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39 条记录 (耗时 0.064 秒)

    Washing device and method for fabricating the same
    2.
    发明授权
    Washing device and method for fabricating the same 有权
    洗涤装置及其制造方法

    公开(公告)号：US09059222B2

    公开(公告)日：2015-06-16

    申请号：US12318289

    申请日：2008-12-24

    申请人： Tae Young Oh ,  Geon Yong Kim ,  Eun Ha Lee

    发明人： Tae Young Oh ,  Geon Yong Kim ,  Eun Ha Lee

    IPC分类号： B08B3/12 ,  H01L21/677 ,  H01L21/67 ,  B08B3/00 ,  B08B5/02 ,  H01L21/02

    CPC分类号： H01L21/67051 ,  B08B3/003 ,  B08B3/12 ,  B08B5/023 ,  B22F2998/00 ,  H01L21/02054 ,  H01L21/02057 ,  H01L21/0206 ,  H01L21/02096 ,  B22F5/10

    摘要： The present invention relates a washing device and a method for fabricating the same which has good chemical resistance and can prevent a scratch from forming on a substrate. The washing device includes a substrate entry guide for making a substrate to enter in a right direction from an outside of the washing device, a foreign matter removal unit for receiving the substrate from the substrate entry guide unit and removing foreign matters from the substrate, a foreign matter washing unit for receiving the substrate from the foreign matter removal unit and washing remained foreign matters from the substrate, and a position control unit for controlling a position of the substrate moving out of the foreign matter washing unit, wherein the substrate entry guide, the foreign matter removal unit, the foreign matter washing unit, and the position control unit are formed of metallic porous material.

    摘要翻译： 本发明涉及一种清洗装置及其制造方法，该清洗装置及其制造方法具有良好的耐化学性，并可防止在基板上形成划痕。 洗涤装置包括用于使基板从洗涤装置的外部向右方向进入的基板进入引导件，用于从基板入口引导单元接收基板并从基板除去异物的异物去除单元， 用于从异物去除单元接收衬底的异物洗涤单元和从衬底洗涤的异物保持异物;以及位置控制单元，用于控制移出异物洗涤单元的衬底的位置，其中衬底进入引导件， 异物去除单元，异物清洗单元和位置控制单元由金属多孔材料形成。

    Washing device and method for fabricating the same
    4.
    发明申请
    Washing device and method for fabricating the same 有权
    洗涤装置及其制造方法

    公开(公告)号：US20100071728A1

    公开(公告)日：2010-03-25

    申请号：US12318289

    申请日：2008-12-24

    申请人： Tae Young Oh ,  Geon Yong Kim ,  Eun Ha Lee

    发明人： Tae Young Oh ,  Geon Yong Kim ,  Eun Ha Lee

    IPC分类号： B08B3/04 ,  B22F3/02

    CPC分类号： H01L21/67051 ,  B08B3/003 ,  B08B3/12 ,  B08B5/023 ,  B22F2998/00 ,  H01L21/02054 ,  H01L21/02057 ,  H01L21/0206 ,  H01L21/02096 ,  B22F5/10

    摘要： The present invention relates a washing device and a method for fabricating the same which has good chemical resistance and can prevent a scratch from forming on a substrate. The washing device includes a substrate entry guide for making a substrate to enter in a right direction from an outside of the washing device, a foreign matter removal unit for receiving the substrate from the substrate entry guide unit and removing foreign matters from the substrate, a foreign matter washing unit for receiving the substrate from the foreign matter removal unit and washing remained foreign matters from the substrate, and a position control unit for controlling a position of the substrate moving out of the foreign matter washing unit, wherein the substrate entry guide, the foreign matter removal unit, the foreign matter washing unit, and the position control unit are formed of metallic porous material.

    摘要翻译： 本发明涉及一种清洗装置及其制造方法，该清洗装置及其制造方法具有良好的耐化学性，并可防止在基板上形成划痕。 洗涤装置包括用于使基板从洗涤装置的外部向右方向进入的基板进入引导件，用于从基板入口引导单元接收基板并从基板除去异物的异物去除单元， 用于从异物去除单元接收衬底的异物洗涤单元和从衬底洗涤的异物保持异物;以及位置控制单元，用于控制移出异物洗涤单元的衬底的位置，其中衬底进入引导件， 异物去除单元，异物清洗单元和位置控制单元由金属多孔材料形成。

    Printing device and method of coating a printing roll and fabricating a LCD device using the printing device
    5.
    发明授权
    Printing device and method of coating a printing roll and fabricating a LCD device using the printing device 有权
    印刷装置和使用该印刷装置涂布印刷辊并制造LCD装置的方法

    公开(公告)号：US07469639B2

    公开(公告)日：2008-12-30

    申请号：US11208235

    申请日：2005-08-18

    申请人： Hong Suk Yoo ,  Tae Young Oh

    发明人： Hong Suk Yoo ,  Tae Young Oh

    IPC分类号： B41F3/00 ,  B41F11/00

    CPC分类号： B05C1/0813 ,  B05C1/0817 ,  B05C5/0254 ,  B05C5/027 ,  G02F1/1303 ,  G02F1/133512 ,  G02F1/133516

    摘要： A printing device includes a main body and a plurality of nozzle units on a lower portion of the main body, a plurality of accommodation grooves within the main body and configured to contain a printing material, and a plurality of slits in each nozzle unit and each slit connected to an accommodation groove, so as to coat the printing material onto a printing object. Since the printing device includes a plurality of nozzle units that can individually control the amount of printing material flowing out of the printing device, the amount of printing material can be easily controlled and regulated. A method of using the printing device includes coating a printing roll with the printing material.

    摘要翻译： 一种打印装置，包括主体和主体下部的多个喷嘴单元，主体内的多个容纳凹槽，其构造成容纳印刷材料，并且在每个喷嘴单元中具有多个狭缝， 狭缝连接到容纳槽，以将印刷材料涂覆到印刷对象上。 由于打印装置包括能够单独控制从打印装置流出的打印材料的量的多个喷嘴单元，因此可以容易地控制和调节打印材料的量。 使用印刷装置的方法包括用印刷材料涂布印刷辊。

    WASHING DEVICE
    8.
    发明申请
    WASHING DEVICE 有权
    洗衣设备

    公开(公告)号：US20100122716A1

    公开(公告)日：2010-05-20

    申请号：US12569272

    申请日：2009-09-29

    申请人： Tae Young Oh ,  Eun Ha Lee

    发明人： Tae Young Oh ,  Eun Ha Lee

    IPC分类号： B08B3/00

    CPC分类号： H01L21/67034 ,  B08B3/10 ,  B08B7/0035 ,  G02F2001/1316 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67115 ,  H01L21/6776 ,  H01L21/6838

    摘要： A washing device is disclosed, which is capable of preventing damage of a substrate caused by drooping of the substrate. The washing device includes a plasma irradiating part supplied with a substrate from a substrate loading part to remove dirt from the substrate by irradiating plasma to the substrate; a dirt washing part supplied from the substrate from the plasma irradiating part to remove dirt remaining on the substrate; a finishing washing part supplied with the substrate from the dirt washing part to wash the substrate; a drying part supplied with the substrate from the finishing washing part to dry the substrate; and a substrate unloading part supplied with the substrate from the drying part to unload the substrate, wherein the plasma irradiating part includes a plasma irradiation unit that irradiates plasma to the substrate and a floating unit that maintains the substrate in a floating state.

    摘要翻译： 公开了一种清洗装置，其能够防止由于基板的下垂而造成的基板的损坏。 洗涤装置包括从衬底装载部分提供有衬底的等离子体照射部分，以通过将等离子体照射到衬底来从衬底去除污物; 从所述基板从所述等离子体照射部供给的污物洗涤部，以去除残留在所述基板上的污物; 从污物清洗部分提供衬底以洗涤衬底的整理洗涤部分; 干燥部，其从所述精加工清洗部供给所述基板以干燥所述基板; 以及从干燥部供给基板以卸载基板的基板卸载部，其中等离子体照射部包括将等离子体照射到基板的等离子体照射单元和将基板保持在浮置状态的浮动单元。

    Method of forming pattern having step difference and method of making thin film transistor and liquid crystal display using the same
    9.
    发明授权
    Method of forming pattern having step difference and method of making thin film transistor and liquid crystal display using the same 有权
    具有阶差的图案的形成方法以及使用其形成薄膜晶体管的方法和液晶显示器

    公开(公告)号：US07713799B2

    公开(公告)日：2010-05-11

    申请号：US12352837

    申请日：2009-01-13

    申请人： Tae Young Oh

    发明人： Tae Young Oh

    IPC分类号： H01L21/00

    CPC分类号： H05K3/1275 ,  H01L21/6715 ,  H01L27/1292 ,  H05K2203/0108 ,  H05K2203/0143 ,  H05K2203/0534

    摘要： A method of forming a pattern having a step difference and a method of making a thin film transistor and an LCD device using the method of forming the pattern. The method of forming a pattern having a step difference includes forming a first pattern having a predetermined shape in a first printing roll, rotating the first printing roll on a substrate to transfer the first pattern onto the substrate, forming a second pattern having a predetermined shape in a second printing roll, and rotating the second printing roll on the substrate onto which the first pattern is transferred, to transfer the second pattern onto the substrate.

    摘要翻译： 一种形成具有台阶差的图案的方法以及使用形成图案的方法的薄膜晶体管和LCD器件的制造方法。 形成具有台阶差的图案的方法包括在第一印刷辊中形成具有预定形状的第一图案，将第一印刷辊旋转到基板上，以将第一图案转印到基板上，形成具有预定形状的第二图案 在第二印刷辊中，并且将第二印刷辊旋转到其上转印有第一图案的基板上，以将第二图案转印到基板上。

    Washing device
    10.
    发明申请
    Washing device 审中-公开
    洗衣机

    公开(公告)号：US20100050364A1

    公开(公告)日：2010-03-04

    申请号：US12314962

    申请日：2008-12-19

    申请人： Tae Young Oh ,  Hui Jae Lee ,  Geon Yong Kim ,  Eun Ha Lee

    发明人： Tae Young Oh ,  Hui Jae Lee ,  Geon Yong Kim ,  Eun Ha Lee

    IPC分类号： B08B5/02

    CPC分类号： B08B5/02 ,  B08B5/023

    摘要： A washing device capable of stably washing a substrate is disclosed. The washing device includes a substrate entry guiding unit which guides a substrate supplied from the outside to be entered in a correct direction, a dirt removing unit supplied with the substrate from the substrate entry guiding unit to remove dirt formed on the substrate, a dirt washing unit supplied with the substrate from the dirt removing unit to wash off residual dirt remaining on the substrate, and a position controlling unit controlling position of the substrate being discharged from the dirt washing unit.

    摘要翻译： 公开了能够稳定地洗涤基板的洗涤装置。 洗涤装置包括：基板入口引导单元，其引导从正确方向从外部供应的基板;从基板输入引导单元提供有基板的污物去除单元，以去除基板上形成的污垢;污物洗涤 从污物去除单元提供的基板的单元，以清除残留在基板上的残留污物;以及位置控制单元，控制从污物清洗单元排出的基板的位置。