SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230077151A1

    公开(公告)日:2023-03-09

    申请号:US17654261

    申请日:2022-03-10

    Abstract: A semiconductor storage device includes a first stack including a plurality of first electrode films stacked in a first direction. A second stack is provided above the first stack and includes a plurality of second electrode films that are stacked in the first direction. A first column portion is provided in the first stack to extend in the first direction and includes a first charge storage film and a first semiconductor layer. A second column portion is provided in the second stack to extend in the first direction and includes a second charge storage film and a second semiconductor layer. A connecting portion is provided between the first column portion and the second column portion, divides the first charge storage film and the second charge storage film from each other, and is configured to electrically connect the first semiconductor layer and the second semiconductor layer to each other.

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