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    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    1.
    发明申请
    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
    耐蚀组合物及其制造方法

    公开(公告)号：US20130022921A1

    公开(公告)日：2013-01-24

    申请号：US13552242

    申请日：2012-07-18

    申请人： Koji ICHIKAWA ,  Tatsuro MASUYAMA ,  Satoshi YAMAGUCHI

    发明人： Koji ICHIKAWA ,  Tatsuro MASUYAMA ,  Satoshi YAMAGUCHI

    IPC分类号： G03F7/027 ,  G03F7/20

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041

    摘要： A resist composition having; a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a salt having an anion represented by the formula (IA). wherein R1, A1, A13, X12, A14, R1A and R2A are defined in the specification.

    摘要翻译： 一种抗蚀剂组合物，具有： 具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但是通过酸的作用而溶解在碱性水溶液中，不包括由式 （I），酸产生剂和具有由式（IA）表示的阴离子的盐。 其中R1，A1，A13，X12，A14，R1A和R2A在说明书中定义。

    RESIN AND PHOTORESIST COMPOSITION COMPRISING SAME
    3.
    发明申请
    RESIN AND PHOTORESIST COMPOSITION COMPRISING SAME 有权
    树脂和光学组合物包括相同

    公开(公告)号：US20120270154A1

    公开(公告)日：2012-10-25

    申请号：US13447796

    申请日：2012-04-16

    申请人： Tatsuro MASUYAMA ,  Koji ICHIKAWA

    发明人： Tatsuro MASUYAMA ,  Koji ICHIKAWA

    IPC分类号： C08F236/20 ,  G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/2041 ,  G03F7/0046 ,  G03F7/0397

    摘要： The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, A2 represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A1 represents a group represented by the formula (a-g1): A10-X10sA11-  (a-g1) wherein A10 is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A11 represents a C1-C5 aliphatic hydrocarbon group, X10 is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2, and a photoresist composition comprising the resin and an acid generator.

    摘要翻译： 本发明提供包含由式（I）表示的化合物衍生的结构单元的树脂：其中R1表示氢原子或甲基，A2表示二价含氟C1-C12烃基，A1表示 由式（a-g1）表示的基团：A10-X10数组A11-（a-g1）其中A10在每次出现时独立地为C1-C5脂族烃基，A11表示C1-C5脂族烃基，X10为 各自独立地为-O - ， - CO - ， - CO-O-或-O-CO-，s为0〜2的整数，以及包含该树脂和酸发生剂的光致抗蚀剂组合物。

    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    4.
    发明申请
    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
    耐蚀组合物及其制造方法

    公开(公告)号：US20120052443A1

    公开(公告)日：2012-03-01

    申请号：US13221597

    申请日：2011-08-30

    申请人： Tatsuro MASUYAMA ,  Satoshi YAMAMOTO ,  Koji ICHIKAWA

    发明人： Tatsuro MASUYAMA ,  Satoshi YAMAMOTO ,  Koji ICHIKAWA

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/38 ,  Y10S430/111 ,  Y10S430/126

    摘要： A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator. wherein R1 represents a hydrogen atom or a methyl group; R2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; A1 represents an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula (a-g1); wherein s represents 0 or 1; A10 and A12 independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group; A11 represents a single bond or an optionally substituted C1 to C5 aliphatic hydrocarbon group; X10 and X11 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group; provided that a total number of the carbon atom of A10, A11, A12, X10 and X11 is 6 or less.

    摘要翻译： 抗蚀剂组合物含有 具有衍生自由式（a）表示的化合物的结构单元的树脂; 和酸发生剂。 其中R1表示氢原子或甲基; R2代表任选取代的C1至C18脂族烃基; A1表示任意取代的C1〜C6烷二基或式（a-g1）表示的基团。 其中s表示0或1; A10和A12独立地表示任选取代的C1至C5脂族烃基; A11表示单键或任选取代的C1至C5脂族烃基; X 10和X 11独立地表示氧原子，羰基，羰氧基或氧羰基; A10，A11，A12，X10和X11的碳原子总数为6以下。

    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    5.
    发明申请
    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
    耐蚀组合物及其制造方法

    公开(公告)号：US20120264059A1

    公开(公告)日：2012-10-18

    申请号：US13441205

    申请日：2012-04-06

    申请人： Koji ICHIKAWA ,  Takahiro YASUE ,  Tatsuro MASUYAMA

    发明人： Koji ICHIKAWA ,  Takahiro YASUE ,  Tatsuro MASUYAMA

    IPC分类号： G03F7/027 ,  G03F7/20

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/027 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041

    摘要： A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.

    摘要翻译： 抗蚀剂组合物包括（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用可溶于碱性水溶液中，（B）具有要通过 碱性显影剂，和（C）由式（I）表示的化合物，其中R1和R2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2 C7酰氧基，C2〜C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    6.
    发明申请
    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
    耐蚀组合物及其制造方法

    公开(公告)号：US20120100483A1

    公开(公告)日：2012-04-26

    申请号：US13281145

    申请日：2011-10-25

    申请人： Tatsuro MASUYAMA ,  Satoshi YAMAMOTO ,  Koji ICHIKAWA

    发明人： Tatsuro MASUYAMA ,  Satoshi YAMAMOTO ,  Koji ICHIKAWA

    IPC分类号： G03F7/20 ,  G03F7/027 ,  G03F7/004

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041

    摘要： A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.

    摘要翻译： 抗蚀剂组合物含有 具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    7.
    发明申请
    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
    耐蚀组合物及其制造方法

    公开(公告)号：US20120100482A1

    公开(公告)日：2012-04-26

    申请号：US13280969

    申请日：2011-10-25

    申请人： Tatsuro MASUYAMA ,  Satoshi YAMAMOTO ,  Koji ICHIKAWA

    发明人： Tatsuro MASUYAMA ,  Satoshi YAMAMOTO ,  Koji ICHIKAWA

    IPC分类号： G03F7/20 ,  G03F7/027 ,  G03F7/004

    CPC分类号： G03F7/2041 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： A resist composition contains a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.

    摘要翻译： 抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C36脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

    PHOTORESIST COMPOSITION
    8.
    发明申请
    PHOTORESIST COMPOSITION 有权
    光电组合物

    公开(公告)号：US20110200935A1

    公开(公告)日：2011-08-18

    申请号：US13025876

    申请日：2011-02-11

    申请人： Tatsuro MASUYAMA ,  Satoshi YAMAGUCHI

    发明人： Tatsuro MASUYAMA ,  Satoshi YAMAGUCHI

    IPC分类号： G03F7/004 ,  G03F7/20 ,  C07C307/02 ,  C07D215/58 ,  C07D295/26 ,  C07D211/96 ,  C07D409/02

    CPC分类号： C07C381/12 ,  C07D211/96 ,  C07D215/58 ,  C07D295/26 ,  C07D409/02 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041

    摘要： The present invention provides a photoresist composition having a sulfonium salt comprising an anion represented by the formula (IA): wherein R1 and R2 independently represent a hydrogen atom, a C1-C12 aliphatic hydrocarbon group, a C3-C20 saturated cyclic hydrocarbon group, a C6-C20 aromatic hydrocarbon group or a C7-C21 aralkyl group, and the aliphatic hydrocarbon group, the saturated cyclic hydrocarbon group, the aromatic hydrocarbon group and the aralkyl group can have one or more substituents selected from the group consisting of a hydroxyl group, a cyano group, a fluorine atom, a trifluoromethyl group and a nitro group, and one or more —CH2— in the aliphatic hydrocarbon group can be replaced by —O— or —CO—, or R1 and R2 are bonded each other to form a C4-C20 nitrogen-containing ring together with the nitrogen atom to which they are bonded, an acrylic resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.

    摘要翻译： 本发明提供具有锍盐的光致抗蚀剂组合物，其包含由式（IA）表示的阴离子：其中R1和R2独立地表示氢原子，C1-C12脂族烃基，C3-C20饱和环状烃基， C6-C20芳族烃基或C7-C21芳烷基，脂族烃基，饱和环烃基，芳香族烃基和芳烷基可以具有一个以上的选自羟基， 氰基，氟原子，三氟甲基和硝基，脂族烃基中的一个或多个-CH 2 - 可以被-O-或-CO-代替，或者R 1和R 2彼此键合形成 与它们所键合的氮原子一起形成的C4-C20含氮环，具有酸不稳定基团的丙烯酸树脂，不溶于或难溶于碱水溶液，但变成solu 通过酸的作用和酸产生剂在碱性水溶液中浸渍。

    SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
    9.
    发明申请
    SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN 有权
    盐，光电组合物和生产光电子图案的方法

    公开(公告)号：US20130040237A1

    公开(公告)日：2013-02-14

    申请号：US13569787

    申请日：2012-08-08

    申请人： Tatsuro MASUYAMA ,  Yuichi MUKAI

    发明人： Tatsuro MASUYAMA ,  Yuichi MUKAI

    IPC分类号： C07C69/675 ,  G03F7/20 ,  G03F7/004

    CPC分类号： C07C381/12 ,  C07C309/08 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/20

    摘要： A photoresist composition which comprises a salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1, R2 and R3 each independently represent a hydrogen atom or a C1-C10 monovalent aliphatic saturated hydrocarbon group, X1 and X2 each independently represent a single bond, a carbonyl group, or a C1-C10 divalent aliphatic saturated hydrocarbon group where a hydrogen atom can be replaced by a hydroxy group and where a methylene group can be replaced by an oxygen atom, a sulfonyl group or a carbonyl group, A1 represents a C1-C30 organic group, m1 represents an integer of 1 to 4, and Z+ represents an organic cation, and a resin which is hardly soluble or insoluble but soluble in an aqueous alkali solution by action of an acid.

    摘要翻译： 一种光致抗蚀剂组合物，其包含式（I）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，R1，R2和R3各自独立地表示氢原子或C1-C10一价脂族 饱和烃基，X 1和X 2各自独立地表示单键，羰基或C 1 -C 10二价脂族饱和烃基，其中氢原子可以被羟基代替，并且其中亚甲基可被氧代替 原子，磺酰基或羰基，A1表示C1-C30有机基团，m1表示1〜4的整数，Z +表示有机阳离子，难溶于或不溶而溶于碱水溶液的树脂 溶液通过酸的作用。