High-pressure sensor element with an anti-rotation protection
    1.
    发明申请
    High-pressure sensor element with an anti-rotation protection 审中-公开
    高压传感器元件具有防旋转保护

    公开(公告)号:US20050164043A1

    公开(公告)日:2005-07-28

    申请号:US11040075

    申请日:2005-01-21

    摘要: A substrate having a collar, which features a marking. The substrate, in particular a thin-layer substrate, may be processed in a process having at least one micromechanical process step. In this context, given at least one micromechanical process step the successful performance of the process step is a function of the fixation of the substrate in a first position. This first position is understood as a relative position of the substrate in space. The marking on the collar advantageously allows the substrate to be aligned with regard to the first position.

    摘要翻译: 具有轴环的基底,其具有标记。 衬底,特别是薄层衬底可以在具有至少一个微机械工艺步骤的工艺中进行加工。 在本文中,给出至少一个微机械工艺步骤,工艺步骤的成功执行是将衬底固定在第一位置的功能。 该第一位置被理解为衬底在空间中的相对位置。 轴环上的标记有利地允许基底相对于第一位置对准。

    Method for manufacturing a thin-layer component, in particular a thin-layer high-pressure sensor
    2.
    发明授权
    Method for manufacturing a thin-layer component, in particular a thin-layer high-pressure sensor 失效
    用于制造薄层部件的方法,特别是薄层高压传感器

    公开(公告)号:US06620644B2

    公开(公告)日:2003-09-16

    申请号:US09816997

    申请日:2001-03-23

    IPC分类号: H01L2100

    CPC分类号: G01L9/0055 B23K26/066

    摘要: A manufacturing method for a thin-layer component, in particular a thin-layer high-pressure sensor, having a substrate on which the at least one functional layer to be patterned is to be deposited in the steps, preparing the substrate; depositing the functional layer on the substrate; and patterning the functional layer via a laser processing step, the laser processing step being selective with respect to the substrate.

    摘要翻译: 一种薄层部件,特别是薄层高压传感器的制造方法,其特征在于,在所述台阶中,具有要在其上沉积待图案化的所述至少一个功能层的基板,准备所述基板; 将功能层沉积在衬底上; 以及通过激光加工步骤对所述功能层进行构图,所述激光加工步骤相对于所述衬底是选择性的。

    High-pressure sensor, method and tool for its manufacture
    3.
    发明授权
    High-pressure sensor, method and tool for its manufacture 失效
    高压传感器,制造方法和工具

    公开(公告)号:US07028549B2

    公开(公告)日:2006-04-18

    申请号:US10333036

    申请日:2001-07-13

    申请人: Volker Wingsch

    发明人: Volker Wingsch

    IPC分类号: G01L7/08

    CPC分类号: G01L7/082

    摘要: A high-pressure sensor includes a deformation member and connection piece that is joined to the deformation member by a welded seal. The deformation member has a truncated-cone-shaped circumferential segment, via which a welding current can be supplied, in order to weld the two pieces to each other in response to a simultaneous pressing together of deformation member and pressure connection piece. A welding electrode that is configured in a cup shape having a spring-loaded nonconductive insert that can be axially displaced in the interior of the cup.

    摘要翻译: 高压传感器包括通过焊接密封接合到变形构件的变形构件和连接件。 变形构件具有截锥锥形周向段,通过该截面锥形圆周段可以供应焊接电流,以便响应于同时压在一起的变形构件和压力连接件而将两个构件彼此焊接。 一种焊接电极,其被配置为杯状,其具有弹簧加载的非导电插入件,其可在杯的内部轴向移位。

    Exposure mask device and method for orienting a plurality of substrates on an exposure mask
    4.
    发明申请
    Exposure mask device and method for orienting a plurality of substrates on an exposure mask 有权
    曝光掩模装置和用于在曝光掩模上定向多个基板的方法

    公开(公告)号:US20050014073A1

    公开(公告)日:2005-01-20

    申请号:US10489528

    申请日:2002-08-28

    IPC分类号: G03F7/20 G03F9/00

    摘要: A method for registering a plurality of substrates that are retained on a workpiece carrier onto an exposure mask for carrying out a photolithography process has the steps of registering and immobilizing the exposure mask onto an alignment panel having precisely fitting passthrough orifices for reception of one substrate for each passthrough orifice and inserting into the passthrough orifices of the alignment panel the substrates that are retained on the workpiece carrier.

    摘要翻译: 用于将保留在工件载体上的多个基板登记到用于进行光刻工艺的曝光掩模上的方法具有将曝光掩模对准并将其固定在具有精确配合的通孔的对准面板上,用于接收一个基板 每个通孔孔口并将对准面板的通孔中的基板保持在工件载体上。

    Exposure mask device and method for orienting a plurality of substrates on an exposure mask
    5.
    发明授权
    Exposure mask device and method for orienting a plurality of substrates on an exposure mask 有权
    曝光掩模装置和用于在曝光掩模上定向多个基板的方法

    公开(公告)号:US07257890B2

    公开(公告)日:2007-08-21

    申请号:US10489528

    申请日:2002-08-28

    IPC分类号: G03F7/20 G03F9/00

    摘要: A method for registering a plurality of substrates that are retained on a workpiece carrier onto an exposure mask for carrying out a photolithography process has the steps of registering and immobilizing the exposure mask onto an alignment panel having precisely fitting passthrough orifices for reception of one substrate for each passthrough orifice and inserting into the passthrough orifices of the alignment panel the substrates that are retained on the workpiece carrier.

    摘要翻译: 用于将保留在工件载体上的多个基板登记到用于进行光刻工艺的曝光掩模上的方法具有将曝光掩模对准并将其固定在具有精确配合的通孔的对准面板上,用于接收一个基板 每个通孔孔口并将对准面板的通孔中的基板保持在工件载体上。