Memory of multilevel quantum dot structure and method for fabricating the same
    2.
    发明授权
    Memory of multilevel quantum dot structure and method for fabricating the same 失效
    多层量子点结构的记忆及其制造方法

    公开(公告)号:US06333214B1

    公开(公告)日:2001-12-25

    申请号:US09334895

    申请日:1999-06-17

    IPC分类号: H01L21335

    摘要: A semiconductor memory having a multilevel quantum dot structure is formed by alternatively disposing conductive layers and insulation layers, and processing these layers so that quantum dots are formed in the conductive layers. The writing and reading of data into the semiconductor memory are achieved by using the principle of Coulomb blockade and quantized voltage drops. The size and distribution of the quantum dots are controlled by agglomeration, selective oxidation, etc. in order to achieve the desired quantum dot layer structure so that the immigration of charges between a semiconductor channel and each quantum dot layer is different.

    摘要翻译: 通过交替地设置导电层和绝缘层来形成具有多层量子点结构的半导体存储器,并且处理这些层,使得在导电层中形成量子点。 通过使用库仑阻塞和量子化电压降的原理,实现对半导体存储器的数据写入和读取。 通过聚集,选择性氧化等来控制量子点的尺寸和分布,以实现期望的量子点层结构,使得半导体沟道和每个量子点层之间的电荷迁移不同。