公开(公告)号：US4749867A

公开(公告)日：1988-06-07

申请号：US856221

申请日：1986-04-28

申请人： Koichi Matsushita ,  Junji Isohata ,  Hironori Yamamoto ,  Makoto Miyazaki ,  Kunitaka Ozawa ,  Hideki Yoshinari

发明人： Koichi Matsushita ,  Junji Isohata ,  Hironori Yamamoto ,  Makoto Miyazaki ,  Kunitaka Ozawa ,  Hideki Yoshinari

IPC分类号： G03F7/20 ,  G01B11/26

CPC分类号： G03F7/70691 ,  G03F7/70358

摘要： An exposure apparatus for exposing in a step-and-scan manner a plate-like member to a pattern with radiation so that images of the pattern are transferred onto different regions on the plate-like member. The apparatus includes a mirror imaging optical system for projecting the image of the pattern onto the plate-like member, a carriage for scanningly moving, at the time of exposure, the plate-like member relative to the mirror imaging system, and a stage movably mounted on the carriage for step-feeding the plate-like member at the time of non-exposure so as to sequentially place the different regions of the plate-like member at an exposure station under the mirror imaging system. A locking system is provided to lock the stage relative to the carriage by use of vacuum, at the time of exposure, whereby unwanted displacement of the plate-like member relative to the carriage at the time of scanning exposure is prevented. Also, any positional deviation which may be caused by the locking of the stage is compensated for, by controlling supply of air pressure to linear air-bearings supporting the carriage.

摘要翻译： 一种用于以逐步扫描的方式将板状构件暴露于具有辐射的图案的曝光装置，使得图案的图像转印到板状构件上的不同区域上。 该装置包括：镜像成像光学系统，用于将图案的图像投影到板状构件上;滑架，用于在曝光时相对于镜像成像系统扫描地移动板状构件;以及可移动的台 安装在滑架上，用于在不曝光时对板状构件进行步进供给，以便将板状构件的不同区域依次放置在镜像摄像系统下的曝光站。 提供锁定系统以在曝光时通过使用真空来相对于托架锁定台架，由此防止了在扫描曝光时板状构件相对于托架的不期望的移动。 此外，通过控制对支撑滑架的线性空气轴承的空气压力的供给来补偿可能由级的锁定引起的任何位置偏差。

公开(公告)号：US4748477A

公开(公告)日：1988-05-31

申请号：US856222

申请日：1986-04-28

申请人： Junji Isohata ,  Koichi Matsushita ,  Hironori Yamamoto ,  Makoto Miyazaki ,  Kunitaka Ozawa ,  Hideki Yoshinari

发明人： Junji Isohata ,  Koichi Matsushita ,  Hironori Yamamoto ,  Makoto Miyazaki ,  Kunitaka Ozawa ,  Hideki Yoshinari

IPC分类号： G03F7/20 ,  G03B27/42 ,  G03B27/53

CPC分类号： G03F7/70691

摘要： An exposure apparatus for exposing in a step-and-scan manner a plate-like member to a pattern with radiation so that images of the pattern are transferred onto different regions on the plate-like member. The exposure apparatus includes a mirror imaging optical system for projecting the image of the pattern onto the plate-like member. Also, the exposure apparatus includes a carriage for scanningly moving, at the time of exposure, the plate-like member relative to the mirror imaging optical system and a stage for step-feeding the plate-like member at the time of non-exposure so as to sequentially place the different regions of the plate-like member at an exposure station under the mirror imaging system. The stage is mounted on the carriage, and the movement of the carriage is guided by linear air-bearings. The apparatus is arranged such that inclination of the carriage relative to the mirror imaging system to be caused by the movement of the stage is corrected by controlling the amount of air supply to the linear air-bearings, whereby occurrence of shift between the images to be transferred onto the plate-like member is prevented regardless of the change in position of the stage relative to the carriage. In another aspect, the amount of movement of the stage is corrected in accordance the amount of image shift which otherwise may be caused, whereby occurrence of such image shift is prevented.

摘要翻译： 一种用于以逐步扫描的方式将板状构件暴露于具有辐射的图案的曝光装置，使得图案的图像转印到板状构件上的不同区域上。 曝光装置包括用于将图案的图像投影到板状构件上的镜像成像光学系统。 此外，曝光装置还包括在曝光时相对于镜面成像光学系统在板状部件上进行扫描移动的台架，以及在不曝光时使板状部件逐步进给的台阶 以将该板状构件的不同区域依次放置在镜像摄像系统下方的曝光站。 台架安装在滑架上，滑架的运动由线性空气轴承引导。 该装置被布置成使得通过控制对线性空气轴承的空气供应量来校正由台架的运动引起的托架相对于镜像成像系统的倾斜，由此在图像之间发生偏移 不管台架相对于托架的位置的变化如何，都能够防止转印到板状构件上。 在另一方面，根据否则可能引起的图像偏移量校正舞台的移动量，从而防止了这种图像偏移的发生。

公开(公告)号：US4864360A

公开(公告)日：1989-09-05

申请号：US183317

申请日：1988-04-05

申请人： Junji Isohata ,  Koichi Matsushita ,  Hironori Yamamoto ,  Makoto Miyazaki ,  Kunitaka Ozawa ,  Hideki Yoshinari

发明人： Junji Isohata ,  Koichi Matsushita ,  Hironori Yamamoto ,  Makoto Miyazaki ,  Kunitaka Ozawa ,  Hideki Yoshinari

IPC分类号： G02F1/13 ,  G02F1/1362 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70066 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70691 ,  H01L21/30 ,  G02F2001/13625

摘要： An apparatus for photolithographically transferring, onto a plate-like member a pattern corresponding to picture elements of a liquid crystal display device and a pattern corresponding to driving circuits and so on, by use of a photomask. The surface of the plate-like member is divided into different areas and, each time one of the different areas of the plate-like member is subjected to the pattern transfer operation, the plate-like member is fed stepwise relative to an optical system provided to project an image of the photomask onto the plate-like member. At the same time, the range of the photomask pattern which is to be transferred onto the plate-like member is changed. By this, a portion of the picture-element pattern and a portion of the circuit pattern are transferred onto each of the different areas on the plate-like member, whereby a large-size pattern contributable to form a large-size display picture plane and a pattern contributable to form a control circuit for controlling the picture plane are transferred on the plate-like member.

摘要翻译： 通过使用光掩模将与液晶显示装置的像素对应的图案和与驱动电路等对应的图案光刻地转印到板状构件上的装置。 板状构件的表面被划分成不同的区域，并且每当片状构件的不同区域中的一个受到图案转印操作时，板状构件相对于所提供的光学系统逐步进给 将光掩模的图像投影到板状构件上。 同时，要转印到板状构件上的光掩模图案的范围被改变。 由此，将图像元素图案的一部分和电路图案的一部分转印到板状构件上的各个不同区域中，由此形成大尺寸图案，形成大尺寸显示画面， 形成用于控制画面的控制电路的图形被转印在板状构件上。

公开(公告)号：US4998134A

公开(公告)日：1991-03-05

申请号：US383086

申请日：1989-07-21

申请人： Junji Isohata ,  Koichi Matsushita ,  Hironori Yamamoto ,  Makoto Miyazaki ,  Kunitaka Ozawa ,  Hideki Yoshinari

发明人： Junji Isohata ,  Koichi Matsushita ,  Hironori Yamamoto ,  Makoto Miyazaki ,  Kunitaka Ozawa ,  Hideki Yoshinari

IPC分类号： G02F1/13 ,  G02F1/1362 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70066 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70691 ,  H01L21/30 ,  G02F2001/13625

摘要： An apparatus for photolithographically transferring, onto a plate-like member a pattern corresponding to picture elements of a liquid crystal display device and a pattern corresponding to driving circuits and so on, by use of a photomask. The surface of the plate-like member is divided into different areas and, each time one of the different areas of the plate-like member is subjected to the pattern transfer operation, the plate-like member is fed stepwise relative to an optical system provided to project an image of the photomask onto the plate-like member. At the same time, the range of the photomask pattern which is to be transferred onto the plate-like member is changed. By this, a portion of the picture-element pattern and a portion of the circuit pattern are transferred onto each of the different areas on the plate-like member, whereby a large-size pattern contributable to form a large-size display picture plane and a pattern contributable to form a control circuit for controlling the picture plane are transferred on the plate-like member.

公开(公告)号：US4676630A

公开(公告)日：1987-06-30

申请号：US854541

申请日：1986-04-22

申请人： Koichi Matsushita ,  Junji Isohata ,  Hironori Yamamoto ,  Makoto Miyazaki ,  Kunitaka Ozawa ,  Hideki Yoshinari

发明人： Koichi Matsushita ,  Junji Isohata ,  Hironori Yamamoto ,  Makoto Miyazaki ,  Kunitaka Ozawa ,  Hideki Yoshinari

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70691

摘要： An exposure apparatus for exposing a plate-like member to a pattern with radiation in a step-and-repeat manner thereby to transfer images of the pattern onto different regions on a surface of the plate-like member. The apparatus includes an X-Y stage for moving the plate-like member in X and Y directions, a .theta.-stage for moving the plate-like member in a .theta. (rotational) direction relative to the X-Y stage, and laser interferometers for measuring an amount of movement of the plate-like member, by the X-Y stage, in each of the X and Y directions by use of a mirror mounted on the .theta.-stage. Placement of the mirror on the .theta.-stage allows correction of yawing if it occurs during movement of the plate-like member by X-Y stage. Also, deviation of the plate-like member in the Y direction if it occurs during movement of the plate-like member by the X-Y stage in the X direction, is detected by the laser interferometers. This allows detection of a positional error of the mirror in the .theta. direction and allows correction of the .theta.-error by the .theta.-stage.

摘要翻译： 一种用于以逐步重复的方式将板状构件暴露于具有辐射的图案的曝光装置，从而将图案的图像转印到板状构件的表面上的不同区域上。 该装置包括用于在X和Y方向上移动板状构件的XY平台，用于相对于XY平台以θ（旋转）方向移动板状构件的θ级和用于测量量的激光干涉仪 通过使用安装在θ级上的反射镜，通过XY台在X和Y方向中的每一个中移动板状构件。 如果在X-Y平台上移动板状构件时发生偏转，则可以在θ级放置镜子。 此外，通过激光干涉仪检测板状构件在X方向上通过X-Y台移动期间在Y方向上的偏移。 这允许在θ方向上检测反射镜的位置误差，并且允许通过θ级校正θ-误差。

公开(公告)号：US4708465A

公开(公告)日：1987-11-24

申请号：US19663

申请日：1987-02-27

申请人： Junji Isohata ,  Hironori Yamamoto ,  Koichi Matsushita

发明人： Junji Isohata ,  Hironori Yamamoto ,  Koichi Matsushita

IPC分类号： G03F9/00 ,  G01B11/26 ,  G03F7/20 ,  G12B5/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68 ,  G03B27/42

CPC分类号： G03F7/70716

摘要： A position detecting device usable in an exposure apparatus for transferring an image of a first object onto a second object, for detecting the position of at least one of the first and second objects, includes a rotatable portion having a carrying portion for carrying thereon the at least one object, a first supporting member for supporting the rotatable portion, the first supporting member including a first driving system for moving the rotatable portion in a rotational direction, second supporting member for supporting the first supporting member, the second supporting member including a second driving system for moving the first supporting member in a rotational direction, and a displacement detecting system for detecting displacement of the first supporting member.

摘要翻译： 一种可用于曝光装置的位置检测装置，用于将第一物体的图像转印到第二物体上，用于检测第一和第二物体中的至少一个的位置，包括可旋转部分，其具有用于在其上承载 至少一个物体，用于支撑可旋转部分的第一支撑构件，第一支撑构件包括用于沿旋转方向移动可旋转部分的第一驱动系统，用于支撑第一支撑构件的第二支撑构件，第二支撑构件包括第二支撑构件 驱动系统，用于沿旋转方向移动第一支撑构件;以及位移检测系统，用于检测第一支撑构件的位移。

公开(公告)号：US4422754A

公开(公告)日：1983-12-27

申请号：US340843

申请日：1982-01-20

申请人： Junji Isohata ,  Hironori Yamamoto

发明人： Junji Isohata ,  Hironori Yamamoto

IPC分类号： G03B27/32 ,  G03F7/20 ,  G12B5/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  G03B27/52 ,  G03B27/70

CPC分类号： G03F7/70691 ,  G03F7/70358

摘要： A projection-printing apparatus moves at least one of a mask and a wafer with precise rectilinearity along a guide relative to an optical system for projecting the image of the mask upon the wafer, and in a plane perpendicular to the optical axis of the optical system whereby the image of the mask is printed on the wafer.

摘要翻译： 投影印刷装置相对于光学系统沿导向器精确地直线移动掩模和晶片中的至少一个，用于将掩模的图像投影到晶片上，并且在垂直于光学系统的光轴的平面中 由此将掩模的图像印刷在晶片上。

公开(公告)号：US4370054A

公开(公告)日：1983-01-25

申请号：US260387

申请日：1981-05-04

申请人： Junji Isohata ,  Hironori Yamamoto

发明人： Junji Isohata ,  Hironori Yamamoto

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70358

摘要： A projection exposure apparatus in which a mask and a wafer are displaced in a plane perpendicular to the optical axis of the projection optical system to form circuit patterns on the entire surface of the wafer. The mask and wafer are displaced along guides having two guide rails between which are provided means for compensating for non-linearity of one of the guide rails.

摘要翻译： 一种投影曝光装置，其中掩模和晶片在垂直于投影光学系统的光轴的平面中移位，以在晶片的整个表面上形成电路图案。 掩模和晶片沿着具有两个导轨的引导件移位，在其之间设置有用于补偿导轨之一的非线性的装置。

公开(公告)号：US4708466A

公开(公告)日：1987-11-24

申请号：US10481

申请日：1987-02-03

申请人： Junji Isohata ,  Makoto Miyazaki

发明人： Junji Isohata ,  Makoto Miyazaki

IPC分类号： G03F9/00 ,  G03B27/42

CPC分类号： G03F9/70

摘要： A step-and-repeat type exposure apparatus for photoprinting patterns on different portions of a workpiece, for the manufacture of a large-size pattern to be used in a panel display device, for example. Plural masks having respective patterns are used and, each time the pattern of one of the masks is transferred onto corresponding one of the portions of the workpiece, the workpiece is displaced while, on the other hand, the used mask is replaced by a subsequent mask. For the exposure of a first one of the portions of the workpiece, the first portion is aligned with a corresponding first mask, set at a reference position, by use of alignment marks provided on the first portion and the first mask. In regard to the exposure of a second one of the portions of the workpiece, the workpiece is moved while monitoring the position thereof by use of a laser interferometer, so that the second portion is brought into alignment with a second mask placed at the reference position.

摘要翻译： 用于在工件的不同部分上用于照相印刷图案的步进重复型曝光装置，用于制造例如用于面板显示装置的大尺寸图案。 使用具有各自图案的多个掩模，并且每当掩模中的一个的图案被转移到工件的相应的一个部分上时，工件移位，而另一方面，使用的掩模被后续的掩模代替 。 对于工件的第一部分的曝光，通过使用设置在第一部分和第一掩模上的对准标记，第一部分与设置在参考位置处的对应的第一掩模对准。 关于工件的第二部分的曝光，通过使用激光干涉仪监测其位置来移动工件，使得第二部分与放置在参考位置的第二掩模对准 。

公开(公告)号：US5150152A

公开(公告)日：1992-09-22

申请号：US755619

申请日：1991-09-05

申请人： Junji Isohata ,  Shinji Tsutsui

发明人： Junji Isohata ,  Shinji Tsutsui

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70358 ,  G03F7/70775

摘要： An exposure apparatus for exposing an exposure member or wafer to a pattern with radiation in a step-and-repeat manner thereby to transfer images of the pattern onto different regions on a surface of the exposure member. The apparatus includes an XY stage for moving the wafer in X- and Y-directions, a .theta. stage for moving the wafer in a rotational direction relative to the XY stage, laser interferometers for measuring an amount of movement of the wafer by the XY stage, in each of the X- and Y-directions, by use of a mirror member mounted on the .theta. stage, and a carriage for carrying the XY and .theta. stages and a portion of the interferometers to move the wafer relative to an exposing system for effecting the scan-exposure on the region of the wafer. The mirror member is placed on the .theta. stage, and another portion of the interferometers is mounted on a fixed system independent of the carriage. The inclination of the mirror member is detected at any desired time by moving the carriage and calculating the inclination from the amount of movement of the carriage and the amount of displacement of the mirror member measured by the interferometer mounted on the fixed system. Based on the thus detected inclination of the mirror member, the inclination is corrected and the stepwise movement of the XY stage can be performed with a higher accuracy, so that the transfer accuracy between the pattern images printed on the wafer in the case of the step-and-repeat exposure can be highly improved.

摘要翻译： 一种用于以曝光部件或晶片以逐步重复的方式将辐射曝光到图案的曝光装置，从而将图案的图像转印到曝光部件的表面上的不同区域上。 该装置包括用于在X方向和Y方向上移动晶片的XY平台，用于相对于XY平台沿旋转方向移动晶片的θ级，激光干涉仪，用于通过XY平台测量晶片的移动量 在X和Y方向中的每一个中，通过使用安装在θ台上的反射镜部件和用于承载XY和θ级和一部分干涉仪的滑架相对于曝光系统移动晶片 在晶片的区域上进行扫描曝光。 镜构件放置在θ台上，另一部分干涉仪安装在独立于托架的固定系统上。 通过移动滑架并根据滑架的移动量计算倾斜度和通过安装在固定系统上的干涉仪测量的反射镜部件的位移量来检测反射镜部件的倾斜度。 基于这样检测到的镜构件的倾斜度，校正倾斜度，并且可以以更高的精度执行XY平台的逐步移动，从而在步骤的情况下打印在晶片上的图案图像之间的转印精度 重复曝光可以大大提高。