公开(公告)号：US11874178B2

公开(公告)日：2024-01-16

申请号：US17354257

申请日：2021-06-22

Applicant: King Abdullah University of Science and Technology

Inventor： Congli Wang ,  Xiong Dun ,  Qiang Fu ,  Wolfgang Heidrich

IPC: G01J9/02 ,  G03F7/00 ,  G01J9/00

CPC classification number: G01J9/02 ,  G01J9/00 ,  G01J9/0215 ,  G03F7/001 ,  G01J2009/002

Abstract: A wavefront sensor includes a mask and a sensor utilized to capture a diffraction pattern generated by light incident to the mask. A reference image is captured in response to a plane wavefront incident on the mask, and another measurement image is captured in response to a distorted wavefront incident on the mask. The distorted wavefront is reconstructed based on differences between the reference image and the measurement image.

公开(公告)号：US11657523B2

公开(公告)日：2023-05-23

申请号：US17915536

申请日：2022-03-17

Applicant: THE TRUSTEES OF PRINCETON UNIVERSITY ,  KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY

Inventor： Ilya Chugunov ,  Seung-Hwan Baek ,  Qiang Fu ,  Wolfgang Heidrich ,  Felix Heide

IPC: G06K9/00 ,  G06T7/50 ,  G01S17/894 ,  G01S7/4912 ,  G01S7/481

CPC classification number: G06T7/50 ,  G01S7/4816 ,  G01S7/4912 ,  G01S17/894 ,  G06T2207/10028

Abstract: The microlens amplitude masks for flying pixel removal in time-of-flight imaging includes systems, devices, methods, and instructions for image depth determination, including receiving an image, adding noise to the image, determining a set of correlation images, each correlation image having a varying phase offset, for each pixel of the image, generating a masked pixel by applying a mask array, and for each masked pixel, determining the depth of the masked pixel to generate a depth map for the image on a per pixel basis.

公开(公告)号：US11073427B2

公开(公告)日：2021-07-27

申请号：US16346773

申请日：2017-10-26

Applicant: King Abdullah University of Science and Technology

Inventor： Congli Wang ,  Xiong Dun ,  Qiang Fu ,  Wolfgang Heidrich

IPC: G01J9/02 ,  G03F7/00 ,  G01J9/00

Abstract: A wavefront sensor includes a mask and a sensor utilized to capture a diffraction pattern generated by light incident to the mask. A reference image is captured in response to a plane wavefront incident on the mask, and another measurement image is captured in response to a distorted wavefront incident on the mask. The distorted wavefront is reconstructed based on differences between the reference image and the measurement image.