公开(公告)号：US20150116717A1

公开(公告)日：2015-04-30

申请号：US14581719

申请日：2014-12-23

Applicant: Kla-Tencor Corporation

Inventor： Amnon MANASSEN ,  Andrew HILL ,  Daniel KANDEL ,  Ilan SELA ,  Ohad BACHAR ,  Barak BRINGOLTZ

IPC: G01N21/55 ,  G01B11/00

CPC classification number: G01N21/55 ,  G01B11/00 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/104

Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

Abstract translation: 提供了角度分辨反射计和反射测量方法，其包括相干光源，光学系统布置成使用来自光源的相干光的光点扫描测试图案，以产生收集的瞳孔中的光分布的实现，其中 斑点覆盖测试图案的一部分，并且根据扫描图案光学地或机械地执行扫描;以及处理单元，被配置为通过组合瞳孔图像来生成收集的瞳孔分布的合成图像。 提供了测量系统和方法，其通过估计定量地测量参数对孔径尺寸的功能依赖性并且从与孔径尺寸相关的功能依赖性的识别的衍射分量推导出测量参数的校正项，从而降低衍射误差， 相对于测量条件。

公开(公告)号：US20150309402A1

公开(公告)日：2015-10-29

申请号：US14795549

申请日：2015-07-09

Applicant: KLA-Tencor Corporation

Inventor： Vladimir LEVINSKI ,  Feler YOEL ,  Daniel KANDEL

IPC: G03F1/42 ,  G06F17/50

CPC classification number: G03F1/42 ,  G03F7/70625 ,  G03F7/70641 ,  G03F7/70683 ,  G06F17/5072 ,  H01L22/30

Abstract: Metrology targets, target design methods and metrology methods are provided. Metrology targets comprise target elements belonging to two or more target element types. Each target element type comprises unresolved features which offset specified production parameters to a specified extent and thus provide sensitivity monitoring and optimization tools for process parameters such as focus and dose.

Abstract translation: 提供了计量目标，目标设计方法和计量方法。 计量目标包括属于两个或更多目标元素类型的目标元素。 每个目标元素类型包括将指定的生产参数偏移到指定范围的未解决的特征，从而为诸如焦点和剂量的过程参数提供灵敏度监控和优化工具。