公开(公告)号：US20060049698A1

公开(公告)日：2006-03-09

申请号：US10936712

申请日：2004-09-09

申请人： Koen Maria Zaal ,  Edwin Buis ,  Henrikus Cox ,  Noud Gilissen ,  Harmen Schoot

发明人： Koen Maria Zaal ,  Edwin Buis ,  Henrikus Cox ,  Noud Gilissen ,  Harmen Schoot

IPC分类号： H02K41/00 ,  H02N1/00

CPC分类号： G03F7/70716 ,  G03F7/709

摘要： A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

公开(公告)号：US20070188724A1

公开(公告)日：2007-08-16

申请号：US11353249

申请日：2006-02-14

申请人： Fransicus Jacobs ,  Marcel Baggen ,  Erik Loopstra ,  Harmen Schoot ,  Arjan Bakker ,  Arjan Wel ,  Krijn Bustraan

发明人： Fransicus Jacobs ,  Marcel Baggen ,  Erik Loopstra ,  Harmen Schoot ,  Arjan Bakker ,  Arjan Wel ,  Krijn Bustraan

IPC分类号： G03B27/42

CPC分类号： G03F7/70716 ,  G03F7/70358 ,  G03F7/707

摘要： A lithographic apparatus includes a support constructed to support a patterning device. The patterning device is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The support includes a force actuator device to exert a force onto the patterning device in a direction of movement of the support. The force actuator device includes a movable part which is pivotably about a pivot axis and thereby connected to the support. The movable part is in the direction of movement of the support substantially balanced with respect to the pivot axis. The force actuator device further includes an actuator to exert via the movable part the force onto the patterning device, to at least partly compensate for the information or a risk of slippage due to acceleration of the support in the direction of movement.

摘要翻译： 光刻设备包括构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束。 该支撑件包括一个力促动器装置，以在支撑件的移动方向上向图案形成装置施加力。 力致动器装置包括可枢转地围绕枢转轴线并由此连接到支撑件的可移动部件。 可移动部分在支撑件的运动方向上相对于枢转轴线基本平衡。 力致动器装置还包括致动器，其经由可移动部件施加力到图案形成装置上，以至少部分地补偿信息或由于支撑件沿着移动方向的加速而导致的滑动的风险。

公开(公告)号：US20070257209A1

公开(公告)日：2007-11-08

申请号：US11812801

申请日：2007-06-21

申请人： Joost Ottens ,  Harmen Schoot ,  Jeroen Starreveld ,  Wouterus Maria Maas ,  Willem Venema ,  Boris Menchtchikov

发明人： Joost Ottens ,  Harmen Schoot ,  Jeroen Starreveld ,  Wouterus Maria Maas ,  Willem Venema ,  Boris Menchtchikov

IPC分类号： G03B27/02

CPC分类号： G03F7/70616 ,  G03F7/70783 ,  G03F7/70875

摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.

摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。

公开(公告)号：US20070188723A1

公开(公告)日：2007-08-16

申请号：US11353232

申请日：2006-02-14

申请人： Bernardus Luttikhuis ,  Erik Loopstra ,  Harmen Schoot ,  Fransicus Jacobs

发明人： Bernardus Luttikhuis ,  Erik Loopstra ,  Harmen Schoot ,  Fransicus Jacobs

IPC分类号： G03B27/42

CPC分类号： G03B27/42 ,  G03F7/707 ,  G03F7/70783

摘要： The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping forces are preferably applied using thin membranes. The first clamp clamps the substrate in directions parallel to the plane of the patterning device, perpendicular to the plane of the patterning device and rotationally. The second clamping device clamps the patterning device only in directions parallel to the plane of the substrate.

摘要翻译： 光刻设备中的掩模使用第一夹紧装置夹紧在第一侧上，并使用第二夹紧装置夹紧在不同于第一侧的第二侧上。 夹紧力优选使用薄膜施加。 第一夹具将基板平行于图案形成装置的平面垂直于图案形成装置的平面并旋转夹紧基板。 第二夹紧装置仅在平行于基板的平面的方向上夹持图案形成装置。