING MACHINE OIL FOR CARBON DIOXIDE REFRIGERANT 有权
    二氧化碳制冷机和二氧化碳制冷机的制冷机油的制冷机油基础油

    公开(公告)号:US20090200507A1

    公开(公告)日:2009-08-13

    申请号:US12293846

    申请日:2007-03-20

    IPC分类号: C09K5/00

    摘要: The base oil for the refrigerating machine oil used with a carbon dioxide refrigerant of the invention is characterized by comprising a complete ester of a fatty acid in which the proportion of C14-C22 branched fatty acid is 40-100% by mole and a polyhydric alcohol. The refrigerating machine oil used with a carbon dioxide refrigerant according to the invention is characterized by comprising the base oil for the refrigerating machine oil used with a carbon dioxide refrigerant according to the invention. The base oil for the refrigerating machine oil used with a carbon dioxide refrigerant and the refrigerating machine oil used with a carbon dioxide refrigerant according to the invention, when used together with a carbon dioxide refrigerant, exhibit excellent stability and electrical insulating properties, and have suitable compatibility with refrigerants while allowing adequate lubricity to be exhibited without increasing the viscosity of the base oil.

    摘要翻译: 本发明的与二氧化碳制冷剂一起使用的制冷机油的基础油,其特征在于,含有脂肪酸的完全酯,其中C14-C22支链脂肪酸的比例为40〜100摩尔%,多元醇 。 与根据本发明的二氧化碳制冷剂一起使用的冷冻机油的特征在于包括用于根据本发明的二氧化碳制冷剂的冷冻机油的基础油。 与二氧化碳制冷剂一起使用的冷冻机油的基础油和本发明的与二氧化碳制冷剂一起使用的冷冻机油与二氧化碳制冷剂一起使用时,具有优异的稳定性和电绝缘性, 与制冷剂的相容性同时允许显示足够的润滑性而不增加基础油的粘度。

    Resist pattern forming method and semiconductor device fabrication method
    10.
    发明授权
    Resist pattern forming method and semiconductor device fabrication method 有权
    抗蚀剂图案形成方法和半导体器件制造方法

    公开(公告)号:US07429446B2

    公开(公告)日:2008-09-30

    申请号:US10804179

    申请日:2004-03-19

    IPC分类号: G03F7/26

    CPC分类号: G03F7/40 G03F7/023

    摘要: A photoresist film 12 is formed on a substrate 10. In the photoresist film 12, an opening 13 having higher hydrophilicity and higher affinity with a chemical liquid 16 for swelling the photoresist film at upper part of the sidewall is formed down to the substrate 10. The chemical liquid 16 is reacted with the photoresist film 12 with the opening formed in to swell the photoresist film 16 to thereby reverse-taper the sidewall of the opening. Whereby the photoresist film having an opening diameter beyond a resolution of the photoresist material and the sidewall of the opening reverse-tapered can be easily formed.

    摘要翻译: 在基板10上形成光刻胶膜12。 在光致抗蚀剂膜12中,向衬底10形成与侧壁上部的光致抗蚀剂膜膨胀的化学液体16亲水性高,亲和性高的开口13。 化学液体16与光致抗蚀剂膜12反应,其中形成有开口以使光致抗蚀剂膜16膨胀,从而使开口的侧壁反向锥形化。 由此可以容易地形成具有超过光致抗蚀剂材料的分辨率的开口直径和反向锥形开口的侧壁的光致抗蚀剂膜。