-
公开(公告)号：US06683683B2
公开(公告)日：2004-01-27
申请号：US10084059
申请日：2002-02-28
申请人： Koji Tomita , Muneo Maeshima , Shigeru Matsui , Yoshitaka Kodama , Hitoshi Komuro , Kazuo Takeda
发明人： Koji Tomita , Muneo Maeshima , Shigeru Matsui , Yoshitaka Kodama , Hitoshi Komuro , Kazuo Takeda
IPC分类号： G01N2188
CPC分类号： G01N21/9505 , G01N21/9501
摘要： A defect inspection apparatus for detecting defects existing on a surface of a semiconductor sample and/or inside the sample based on light information from the sample obtained by irradiating a light beam onto the sample is provided, which comprises a detecting means for detecting positions in the depth direction where the defects exist and distribution of the defects based on the light information; a setting means for setting a position in the depth direction where defects exist; and a means for displaying the distribution of the defects obtained by the detecting means, the displaying means displaying the distribution of the defects corresponding to the position in the depth direction set by the setting means.
摘要翻译： 提供了一种用于根据从将样本照射光束获得的样本的光信息检测存在于半导体样品表面和/或样品内部的缺陷的缺陷检查装置，其包括检测装置， 存在缺陷的深度方向和基于光信息的缺陷分布; 用于设置存在缺陷的深度方向上的位置的设定装置; 以及用于显示由检测装置获得的缺陷的分布的装置，显示装置显示与由设置装置设置的深度方向上的位置相对应的缺陷的分布。
-
公开(公告)号：US06384909B2
公开(公告)日：2002-05-07
申请号：US09842929
申请日：2001-04-27
申请人： Koji Tomita , Muneo Maeshima , Shigeru Matsui , Yoshitaka Kodama , Hitoshi Komuro , Kazuo Takeda
发明人： Koji Tomita , Muneo Maeshima , Shigeru Matsui , Yoshitaka Kodama , Hitoshi Komuro , Kazuo Takeda
IPC分类号： G01N2188
CPC分类号： G01N21/9505 , G01N21/9501
摘要： A defect inspection apparatus for detecting defects existing on a surface of a semiconductor sample and/or inside the sample based on light information from the sample obtained by irradiating a light beam onto the sample is provided, which comprises a detecting means for detecting positions in the depth direction where the defects exist and distribution of the defects based on the light information; a setting means for setting a position in the depth direction where defects exist; and a means for displaying the distribution of the defects obtained by the detecting means, the displaying means displaying the distribution of the defects corresponding to the position in the depth direction set by the setting means.
-
公开(公告)号：US6157444A
公开(公告)日：2000-12-05
申请号：US198644
申请日：1998-11-24
申请人： Koji Tomita , Muneo Maeshima , Shigeru Matsui , Hitoshi Komuro , Kazuo Takeda
发明人： Koji Tomita , Muneo Maeshima , Shigeru Matsui , Hitoshi Komuro , Kazuo Takeda
CPC分类号： G01N21/9505 , G01N21/9501
摘要： In order to easily evaluate defects of the silicon wafer affecting the characteristic of a device, the present invention provides a defect inspection apparatus for detecting defects existing on a surface of a sample and/or inside the sample, which comprises a display apparatus for displaying a distribution of the defects on a graph having coordinate axes of distance from a central position of the sample and the depth where the defect exists based on the depth information and the positional information obtained by a detecting means.
摘要翻译： 为了容易地评估影响器件特性的硅晶片的缺陷，本发明提供了一种用于检测存在于样品表面和/或样品内部的缺陷的缺陷检查装置，其包括显示装置 基于由检测装置获得的深度信息和位置信息，在具有距离样本的中心位置的距离的坐标轴和存在缺陷的深度的图形上的缺陷的分布。
-
公开(公告)号：US06256092B1
公开(公告)日：2001-07-03
申请号：US09198093
申请日：1998-11-23
申请人： Koji Tomita , Muneo Maeshima , Shigeru Matsui , Yoshitaka Kodama , Hitoshi Komuro , Kazuo Takeda
发明人： Koji Tomita , Muneo Maeshima , Shigeru Matsui , Yoshitaka Kodama , Hitoshi Komuro , Kazuo Takeda
IPC分类号： G01N2188
CPC分类号： G01N21/9505 , G01N21/9501
摘要： A defect inspection apparatus for detecting defects existing on a surface of a semiconductor sample and/or inside the sample based on light information from the sample obtained by irradiating a light beam onto the sample is provided, which comprises a detecting means for detecting positions in the depth direction where the defects exist and distribution of the defects based on the light information; a setting means for setting a position in the depth direction where defects exist; and a means for displaying the distribution of the defects obtained by the detecting means, the displaying means displaying the distribution of the defects corresponding to the position in the depth direction set by the setting means.
摘要翻译： 一种缺陷检查装置，用于根据来自通过将光束照射在样品上的样品的光信息，检测存在于半导体样品表面和/或样品内部的缺陷，该检测装置包括检测装置， 存在缺陷的深度方向和基于光信息的缺陷分布; 用于设置存在缺陷的深度方向上的位置的设定装置; 以及用于显示由检测装置获得的缺陷的分布的装置，显示装置显示与由设置装置设置的深度方向上的位置相对应的缺陷的分布。
-
公开(公告)号：US08581187B2
公开(公告)日：2013-11-12
申请号：US13059601
申请日：2009-09-16
IPC分类号： G01N23/225
CPC分类号： G03F7/70466 , B82Y10/00 , G01B15/00 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/2817 , H01L22/12
摘要： An amount of displacement and an overlapping area between first and second patterns formed through a double patterning lithography process can be determined. The first pattern is formed by a first exposure while the second pattern is formed by a later second exposure. A first image of the first pattern is formed prior to the formation of the second pattern. A second image of both patterns is formed after the formation of the second pattern. A two-step matching process between combined information and images of the first and second patterns is performed. The combined information includes information regarding the first pattern, as formed, combined with design information of the second pattern. Based on a moving amount of the design information of the second pattern, a displacement amount between the first and second patterns is determined.
摘要翻译： 可以确定通过双重图案化光刻工艺形成的第一和第二图案之间的位移量和重叠面积。 第一图案通过第一曝光形成，而第二图案由稍后的第二曝光形成。 在形成第二图案之前形成第一图案的第一图像。 在形成第二图案之后形成两种图案的第二图像。 执行组合信息和第一和第二图案的图像之间的两步匹配处理。 组合信息包括关于形成的第一图案的信息，与第二图案的设计信息相结合。 基于第二图案的设计信息的移动量，确定第一图案和第二图案之间的位移量。
-
公开(公告)号：US08428500B2
公开(公告)日：2013-04-23
申请号：US12871407
申请日：2010-08-30
申请人： Hitoshi Komuro
发明人： Hitoshi Komuro
IPC分类号： G03G15/01
CPC分类号： G03G15/2053 , G03G15/2025 , G03G15/206 , G03G2215/2009 , G03G2215/2029 , G03G2215/2032
摘要： A belt pressurizing device includes: an endless belt that is circularly driven; a pressing member that presses the endless belt against a facing member with the endless belt interposed between the pressing member and the facing member; and a lubricant supplying member that supplies lubricant to reduce sliding resistance of the endless belt pressed by the pressing member, so as not to be in contact with the endless belt.
摘要翻译： 带式加压装置包括：圆形驱动的环形带; 按压构件，其将环形带压靠在面对构件上，环形带插入在按压构件和面对构件之间; 以及润滑剂供给部件，其供给润滑剂，以降低由所述按压部件按压的所述环形带的滑动阻力，从而不与环形带接触。
-
7.发明授权Fixing device, image forming apparatus and method of controlling fixing device 有权固定装置，图像形成装置和控制定影装置的方法公开(公告)号：US08326200B2
公开(公告)日：2012-12-04
申请号：US12621978
申请日：2009-11-19
申请人： Hitoshi Komuro
发明人： Hitoshi Komuro
CPC分类号： G03G15/2032 , G03G15/2025 , G03G15/206 , G03G2215/2009
摘要： A fixing device includes: a fixing member that fixes a toner image on a recording medium; a fixing pressure member that forms, between the fixing member and the fixing pressure member, a fixing pressure portion for the recording medium holding an unfixed toner image to pass through, by being brought into pressure contact with an outer circumferential surface of the fixing member; a drive unit that rotates the fixing pressure member by rotating the fixing member; and a lubricant adjusting member that comes into contact with an inner circumferential surface of a belt member, at least either the fixing member or the fixing pressure member being the belt member. The lubricant adjusting member is separated from the inner circumferential surface of the belt member, at least while the recording medium and the belt member are in contact with each other and while rotation of the belt member is stopped.
摘要翻译： 定影装置包括：固定构件，其将调色剂图像定影在记录介质上; 定影压力构件，其在所述固定构件和所述定影压力构件之间形成用于保持未定影调色剂图像的记录介质的定影压力部分，以通过与所述固定构件的外周面压力接触; 驱动单元，其通过旋转所述固定构件来旋转所述定影压力构件; 以及与所述带构件的内周面接触的润滑剂调节构件，所述固定构件或所述固定压力构件中的至少一个为所述带构件。 至少在记录介质和带构件彼此接触并且在带构件的旋转停止时，润滑剂调节构件与带构件的内周表面分离。
-
公开(公告)号：US5554863A
公开(公告)日：1996-09-10
申请号：US260331
申请日：1994-06-15
IPC分类号： H01L29/74 , H01L29/08 , H01L29/744 , H01L31/111
CPC分类号： H01L29/744 , H01L29/0834
摘要： A gate turn-off thyristor including: an n-type emitter semiconductor layer divided into a plurality of n-type areas; a p-type base semiconductor layer which cooperates with the n-type emitter semiconductor layer to form a first main circular surface; an n-type base semiconductor layer; and a p-type emitter semiconductor layer cooperating with the n-type base semiconductor layer to form a second main circular surface. An outer diameter of the p-type emitter semiconductor layer is smaller than that of the n-type emitter semiconductor layer. A first main electrode put in low resistance contact with the n-type emitter semiconductor layer is formed on the first main surface. A second main electrode put in low resistance contact with the p-type emitter layer and the n-type base semiconductor layer is formed on the second main surface. A control electrode is formed in the p-type base semiconductor on the first main surface. A first electrode plate larger in diameter than the n-type emitter semiconductor layer is connected electrically with the first main electrode. A second electrode plate larger in diameter than the n-type emitter semiconductor layer is connected electrically with the second main electrode.
摘要翻译： 一种栅极截止晶闸管，包括：分为多个n型区域的n型发射极半导体层; p型基极半导体层，与n型发射极半导体层配合形成第一主圆面; n型基极半导体层; 以及与n型基底半导体层配合形成第二主圆形表面的p型发射极半导体层。 p型发射极半导体层的外径小于n型发射极半导体层的外径。 在第一主表面上形成与n型发射极半导体层低电阻接触的第一主电极。 在第二主表面上形成与p型发射极层和n型基极半导体层低电阻接触的第二主电极。 控制电极形成在第一主表面上的p型基极半导体中。 直径大于n型发射极半导体层的第一电极板与第一主电极电连接。 直径大于n型发射极半导体层的第二电极板与第二主电极电连接。
-
公开(公告)号：US20110139982A1
公开(公告)日：2011-06-16
申请号：US13059601
申请日：2009-09-16
IPC分类号： G01N23/225
CPC分类号： G03F7/70466 , B82Y10/00 , G01B15/00 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/2817 , H01L22/12
摘要： An object of the present invention is to provide a method that can properly carry out the evaluation of a displacement and an overlapping area between first and second patterns formed through double patterning and a device therefor.To accomplish the above object, a method and a device are provided that execute a two-step matching between combined information having information concerning the first pattern combined with design information of the second pattern formed through a second exposure of double patterning and images displaying the first and second patterns, and on the basis of a moving amount of the design information of the second pattern, a displacement amount between the first and second patterns is determined.
摘要翻译： 本发明的目的是提供一种可以适当地进行通过双重图案形成的第一和第二图案之间的位移和重叠区域的评估的方法及其装置。 为了实现上述目的，提供了一种方法和装置，其执行具有与通过双重图案化的第二曝光形成的第二图案的设计信息相组合的第一图案的信息的组合信息和显示第一图像的图像之间的两步匹配 和第二图案，并且基于第二图案的设计信息的移动量，确定第一图案和第二图案之间的位移量。
-
10.发明授权公开(公告)号：US07925095B2
公开(公告)日：2011-04-12
申请号：US11698988
申请日：2007-01-29
IPC分类号： G06K9/32
CPC分类号： G06K9/6204 , G06K9/4633
摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
摘要翻译： 能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。 在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案 基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案 在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。
-
-
-
-
-
-
-
-
-
搜索结果
31 条记录 (耗时 0.028 秒)