公开(公告)号：US07335900B2

公开(公告)日：2008-02-26

申请号：US11178597

申请日：2005-07-12

申请人： Konstantin Nikolaevitch Koshelev ,  Vladimir Vitalevitch Ivanov ,  Evgenii Dmitreevitch Korob ,  Givi Georgievitch Zukavishvili ,  Robert Rafilevitch Gayazov ,  Vladimir Mihailovitch Krivtsun

发明人： Konstantin Nikolaevitch Koshelev ,  Vladimir Vitalevitch Ivanov ,  Evgenii Dmitreevitch Korob ,  Givi Georgievitch Zukavishvili ,  Robert Rafilevitch Gayazov ,  Vladimir Mihailovitch Krivtsun

IPC分类号： H01J65/04

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A device for generating radiation or a source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.

摘要翻译： 基于放电产生辐射或源的装置包括阴极和阳极。 阴极和阳极材料以流体状态供应。 当设备使用时，该材料形成等离子体夹紧。 可选地，可以使用喷嘴来供应材料。 阴极和/或阳极可以形成平坦表面。 材料的轨迹可以是细长的。 可以使用激光器来使放电更容易。 激光可以被引导到阴极的阳极或位于阳极和阴极之间的单独的材料上。

公开(公告)号：US08018574B2

公开(公告)日：2011-09-13

申请号：US11170788

申请日：2005-06-30

申请人： Robert Rafilevitch Gayazov ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Evgenii Dmitreevitch Korob ,  Konstantin Nikolaevitch Koshelev ,  Givi Georgievitch Zukavishvili ,  Yurii Victorovitch Sidelnikov

发明人： Robert Rafilevitch Gayazov ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Evgenii Dmitreevitch Korob ,  Konstantin Nikolaevitch Koshelev ,  Givi Georgievitch Zukavishvili ,  Yurii Victorovitch Sidelnikov

IPC分类号： G03B27/42

CPC分类号： G03F7/70916

摘要： A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.

摘要翻译： 箔陷阱位于辐射束的路径中。 箔阱包括导电条的阵列。 电压施加电路耦合到条带以在相邻条带之间施加电压差。 电压施加电路包括限流电路，其被布置为将电流限制到条带以下的值到低于阈值的值，在该阈值以上可能在箔阱中产生自持电弧放电。

公开(公告)号：US07208746B2

公开(公告)日：2007-04-24

申请号：US10890381

申请日：2004-07-14

申请人： Konstantin Nikolaevitch Koshelev ,  Vladimir Vitalevitch Ivanov ,  Evgenii Dmitreevitch Korob ,  Givi Georgievitch Zukavishvili ,  Robert Rafilevitch Gayazov ,  Vladimir Mihailovitch Krivtsum

发明人： Konstantin Nikolaevitch Koshelev ,  Vladimir Vitalevitch Ivanov ,  Evgenii Dmitreevitch Korob ,  Givi Georgievitch Zukavishvili ,  Robert Rafilevitch Gayazov ,  Vladimir Mihailovitch Krivtsum

IPC分类号： H01J65/04

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A device for generating radiation source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.

摘要翻译： 基于放电产生辐射源的装置包括阴极和阳极。 阴极和阳极材料以流体状态供应。 当设备使用时，该材料形成等离子体夹紧。 可选地，可以使用喷嘴来供应材料。 阴极和/或阳极可以形成平坦表面。 材料的轨迹可以是细长的。 可以使用激光器来使放电更容易。 激光可以被引导到阴极的阳极或位于阳极和阴极之间的单独的材料上。

公开(公告)号：US07462851B2

公开(公告)日：2008-12-09

申请号：US11525224

申请日：2006-09-22

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Robert Rafilevitch Gayazov ,  Vladimir Mihailovitch Krivtsun

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Robert Rafilevitch Gayazov ,  Vladimir Mihailovitch Krivtsun

IPC分类号： H01J65/04

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A device for generating radiation source based on a discharge includes a cathode and an anode. A discharge is created in a material comprising an alloy of two or more substances.

摘要翻译： 基于放电产生辐射源的装置包括阴极和阳极。 在包含两种或更多种物质的合金的材料中产生放电。

公开(公告)号：US07279690B2

公开(公告)日：2007-10-09

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

IPC分类号： H05H3/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US20080137050A1

公开(公告)日：2008-06-12

申请号：US11634386

申请日：2006-12-06

申请人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/42 ,  G21K5/00

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.

摘要翻译： 公开了一种辐射源，其包括阳极和阴极，其构造和布置成在阳极和阴极之间的放电空间中的物质中产生放电并形成等离子体以产生电磁辐射，阳极和 阴极围绕旋转轴线可旋转地安装，阴极被布置成保持液态金属。 辐射源还包括激活源，其被布置成将能量束引导到液态金属上，以便使部分液态金属蒸发，并且液态金属提供器被布置成提供附加的液态金属，以便补偿液态金属的汽化部分 。

公开(公告)号：US07061574B2

公开(公告)日：2006-06-13

申请号：US10985037

申请日：2004-11-10

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.

摘要翻译： 提供光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于保持基板的基板台，用于将图案化的辐射束投射到基板的目标部分上的投影系统，以及用于将吸气剂颗粒供应到辐射束中的颗粒供应单元，以用作 吸收剂用于辐射束中的污染颗粒。 吸气剂颗粒具有至少约1nm的直径。

公开(公告)号：US20080142736A1

公开(公告)日：2008-06-19

申请号：US11637936

申请日：2006-12-13

申请人： Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailovitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer

发明人： Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailovitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer

IPC分类号： G21K5/00 ,  H05G2/00

CPC分类号： G03F7/70933 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

摘要翻译： 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。

公开(公告)号：US07696492B2

公开(公告)日：2010-04-13

申请号：US11637936

申请日：2006-12-13

申请人： Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailovitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer

发明人： Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailovitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer

IPC分类号： A61N5/00 ,  G21G5/00

CPC分类号： G03F7/70933 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

摘要翻译： 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。

公开(公告)号：US07518134B2

公开(公告)日：2009-04-14

申请号：US11634386

申请日：2006-12-06

申请人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.

摘要翻译： 公开了一种辐射源，其包括阳极和阴极，其构造和布置成在阳极和阴极之间的放电空间中的物质中产生放电并形成等离子体以产生电磁辐射，阳极和 阴极围绕旋转轴线可旋转地安装，阴极被布置成保持液态金属。 辐射源还包括激活源，其被布置成将能量束引导到液态金属上，以便使部分液态金属蒸发，并且液态金属提供器被布置成提供附加的液态金属，以便补偿液态金属的汽化部分 。