公开(公告)号：US20070097346A1

公开(公告)日：2007-05-03

申请号：US11581059

申请日：2006-10-16

申请人： Koen Maria Zaal ,  Joost Ottens ,  Jeroen Akker

发明人： Koen Maria Zaal ,  Joost Ottens ,  Jeroen Akker

IPC分类号： G03B27/58

CPC分类号： G03F7/707 ,  C04B35/195 ,  C04B2235/3203 ,  C04B2235/3244 ,  C04B2235/3255 ,  G03F7/70858

摘要： An article support configured to support an article to be placed in a beam path of a radiation beam of a lithographic apparatus on the article support is disclosed, the article support having a base plate of a first material and a plurality of burls of a second material, bonded to the base plate of the first material.

摘要翻译： 公开了一种物品支撑件，其被配置成将物品放置在物品支撑件上的光刻设备的辐射束的光束路径中，物品支撑件具有第一材料的基板和第二材料的多个毛刺 ，粘合到第一材料的基板上。

公开(公告)号：US20070076180A1

公开(公告)日：2007-04-05

申请号：US11257399

申请日：2005-10-25

申请人： Patricius Tinnemans ,  Willem Venema ,  Koen Maria Zaal

发明人： Patricius Tinnemans ,  Willem Venema ,  Koen Maria Zaal

IPC分类号： G03B27/42

CPC分类号： G03F7/70891 ,  G03F7/70725 ,  G03F7/70875

摘要： A system and method are used to compensate for thermal effect on a lithographic apparatus. The system comprises a patterning device, a projection system, a substrate position controller, and a substrate-position-based expansion-compensator. The patterning device modulates a radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The substrate position controller moves the substrate relative to the projection system sequentially through a plurality of exposure positions. The substrate-position-based expansion-compensator interacts with the substrate position controller to modify the exposure positions in order at least partially to compensate for thermally-induced geometrical changes of at least one of the substrate and projection system.

摘要翻译： 系统和方法用于补偿光刻设备的热效应。 该系统包括图案形成装置，投影系统，基板位置控制器和基于基板位置的膨胀补偿器。 图案形成装置调制辐射束。 投影系统将调制的辐射束投影到基板的目标部分上。 基板位置控制器相对于投影系统顺序移动基板通过多个曝光位置。 基于衬底位置的膨胀补偿器与衬底位置控制器相互作用以至少部分地修改曝光位置以补偿至少一个衬底和投影系统的热诱导几何变化。

公开(公告)号：US20070153244A1

公开(公告)日：2007-07-05

申请号：US11321461

申请日：2005-12-30

申请人： Koen Maria Zaal ,  Joost Ottens

发明人： Koen Maria Zaal ,  Joost Ottens

IPC分类号： G03B27/52

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70875

摘要： A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.

摘要翻译： 公开了一种具有与衬底台分开形成的盖板的光刻设备，以及通过控制盖板的温度来稳定衬底台的温度的装置。 公开了一种具有绝热性的光刻设备，其设置在盖板和基板台之间，使得盖板用作基板台的热屏蔽。 公开了一种光刻设备，其包括参考衬底台变形来确定衬底台变形并改善衬底的位置控制的装置。

公开(公告)号：US20060049698A1

公开(公告)日：2006-03-09

申请号：US10936712

申请日：2004-09-09

申请人： Koen Maria Zaal ,  Edwin Buis ,  Henrikus Cox ,  Noud Gilissen ,  Harmen Schoot

发明人： Koen Maria Zaal ,  Edwin Buis ,  Henrikus Cox ,  Noud Gilissen ,  Harmen Schoot

IPC分类号： H02K41/00 ,  H02N1/00

CPC分类号： G03F7/70716 ,  G03F7/709

摘要： A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

公开(公告)号：US20050195382A1

公开(公告)日：2005-09-08

申请号：US10980834

申请日：2004-11-04

申请人： Joost Ottens ,  Koen Maria Zaal

发明人： Joost Ottens ,  Koen Maria Zaal

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/58

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  G03F7/70875

摘要： A lithographic apparatus includes an article support for supporting a substantially flat article to be placed in a beam path of a beam of radiation. The article support includes a plurality of supporting protrusions that define a support zone for providing a plane of support. A backfill gas feed is arranged in the support zone and provides a backfill gas that flows to a backside of the article when supported by the article support. The support zone is surrounded by a boundary zone that has a reduced height relative to the plane of support so that the backfill gas flow is permitted to exit the support zone. A tunable clamp clamps the article to the article support, and a flow measuring system measures the outflow of the backfill gas. The tunable clamp is operatively coupled to the flow measuring system to tune the clamping based on the measured outflow.

摘要翻译： 光刻设备包括用于支撑待放置在辐射束的光束路径中的基本平坦的物品的物品支撑件。 物品支撑件包括限定用于提供支撑平面的支撑区域的多个支撑突起。 回填气体进料设置在支撑区域中，并且当由物品支撑件支撑时提供回流到物品的后侧的回填气体。 支撑区被边界区围绕，该边界区相对于支撑平面具有减小的高度，使得回填气体流被允许离开支撑区。 可调式夹具将制品夹紧到物品支撑件上，流量测量系统测量回填气体的流出。 可调式夹具可操作地连接到流量测量系统，以基于所测量的流出来调节夹紧。

公开(公告)号：US20060158638A1

公开(公告)日：2006-07-20

申请号：US11312654

申请日：2005-12-21

申请人： Koen Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Meijer ,  Joost Ottens ,  Marco Kluse ,  Jan Hopman

发明人： Koen Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Meijer ,  Joost Ottens ,  Marco Kluse ,  Jan Hopman

IPC分类号： G03B27/58

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.