摘要:
A substrate having a collar, which features a marking. The substrate, in particular a thin-layer substrate, may be processed in a process having at least one micromechanical process step. In this context, given at least one micromechanical process step the successful performance of the process step is a function of the fixation of the substrate in a first position. This first position is understood as a relative position of the substrate in space. The marking on the collar advantageously allows the substrate to be aligned with regard to the first position.
摘要:
A manufacturing method for a thin-layer component, in particular a thin-layer high-pressure sensor, having a substrate on which the at least one functional layer to be patterned is to be deposited in the steps, preparing the substrate; depositing the functional layer on the substrate; and patterning the functional layer via a laser processing step, the laser processing step being selective with respect to the substrate.
摘要:
A high-pressure sensor includes a deformation member and connection piece that is joined to the deformation member by a welded seal. The deformation member has a truncated-cone-shaped circumferential segment, via which a welding current can be supplied, in order to weld the two pieces to each other in response to a simultaneous pressing together of deformation member and pressure connection piece. A welding electrode that is configured in a cup shape having a spring-loaded nonconductive insert that can be axially displaced in the interior of the cup.
摘要:
A method for registering a plurality of substrates that are retained on a workpiece carrier onto an exposure mask for carrying out a photolithography process has the steps of registering and immobilizing the exposure mask onto an alignment panel having precisely fitting passthrough orifices for reception of one substrate for each passthrough orifice and inserting into the passthrough orifices of the alignment panel the substrates that are retained on the workpiece carrier.
摘要:
A method for registering a plurality of substrates that are retained on a workpiece carrier onto an exposure mask for carrying out a photolithography process has the steps of registering and immobilizing the exposure mask onto an alignment panel having precisely fitting passthrough orifices for reception of one substrate for each passthrough orifice and inserting into the passthrough orifices of the alignment panel the substrates that are retained on the workpiece carrier.