公开(公告)号：US20060192953A1

公开(公告)日：2006-08-31

申请号：US11410944

申请日：2006-04-26

申请人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

发明人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01B11/30 ,  G01N21/21 ,  G01N21/956 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component.

公开(公告)号：US06512578B1

公开(公告)日：2003-01-28

申请号：US09462279

申请日：2000-02-22

申请人： Koichiro Komatsu ,  Takeo Omori ,  Toshiaki Kitamura

发明人： Koichiro Komatsu ,  Takeo Omori ,  Toshiaki Kitamura

IPC分类号： G01N2100

CPC分类号： G01N21/9501 ,  G01N21/94

摘要： A surface inspection apparatus of the present invention comprises: an illumination optical system 100 which is fixed at a first predetermined angle with respect to a wafer 3 and which irradiates a substantially parallel illuminating light toward the entire surface of the wafer 3; an image pickup device 6 which is fixed at a second predetermined angle with respect to the wafer 3 and which receives diffracted light or scattered light from the wafer 3 and projects an image of the wafer; and an image processing apparatus 7 which performs a macro inspection by taking the image signal generated by the image pickup device 6 and carrying out image processing, and is further provided with a plurality of interference filters F1˜F4 to enable the variable setting of the wavelength of the illuminating light from the illumination optical system 100. In this apparatus, macro inspections can be carried out efficiently on a variety of objects while apparatus such as the illumination apparatus and the image projection apparatus are maintained in fixed positions.

摘要翻译： 本发明的表面检查装置包括：照射光学系统100，其相对于晶片3固定在第一预定角度，并且朝向晶片3的整个表面照射基本上平行的照明光; 相对于晶片3固定在第二预定角度并且从晶片3接收衍射光或散射光并投影晶片的图像的图像拾取器件6; 以及图像处理装置7，其通过拍摄由图像拾取装置6生成的图像信号进行宏观检查并进行图像处理，并且还设置有多个干涉滤光器F1〜F4，以使波长的可变设定 来自照明光学系统100的照明光。在该装置中，可以在诸如照明装置和图像投影装置的设备保持固定位置的情况下，在各种物体上有效地进行宏观检查。

公开(公告)号：US5859707A

公开(公告)日：1999-01-12

申请号：US796320

申请日：1997-02-06

申请人： Masahiro Nakagawa ,  Ayako Sugaya ,  Masashi Tanaka ,  Koichiro Komatsu

发明人： Masahiro Nakagawa ,  Ayako Sugaya ,  Masashi Tanaka ,  Koichiro Komatsu

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/7065 ,  G03F9/7049

摘要： Position-detection apparatus (alignment sensors) are disclosed for determining the position of an object (e.g., wafer, bearing a position-detection mark) as required in microlithography processes for manufacturing semiconductor devices and displays. The apparatus comprises an irradiation optical system, a condenser optical system, a first photoelectric detector, a fiducial body bearing a fiducial mark, a combining optical system, a second photoelectric detector, and a processor. The position-detection and fiducial marks are illuminated with coherent illumination light from the irradiation optical system. Light diffracted from the marks is condensed by the condenser optical system. The first photoelectric detector receives the condensed diffracted light and produces first electrical signals. The combining optical system receives the diffracted light from the fiducial mark. The second photoelectric detector receives multiple diffracted light beams from the fiducial mark and produces second electrical signals. From the electrical signals, the processor determines the position of the position-detection mark relative to the fiducial mark.

摘要翻译： 公开了用于在用于制造半导体器件和显示器的微光刻工艺中根据需要确定物体（例如，晶片，承载位置检测标记）的位置的位置检测装置（对准传感器）。 该装置包括照射光学系统，聚光镜系统，第一光电检测器，具有基准标记的基准体，组合光学系统，第二光电检测器和处理器。 位置检测和基准标记被来自照射光学系统的相干照明光照射。 从标记衍射的光被冷凝光学系统冷凝。 第一光电检测器接收冷凝的衍射光并产生第一电信号。 组合光学系统接收来自基准标记的衍射光。 第二光电检测器从基准标记接收多个衍射光束并产生第二电信号。 从电信号，处理器确定位置检测标记相对于基准标记的位置。

公开(公告)号：US20090237677A1

公开(公告)日：2009-09-24

申请号：US12457198

申请日：2009-06-03

申请人： Hiroshi Aoki ,  Koichiro Komatsu

发明人： Hiroshi Aoki ,  Koichiro Komatsu

IPC分类号： G01B11/24

CPC分类号： G01B11/12

摘要： A measuring device includes a light-sending part sending light in a first direction which is a depth direction of a hollow shape, a conversion part converting a direction of the light into a circumference direction approximately orthogonal to the first direction, a detection part detecting light reflected inside a measuring object, the direction of which is converted by the conversion part, and a shape measurement part measuring an inside shape of the measuring object by obtaining a shift from a reference position according to a detection result of the detection part. Thereby, it is possible to obtain the hollow shape of an object at one time without a need of rotating the object or a light source, and to carry out a highly accurate measurement using a simple device.

摘要翻译： 测量装置包括：发光部分，其沿着第一方向发光，该第一方向是中空形状的深度方向;转换部分，将光的方向转换成大致正交于第一方向的圆周方向;检测部分检测光 反射在测量对象内，其方向由转换部分转换，以及形状测量部分，通过根据检测部分的检测结果获得从基准位置的偏移来测量测量对象的内部形状。 因此，可以一次获得物体的中空形状，而不需要旋转物体或光源，并且使用简单的装置来进行高精度的测量。

公开(公告)号：US07324274B2

公开(公告)日：2008-01-29

申请号：US11018487

申请日：2004-12-22

申请人： Koichiro Komatsu ,  Hiromasa Shibata

发明人： Koichiro Komatsu ,  Hiromasa Shibata

IPC分类号： G02B21/26

CPC分类号： G02B21/33

摘要： A microscope includes a microscope optical system that forms an enlarged image of an observation position by an immersion objective lens with an immersion liquid is filled between the observation position and the objective lens, a moving mechanism that moves a state that a first observation position among a plurality of observation positions on a substrate is positioned in a field of view of the microscope to another state that a second observation position is positioned in the field of view of the microscope, an immersion supplier that supplies the immersion liquid to fill between the objective lens and the observation position, an immersion remover that removes the immersion liquid filled between the objective lens and the observation position, and an immersion remove controller that makes the immersion remover remove the immersion liquid before operating the moving mechanism.

摘要翻译： 显微镜包括通过浸没物镜形成观察位置的放大图像的显微镜光学系统，其中浸没液被填充在观察位置和物镜之间;移动机构，其移动第一观察位置 将基板上的多个观察位置定位在显微镜的视场中，使得第二观察位置位于显微镜的视野内的另一状态，提供浸没液体以供填充在物镜 观察位置，去除填充在物镜和观察位置之间的浸没液的浸渍去除器，以及在操作移动机构之前使浸渍去除器去除浸液的浸渍去除控制器。

公开(公告)号：US06563577B2

公开(公告)日：2003-05-13

申请号：US09836185

申请日：2001-04-18

申请人： Takeo Oomori ,  Koichiro Komatsu

发明人： Takeo Oomori ,  Koichiro Komatsu

IPC分类号： G01N2100

CPC分类号： G01N21/9501

摘要： The present invention aims of preventing a diffracted light, in testing to detect a foreign substance or a flaw on a tested substrate having a repeated pattern, from entering the eye of the observer or a light receiving optical system to be hindrance to the defect test, by providing a defect testing apparatus which comprising: a light source; an illumination optical system for applying a light flux from the light source onto a tested substrate having a repeated pattern at a predetermined angle of incidence; a light receiving optical system for receiving a scattered light from the tested substrate; an image pick-up device for picking up an image formed by the light receiving optical system; a display device for displaying the image obtained by the image pick-up device; and a test stage for mounting the tested substrate thereon at the time of testing, wherein the tested substrate and the illumination optical system are arranged to be rotatable relatively to each other.

公开(公告)号：US20110136357A1

公开(公告)日：2011-06-09

申请号：US12949329

申请日：2010-11-18

申请人： Tsukasa Abe ,  Koichiro Komatsu

发明人： Tsukasa Abe ,  Koichiro Komatsu

IPC分类号： H01R13/44

CPC分类号： B41J29/02 ,  B41J2/32 ,  G07G5/00

摘要： A data storage device is provided. At least a storage section configured to store information therein and a connection terminal configured to transmit information are mounted on a substrate. A casing accommodates the substrate, the casing is formed with an opening to expose a connection portion of the connection terminal to the outside. A shield plate configured to shield the opening of the casing. A shield plate actuation mechanism is configured to detect a connection state between the connection terminal and a receiving terminal to which the connection terminal is connected and actuate the shield plate. The shield plate actuation mechanism actuates the shield plate to shield the opening when the shield plate actuation mechanism detects that the connection terminal is separated from the receiving terminal.

摘要翻译： 提供数据存储装置。 至少一个被配置为在其中存储信息的存储部分和被配置为发送信息的连接终端安装在基板上。 壳体容纳基板，壳体形成有开口以将连接端子的连接部分暴露于外部。 被配置为屏蔽壳体的开口的屏蔽板。 屏蔽板致动机构被配置为检测连接端子与连接端子所连接的接收端子之间的连接状态，并且启动屏蔽板。 当屏蔽板致动机构检测到连接端子与接收端分离时，屏蔽板致动机构致动屏蔽板以屏蔽开口。

公开(公告)号：US07298471B2

公开(公告)日：2007-11-20

申请号：US11410944

申请日：2006-04-26

申请人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

发明人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01B11/30 ,  G01N21/21 ,  G01N21/956 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component.

摘要翻译： 表面检查装置和表面检查方法旨在可靠地处理更精细的重复间距而不缩短照明光的波长。 为此，该装置包括以线性偏振光照射形成在要检查的基板表面上的重复图案的单元，该单元设置为倾斜角度，该倾斜角度与第一振动平面的相交线的方向之间的角度 基板表面上的线偏振光和重复图案的重复方向，从垂直于线偏振光的振动平面的偏振光分量中提取出的光从具有重复图案的光中发出的光 镜面方向，以及根据偏振光分量的光强度检测重复图案的缺陷的单元。

公开(公告)号：US20050162461A1

公开(公告)日：2005-07-28

申请号：US11062209

申请日：2005-02-21

申请人： Kazuyoshi Fujimori ,  Koichiro Komatsu ,  Toru Shirasaki

发明人： Kazuyoshi Fujimori ,  Koichiro Komatsu ,  Toru Shirasaki

IPC分类号： G02F1/13 ,  B05C5/00 ,  B05C11/10 ,  B05D1/26 ,  B05D3/10 ,  B08B7/04 ,  B41J2/01 ,  B41J2/165 ,  B41J29/00 ,  G02B5/20 ,  G02F1/1335

CPC分类号： B41J2/16585 ,  B41J2/16535 ,  B41J2/16552

摘要： A wiping apparatus has a cover box which covers at least a feeding reel, a take-up reel, a wiping member and a spray head, as well as a sheet-feeding passage for the wiping sheet. The passage extends from the feeding reel to the take-up reel. The cover box has formed therein a member opening through which the wiping member protrudes.

摘要翻译： 擦拭装置具有覆盖至少一个馈送卷轴，卷取卷轴，擦拭部件和喷头的盖盒以及用于擦拭片材的片材进给通道。 通道从进给卷轴延伸到卷取卷轴。 盖盒中形成有擦拭构件突出穿过的构件开口。

公开(公告)号：US6097483A

公开(公告)日：2000-08-01

申请号：US259733

申请日：1999-03-01

申请人： Koichiro Komatsu

发明人： Koichiro Komatsu

IPC分类号： H01L21/66 ,  G01B11/30 ,  G01N21/88 ,  G01N21/93 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94

摘要： An image detection apparatus (10) having an illumination system (IS) irradiates light onto the surface (30S) of an object 30 to be inspected for defects. A detection optical system (34) condenses the light from the surface and forms an image of the surface on an image detector (48). The detection optical system includes a receiving mirror (38) having an optical axis (A.sub.38) that intersects the reference optical axis (A.sub.34) of the detection optical system. A processing apparatus (60) includes a processing system (62) that performs image processing based on an output from the detector corresponding to the image. The processing system includes an image distortion correction unit (62a) for eliminating the effects of distortion in the image of the surface generated by the inclination of the surface with respect to the reference optical axis and the receiving mirror.

摘要翻译： 具有照明系统（IS）的图像检测装置（10）将光照射到要检查的物体30的表面（30S）上。 检测光学系统（34）冷凝来自表面的光并在图像检测器（48）上形成表面的图像。 检测光学系统包括具有与检测光学系统的参考光轴（A34）相交的光轴（A38）的接收镜（38）。 一种处理装置（60）包括：处理系统（62），其根据与图像对应的检测器的输出进行图像处理。 处理系统包括图像失真校正单元（62a），用于消除由表面相对于基准光轴和接收反射镜产生的表面的图像中的失真的影响。