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1.发明授权公开(公告)号：US08018574B2
公开(公告)日：2011-09-13
申请号：US11170788
申请日：2005-06-30
申请人： Robert Rafilevitch Gayazov , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Evgenii Dmitreevitch Korob , Konstantin Nikolaevitch Koshelev , Givi Georgievitch Zukavishvili , Yurii Victorovitch Sidelnikov
发明人： Robert Rafilevitch Gayazov , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Evgenii Dmitreevitch Korob , Konstantin Nikolaevitch Koshelev , Givi Georgievitch Zukavishvili , Yurii Victorovitch Sidelnikov
IPC分类号： G03B27/42
CPC分类号： G03F7/70916
摘要： A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.
摘要翻译： 箔陷阱位于辐射束的路径中。 箔阱包括导电条的阵列。 电压施加电路耦合到条带以在相邻条带之间施加电压差。 电压施加电路包括限流电路，其被布置为将电流限制到条带以下的值到低于阈值的值，在该阈值以上可能在箔阱中产生自持电弧放电。
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2.发明授权Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby 有权辐射发生器件，光刻设备，器件制造方法和由此制造的器件公开(公告)号：US07335900B2
公开(公告)日：2008-02-26
申请号：US11178597
申请日：2005-07-12
申请人： Konstantin Nikolaevitch Koshelev , Vladimir Vitalevitch Ivanov , Evgenii Dmitreevitch Korob , Givi Georgievitch Zukavishvili , Robert Rafilevitch Gayazov , Vladimir Mihailovitch Krivtsun
发明人： Konstantin Nikolaevitch Koshelev , Vladimir Vitalevitch Ivanov , Evgenii Dmitreevitch Korob , Givi Georgievitch Zukavishvili , Robert Rafilevitch Gayazov , Vladimir Mihailovitch Krivtsun
IPC分类号： H01J65/04
摘要： A device for generating radiation or a source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.
摘要翻译： 基于放电产生辐射或源的装置包括阴极和阳极。 阴极和阳极材料以流体状态供应。 当设备使用时，该材料形成等离子体夹紧。 可选地，可以使用喷嘴来供应材料。 阴极和/或阳极可以形成平坦表面。 材料的轨迹可以是细长的。 可以使用激光器来使放电更容易。 激光可以被引导到阴极的阳极或位于阳极和阴极之间的单独的材料上。
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3.发明授权Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby 有权辐射发生器件，光刻设备，器件制造方法和由此制造的器件公开(公告)号：US07208746B2
公开(公告)日：2007-04-24
申请号：US10890381
申请日：2004-07-14
申请人： Konstantin Nikolaevitch Koshelev , Vladimir Vitalevitch Ivanov , Evgenii Dmitreevitch Korob , Givi Georgievitch Zukavishvili , Robert Rafilevitch Gayazov , Vladimir Mihailovitch Krivtsum
发明人： Konstantin Nikolaevitch Koshelev , Vladimir Vitalevitch Ivanov , Evgenii Dmitreevitch Korob , Givi Georgievitch Zukavishvili , Robert Rafilevitch Gayazov , Vladimir Mihailovitch Krivtsum
IPC分类号： H01J65/04
摘要： A device for generating radiation source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.
摘要翻译： 基于放电产生辐射源的装置包括阴极和阳极。 阴极和阳极材料以流体状态供应。 当设备使用时，该材料形成等离子体夹紧。 可选地，可以使用喷嘴来供应材料。 阴极和/或阳极可以形成平坦表面。 材料的轨迹可以是细长的。 可以使用激光器来使放电更容易。 激光可以被引导到阴极的阳极或位于阳极和阴极之间的单独的材料上。
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公开(公告)号：US07279690B2
公开(公告)日：2007-10-09
申请号：US11094490
申请日：2005-03-31
申请人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans , Givi Georgievitch Zukavishvili , Bastiaan Theodoor Wolschrijn , Marc Hubertus Lorenz Van Der Velden
发明人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans , Givi Georgievitch Zukavishvili , Bastiaan Theodoor Wolschrijn , Marc Hubertus Lorenz Van Der Velden
IPC分类号： H05H3/00
CPC分类号： G03F7/70933 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.
摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。
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5.发明授权公开(公告)号：US07462851B2
公开(公告)日：2008-12-09
申请号：US11525224
申请日：2006-09-22
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Robert Rafilevitch Gayazov , Vladimir Mihailovitch Krivtsun
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Robert Rafilevitch Gayazov , Vladimir Mihailovitch Krivtsun
IPC分类号： H01J65/04
摘要： A device for generating radiation source based on a discharge includes a cathode and an anode. A discharge is created in a material comprising an alloy of two or more substances.
摘要翻译： 基于放电产生辐射源的装置包括阴极和阳极。 在包含两种或更多种物质的合金的材料中产生放电。
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6.发明授权公开(公告)号：US06933510B2
公开(公告)日：2005-08-23
申请号：US10673644
申请日：2003-09-30
申请人： Givi Georgievitch Zukavishvili , Vladimir Vital'Evitch Ivanov , Konstantin Nikolaevitch Koshelev , Evgenil Dmitreevitch Korob , Vadim Yevgenyevich Banine , Pavel Stanislavovich Antsiferov
发明人： Givi Georgievitch Zukavishvili , Vladimir Vital'Evitch Ivanov , Konstantin Nikolaevitch Koshelev , Evgenil Dmitreevitch Korob , Vadim Yevgenyevich Banine , Pavel Stanislavovich Antsiferov
IPC分类号： G21K5/00 , F28D15/02 , G03F7/20 , G21K5/02 , G21K5/08 , H01L21/027 , H05G2/00 , H05H1/24 , A61N5/00 , G21G4/00 , H01J61/04
CPC分类号： H05G2/003 , B82Y10/00 , F28D15/0266 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.
摘要翻译： 提供了一种辐射源单元，其包括阳极和阴极，所述阳极和阴极被配置和布置成在所述阳极和阴极之间的空间中的物质中产生放电并形成等离子体以产生电磁辐射。 该物质可以包括氙，铟，锂，锡或任何合适的材料。 为了提高转换效率，源单元可被构造为具有低电感，并且以最小的等离子体运行。 例如，为了改善散热，可以通过在其蒸汽和液态中使用流体在源体积和芯中产生流体循环系统。 例如，为了防止污染物进入光刻投影设备，可以构建源单元以使污染物的产生最小化，并且捕集器可用于捕获污染物而不干扰所发射的辐射。
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公开(公告)号：US07528395B2
公开(公告)日：2009-05-05
申请号：US10664065
申请日：2003-09-17
申请人： Konstantin Nikolaevitch Koshelev , Vadim Yevgenyevich Banine , Vladimir Vital'Evitch Ivanov , Erik René Kieft , Erik Roelof Loopstra , Lucas Henricus Johannes Stevens , Yurii Victorovitch Sidelkov , Vsevolod Grigorevitch Koloshnikov , Vladimir Mihailovitch Krivtsun , Robert Rafilevitch Gayazov , Olav Waldemar Vladimir Frijns
发明人： Konstantin Nikolaevitch Koshelev , Vadim Yevgenyevich Banine , Vladimir Vital'Evitch Ivanov , Erik René Kieft , Erik Roelof Loopstra , Lucas Henricus Johannes Stevens , Yurii Victorovitch Sidelkov , Vsevolod Grigorevitch Koloshnikov , Vladimir Mihailovitch Krivtsun , Robert Rafilevitch Gayazov , Olav Waldemar Vladimir Frijns
CPC分类号： H05G2/003 , B82Y10/00 , F28D15/0266 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.
摘要翻译： 辐射源包括阳极和阴极，其被构造和布置成在阳极和阴极之间的空间中的气体或蒸气中产生放电并且形成等离子体夹点以产生电磁辐射。 气体或蒸汽可以包括氙，铟，锂和/或锡。 辐射源可以包括多个放电元件，每个放电元件仅用于短间隔，之后选择另一个放电元件。 辐射源还可以包括触发装置，该装置可以有助于改善夹紧形成的精确定时并因此改善EUV辐射的脉冲。 辐射源也可以被构造为具有低电感，并以自触发方式操作。
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8.发明授权Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby 失效具有污染抑制的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07061574B2
公开(公告)日：2006-06-13
申请号：US10985037
申请日：2004-11-10
申请人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Vladimir Mihailovitch Krivtsun
发明人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Vladimir Mihailovitch Krivtsun
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70908 , G03F7/70916
摘要： A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.
摘要翻译： 提供光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于保持基板的基板台，用于将图案化的辐射束投射到基板的目标部分上的投影系统，以及用于将吸气剂颗粒供应到辐射束中的颗粒供应单元，以用作 吸收剂用于辐射束中的污染颗粒。 吸气剂颗粒具有至少约1nm的直径。
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9.发明申请Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method 有权等离子体辐射源，形成等离子体辐射的方法，用于将图案从图案形成装置投影到衬底上的装置和器件制造方法公开(公告)号：US20080142740A1
公开(公告)日：2008-06-19
申请号：US11638670
申请日：2006-12-14
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916 , H05G2/005
摘要： A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.
摘要翻译： 将图案化的辐射束投影到基底上。 反射光学元件用于帮助从等离子体源的等离子体区域发射的辐射形成辐射束。 在等离子体源中，在等离子体区域中产生等离子体电流。 为了减少对反射光学元件的损伤，在等离子体区域中施加至少一个沿着等离子体电流的方向指向的分量的磁场。 该轴向磁场有助于限制等离子体的Z夹点区域的塌陷。 通过限制塌陷，可以减少发射的快速离子的数量。
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10.发明授权Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method 失效等离子体辐射源，形成等离子体辐射的方法，用于将图案从图案形成装置投影到衬底上的装置和器件制造方法公开(公告)号：US08362444B2
公开(公告)日：2013-01-29
申请号：US12907135
申请日：2010-10-19
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916 , H05G2/005
摘要： A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.
摘要翻译： 将图案化的辐射束投影到基底上。 反射光学元件用于帮助从等离子体源的等离子体区域发射的辐射形成辐射束。 在等离子体源中，在等离子体区域中产生等离子体电流。 为了减少对反射光学元件的损伤，在等离子体区域中施加至少一个沿着等离子体电流的方向指向的分量的磁场。 该轴向磁场有助于限制等离子体的Z夹点区域的塌陷。 通过限制塌陷，可以减少发射的快速离子的数量。
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