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    Diverter magnet arrangement for plasma processing system
    1.
    发明授权
    Diverter magnet arrangement for plasma processing system 失效
    等离子体处理系统的转向磁体布置

    公开(公告)号：US4657619A

    公开(公告)日：1987-04-14

    申请号：US802896

    申请日：1985-11-29

    申请人： Kevin P. O'Donnell

    发明人： Kevin P. O'Donnell

    IPC分类号： H01L21/205 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  C23C14/50 ,  C23C14/36

    CPC分类号： H01J37/32623 ,  H01J37/3266

    摘要： A flat book-shaped substrate support electrode for a magnetically enhanced plasma processing apparatus has primary magnetic poles at first and second ends for generating a primary magnetic field that extends between the ends of the electrode in front of a processing surface of the electrode. An auxiliary magnet structure is spaced from the processing surface for generating an auxiliary magnetic field that tends to flatten the primary magnetic field. A diverter magnet generates a third magnetic field having curved lines of force centered on an axis spaced from a first edge of the electrode toward which electron drift occurs. The third magnetic field interacts with the resultant of the primary field and the auxiliary field at the first edge of the electrode and acts to stabilize the plasma in this region.

    摘要翻译： 用于磁增强等离子体处理装置的扁平书形基板支撑电极在第一和第二端处具有用于产生在电极的处理表面之前的电极的端部之间延伸的初级磁场的初级磁极。 辅助磁体结构与处理表面间隔开，以产生趋向于平坦化初级磁场的辅助磁场。 转向磁体产生第三磁场，该第三磁场具有以与电极漂移发生的第一电极边缘隔开的轴为中心的弯曲线。 第三磁场与电极的第一边缘处的初级场和辅助场的结果相互作用，并且用于使该区域中的等离子体稳定。

    Bulk tank cryogenic safety system
    3.
    发明授权
    Bulk tank cryogenic safety system 有权
    散装罐低温安全系统

    公开(公告)号：US08011539B1

    公开(公告)日：2011-09-06

    申请号：US12070958

    申请日：2008-02-22

    申请人： Kevin P. O'Donnell ,  Warren L. Williamson ,  Keith S. Hong

    发明人： Kevin P. O'Donnell ,  Warren L. Williamson ,  Keith S. Hong

    IPC分类号： B65D83/00

    CPC分类号： B67D1/0057 ,  B67D1/008 ,  B67D1/0878 ,  B67D1/0888 ,  B67D1/1252

    摘要： A bulk tank source of pressurized gas supplies gas to a consumption device, such as a beverage dispenser. A control valve is located between the bulk tank and the consumption device. A pressure monitoring system is connected to monitor the gas pressure between the bulk tank and the control valve. The pressure monitor system closes the valve when pressure drops below a first predetermined threshold, and opens the valve when the monitored pressure exceeds a second predetermined threshold greater than the first predetermined threshold.

    摘要翻译： 大量的加压气体源将气体供应到诸如饮料分配器的消耗装置。 控制阀位于散货箱和消耗装置之间。 连接压力监测系统以监测散装罐和控制阀之间的气体压力。 当压力下降到低于第一预定阈值时，压力监视器系统关闭阀，并且当所监视的压力超过大于第一预定阈值的第二预定阈值时打开阀。