摘要:
A method and apparatus for positioning a wafer with respect to a reticle in a projection exposure apparatus for a photolithographic process capable of high speed search alignment of a wafer without any limitation imposed on the arrangement of the search marks on the wafer. For the first wafer in one lit, a first alignment sensor system is used to detect the positions of first and second search marks, and define a coordinate system with reference to the positions of the search marks based on the detection results. Then, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by a second alignment sensor system and stored. For any of the second and later wafers in the lot, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by the second alignment sensor system, and the offsets between the detected position and the stored position are used to define a coordinate system which refers to the search marks.
摘要:
A method for positioning a wafer with respect to a reticle in a projection exposure apparatus for a photolithographic process capable of high speed search alignment of a wafer without any limitation imposed on the arrangement of the search marks on the wafer. For the first wafer in one lot, a first alignment sensor system is used to detect the positions of first and second search marks, and define a coordinate system with reference to the positions of the search marks based on the detection results. Then, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by a second alignment sensor system and stored. For any of the second and later wafers in the lot, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by the second alignment sensor system, and the offsets between the detected position and the stored position are used to define a coordinate system which refers to the search marks.
摘要:
A method provides a technique for exposing a pattern on a mask that is held by a mask stage onto a substrate. The method includes a first step of detecting a mark on the mask that is held at a first position by the mask stage and determining a corresponding position of the mask stage; a second step of detecting the mark on the mask that is held at a second position different from the first position by the mask stage and determining a corresponding position of the mask stage; a third step of determining a position of the mask relative to the mask stage in accordance with the detection results in the first and second steps; a fourth step of aligning the mask with the substrate; and a fifth step of exposing the pattern on the mask onto the substrate.
摘要:
After exposure of a divided area on a wafer is completed, for exposure of the next divided area, a control unit sends configuration information on control parameters necessary to expose the next divided area to a stage control system, sometime before the stage control system begins deceleration of a reticle stage and a wafer stage in a scanning direction. Therefore, both stages do not have to be suspended before acceleration for the stage control system to receive the configuration information on control parameters necessary to expose the next divided area, and since suspension time is not required, throughput can be improved. In this case, no serious problems occur, so the performance of other devices is not disturbed.
摘要:
After exposure of a divided area on a wafer is completed, for exposure of the next divided area, a control unit sends configuration information on control parameters necessary to expose the next divided area to a stage control system, sometime before the stage control system begins deceleration of a reticle stage and a wafer stage in a scanning direction. Therefore, both stages do not have to be suspended before acceleration for the stage control system to receive the configuration information on control parameters necessary to expose the next divided area, and since suspension time is not required, throughput can be improved. In this case, no serious problems occur, so the performance of other devices is not disturbed.
摘要:
A positioning method and apparatus for positioning a substrate on a substrate stage which is movable in a predetermined direction (Y direction). In the positioning method, a relationship between a longitudinal direction (X′ direction) of a band-shaped light beam irradiated onto the substrate and the predetermined direction (Y direction) for determining the position of the substrate and the predetermined direction is measured and the substrate is positioned on the substrate stage based on the relationship between said longitudinal direction of the band-shaped light beam and the predetermined direction.
摘要:
A table holding a substrate thereon is placed on a focusing and levelling stage through three fulcrums, and a calculator receives as inputs the coordinates values of the table measured by an interferometer, the amount of positional deviation between the surface of a wafer and a predetermined fiducial plane at each of a plurality of measuring points on the substrate which is measured by a multipoint AF sensor, and a weight coefficient given to be to the amount of positional deviation at each of the plurality of measuring points, thereby calculating the residual deviation at each of the three fulcrums. A controller adopts the PID control system and controls the amounts of displacement of the three fulcrums on the basis of the residual deviation calculated by the calculator, the integrated value of this residual deviation and the differentiated value of this residual deviation.
摘要:
A pipe fitting or coupling is used for connecting at least two pipes. The pipe fitting is basically formed of a coupling main body and a slit ring integrally formed together. The coupling main body is formed of an inner layer of good heat resisting property, an intermediate layer containing glass fibers, and an outer layer having large tensile elongation and impact strength. The slit ring is formed at an edge portion of the outer circumferential surface of the coupling main body.
摘要:
An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.
摘要:
An exposure apparatus comprises a liquid immersion system, a first mover, and a prescribed member. The exposure apparatus exposes a substrate via an optical member and a liquid. The liquid immersion system performs supply and recovery of the liquid. The first mover can move in a first area, and can hold the liquid between itself and the optical member. The prescribed member is removed from the first mover when the first mover withdraws from a position opposing the optical member, and can hold the liquid between itself and the optical member.