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公开(公告)号:US11874178B2
公开(公告)日:2024-01-16
申请号:US17354257
申请日:2021-06-22
Inventor: Congli Wang , Xiong Dun , Qiang Fu , Wolfgang Heidrich
CPC classification number: G01J9/02 , G01J9/00 , G01J9/0215 , G03F7/001 , G01J2009/002
Abstract: A wavefront sensor includes a mask and a sensor utilized to capture a diffraction pattern generated by light incident to the mask. A reference image is captured in response to a plane wavefront incident on the mask, and another measurement image is captured in response to a distorted wavefront incident on the mask. The distorted wavefront is reconstructed based on differences between the reference image and the measurement image.
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公开(公告)号:US11073427B2
公开(公告)日:2021-07-27
申请号:US16346773
申请日:2017-10-26
Inventor: Congli Wang , Xiong Dun , Qiang Fu , Wolfgang Heidrich
Abstract: A wavefront sensor includes a mask and a sensor utilized to capture a diffraction pattern generated by light incident to the mask. A reference image is captured in response to a plane wavefront incident on the mask, and another measurement image is captured in response to a distorted wavefront incident on the mask. The distorted wavefront is reconstructed based on differences between the reference image and the measurement image.
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