公开(公告)号：US08608902B2

公开(公告)日：2013-12-17

申请号：US12686060

申请日：2010-01-12

申请人： Kohei Fukushima ,  Toshiki Takahashi ,  Hiroyuki Matsuura ,  Yutaka Motoyama ,  Kazuya Yamamoto

发明人： Kohei Fukushima ,  Toshiki Takahashi ,  Hiroyuki Matsuura ,  Yutaka Motoyama ,  Kazuya Yamamoto

IPC分类号： H01L21/306 ,  C23C16/00

CPC分类号： C23C16/345 ,  C23C16/4401 ,  C23C16/452 ,  H01J37/321 ,  H01J37/3244

摘要： A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field and confining a plasma generation area airtightly communicating with the process field, an ICP electrode disposed outside the plasma generation box and extending in a longitudinal direction of the plasma generation box, and an RF power supply connected to the ICP electrode. The ICP electrode includes a separated portion separated from a wall surface of the plasma generation box by a predetermined distance.

摘要翻译： 一次在一起对多个目标物体进行等离子体处理的垂直等离子体处理装置包括将处理气体转换为等离子体的启动机构。 激活机构包括垂直延长的等离子体生成箱，其在对应于处理场的位置处附接到处理容器，并限制与过程场气密地通信的等离子体产生区域; ICP电极，设置在等离子体生成箱的外部并且沿纵向延伸 等离子体生成箱的方向，以及与ICP电极连接的RF电源。 ICP电极包括与等离子体发生箱的壁面隔开预定距离的分离部分。

公开(公告)号：US20100186898A1

公开(公告)日：2010-07-29

申请号：US12686060

申请日：2010-01-12

申请人： Kohei FUKUSHIMA ,  Toshiki Takahashi ,  Hiroyuki Matsuura ,  Yutaka Motoyama ,  Kazuya Yamamoto

发明人： Kohei FUKUSHIMA ,  Toshiki Takahashi ,  Hiroyuki Matsuura ,  Yutaka Motoyama ,  Kazuya Yamamoto

IPC分类号： C23F1/08 ,  C23C16/505

CPC分类号： C23C16/345 ,  C23C16/4401 ,  C23C16/452 ,  H01J37/321 ,  H01J37/3244

摘要： A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field and confining a plasma generation area airtightly communicating with the process field, an ICP electrode disposed outside the plasma generation box and extending in a longitudinal direction of the plasma generation box, and an RF power supply connected to the ICP electrode. The ICP electrode includes a separated portion separated from a wall surface of the plasma generation box by a predetermined distance.

摘要翻译： 一次在一起对多个目标物体进行等离子体处理的垂直等离子体处理装置包括将处理气体转换为等离子体的启动机构。 激活机构包括垂直延长的等离子体生成箱，其在对应于处理场的位置处附接到处理容器，并限制与过程场气密地通信的等离子体产生区域; ICP电极，设置在等离子体生成箱的外部并且沿纵向延伸 等离子体生成箱的方向，以及与ICP电极连接的RF电源。 ICP电极包括与等离子体发生箱的壁面隔开预定距离的分离部分。