公开(公告)号：US6139636A

公开(公告)日：2000-10-31

申请号：US189846

申请日：1998-11-12

申请人： Kuo-Feng Huang ,  Kuo-Chen Wang ,  Ming-Che Yang ,  Hsien-Jung Hsu

发明人： Kuo-Feng Huang ,  Kuo-Chen Wang ,  Ming-Che Yang ,  Hsien-Jung Hsu

IPC分类号： B05B1/14 ,  B05C11/08 ,  B05B13/04

CPC分类号： B05B1/14 ,  B05C11/08

摘要： A spray coating device for coating a rotating wafer according to the invention is disclosed. The spray coating device comprises a spray head having a plurality of spray holes which are located on one end thereof with more in number on both sides than on the center of the end for uniformly spraying a chemical liquid on the rotated wafer. Since spray holes are more in number on the both sides than on the center of the end, the rotated wafer can be uniformly spray coated with the chemical liquid even though several spray holes are congested.

摘要翻译： 公开了一种用于涂覆根据本发明的旋转晶片的喷涂装置。 喷涂装置包括喷头，喷头具有多个喷孔，该多个喷孔位于其一端，其两侧的数量多于末端的中心，用于均匀地喷洒旋转的晶片上的化学液体。 由于喷孔在两侧的数量多于端部的中心，即使几个喷孔堵塞，旋转的晶片也可以均匀地喷涂有化学液体。

公开(公告)号：US6015096A

公开(公告)日：2000-01-18

申请号：US181100

申请日：1998-10-28

申请人： Kuo-Feng Huang ,  Kuo-Chen Wang ,  Hsien-Jung Hsu ,  Hung-Lung Ma

发明人： Kuo-Feng Huang ,  Kuo-Chen Wang ,  Hsien-Jung Hsu ,  Hung-Lung Ma

IPC分类号： F16K37/00 ,  B67D5/08

CPC分类号： F16K37/0016 ,  Y10T137/8175 ,  Y10T137/8309

摘要： A speed controller with scales according to the invention is used to adjust the amount of an air flow thereby to control the amount of a chemical liquid sprayed. The speed controller includes a housing, a controller body and a transparent tube. The controller body is partly inserted in the housing and has a rotary button located at one end thereof and outside the housing. The rotary button has a slot and an indicator thereon, wherein the indicator is located at one end of the slot. The transparent tube, having a vertical scale on the side thereof and a circular scale on the top circumference thereof, encloses the rotary button. In the invention, the position of the rotary button can be determined by reading the vertical scale and the circular scale so as to precisely control the amount of a chemical liquid sprayed, thereby increasing yield and improving engineering analysis.

摘要翻译： 使用根据本发明的具有鳞片的速度控制器来调节空气流量从而控制喷射的化学液体的量。 速度控制器包括壳体，控制器主体和透明管。 控制器主体部分地插入壳体中，并且具有位于其一端和壳体外部的旋转按钮。 旋转按钮在其上具有狭槽和指示器，其中指示器位于狭槽的一端。 在其一侧具有垂直刻度的透明管和其顶部圆周上的圆形鳞片包围旋转按钮。 在本发明中，可以通过读取垂直刻度和圆形刻度来确定旋转按钮的位置，以精确地控制喷射的化学液体的量，从而提高产量并改进工程分析。

公开(公告)号：US6048399A

公开(公告)日：2000-04-11

申请号：US82949

申请日：1998-05-21

申请人： En-Tien Tan ,  Ming-Che Yang ,  Kuo-Feng Huang ,  Ching-Chih Cheng

发明人： En-Tien Tan ,  Ming-Che Yang ,  Kuo-Feng Huang ,  Ching-Chih Cheng

IPC分类号： B05C5/00 ,  B05C11/08 ,  B05C11/10 ,  H01L21/00 ,  H01L21/31 ,  B05C11/02 ,  B05D3/12

CPC分类号： H01L21/6715 ,  B05C11/08 ,  B05C11/10

摘要： A SOG coater nozzle pot includes a pot for containing fluid and letting the fluid in the pot flow out, a funneled nozzle including a wider opening for receiving fluid from the pot and a narrower opening on a protuberance inserted into a duct, and a mounting device for mounting the funneled nozzle on the SOG coater. The nozzle pot according to the invention makes the mounting/dismounting operations of the pot more convenient and less time-consuming. The stability of the SOG coater is maintained as well.

摘要翻译： SOG涂布机喷嘴罐包括用于容纳流体并使罐中的流体流出的罐，包括用于从罐接收流体的较宽开口和在插入管道中的突起上的较窄开口的漏斗喷嘴，以及安装装置 用于将漏斗喷嘴安装在SOG涂布机上。 根据本发明的喷嘴罐使得罐的安装/拆卸操作更方便和更少耗时。 也保持SOG涂布机的稳定性。

公开(公告)号：US6062442A

公开(公告)日：2000-05-16

申请号：US185778

申请日：1998-11-03

申请人： Ming-Che Yang ,  Kuo-Feng Huang ,  Eric Liu ,  En-Tien Tan

发明人： Ming-Che Yang ,  Kuo-Feng Huang ,  Eric Liu ,  En-Tien Tan

IPC分类号： B65D5/72

CPC分类号： H01L21/67017 ,  H01L21/6715

摘要： A photoresist dispensing system used in a photoresist coating machine includes a pump, a sucking-back valve, a solenoid valve, a first pump speed controller, a second pump speed controller and a sucking-back speed controller. The pump is used to transport photoresist and spray a substrate. The sucking-back valve is used to suck back liquid photoresist from a transporting duct end. The solenoid is used to activate or inactivate the pump and the sucking-back valve. The first and the second pump speed controllers are separately coupled between the pump and the solenoid valve, and the sucking-back speed controller is coupled between the sucking-back valve and the sucking-back speed controller is coupled between the sucking-back valve and the route, where is between the pump and the second pump speed controller. Hence, the sucking-back valve produces a sucking force after the pump is inactivated and releases a sucking force after pump is activated.

摘要翻译： 在光致抗蚀剂涂布机中使用的光致抗蚀剂分配系统包括泵，回吸阀，电磁阀，第一泵速控制器，第二泵速控制器和回吸速度控制器。 泵用于输送光致抗蚀剂并喷涂基材。 吸回阀用于从输送管道端部吸回液态光致抗蚀剂。 螺线管用于启动或停用泵和吸回阀。 第一和第二泵速控制器分别耦合在泵和电磁阀之间，并且吸回速度控制器耦合在吸回阀和吸回速度控制器之间，该回吸速度控制器耦合在吸回阀和 该路径在泵和第二泵速度控制器之间。 因此，在泵被激活之后，吸回阀产生吸力并在泵被激活之后释放吸力。

公开(公告)号：US06170512B2

公开(公告)日：2001-01-09

申请号：US09431938

申请日：1999-11-01

申请人： Kuei-Hsi Lai ,  Kuo-Feng Huang ,  Ming-Che Yang ,  Hung-Lung Mar

发明人： Kuei-Hsi Lai ,  Kuo-Feng Huang ,  Ming-Che Yang ,  Hung-Lung Mar

IPC分类号： G05D706

CPC分类号： G05D7/0676 ,  Y10T137/3127 ,  Y10T137/7759

摘要： A supply apparatus comprises a storage tank, a chemical flow pipe to route a chemical solution into a semiconductor processing room, a pressurizing apparatus to supply gas to the storage tank to make the chemical solution flow into the processing room, and an electro-Pneumatic regulator valve to adjust the pressure of the input gas. The flow control device comprises a flow sensor, a set-up apparatus, and a processor for generating a control signal to the pressurizing apparatus depending on a difference between a target value and a measurement value to adjust the flow of the chemical solution in the chemical flow pipe. The flow sensor comprises a hollow cylinder, a choking magnetic core movably positioned inside the hollow cylinder, and a first and second conductive coil wrapped around the outer wall of the hollow cylinder which uses alternating current to generate a magnetic flux and sense a change in the magnetic flux to measure the flow of chemical solution.

摘要翻译： 供给装置包括储存箱，将化学溶液输送到半导体处理室的化学流动管，将储存罐供给气体以使化学溶液流入处理室的加压装置，以及电动气动调节器 阀门调节输入气体的压力。 流量控制装置包括流量传感器，设置装置和处理器，用于根据目标值和测量值之间的差异向加压装置产生控制信号，以调整化学溶液在化学品中的流动 流量管。 流量传感器包括中空圆筒，可移动地定位在中空圆柱体内的阻塞磁芯，以及缠绕在中空圆柱体的外壁上的第一和第二导电线圈，其使用交流电产生磁通量并感测中空圆柱体的变化 磁通量测量化学溶液的流量。

公开(公告)号：US6099646A

公开(公告)日：2000-08-08

申请号：US185404

申请日：1998-11-03

申请人： Ming-Che Yang ,  Kuo-Feng Huang ,  En-Tien Tan ,  Kuei-Hsi Lai

发明人： Ming-Che Yang ,  Kuo-Feng Huang ,  En-Tien Tan ,  Kuei-Hsi Lai

IPC分类号： B05C11/08 ,  B05C11/10 ,  B05C11/00

CPC分类号： B05C11/08 ,  B05C11/1002

摘要： A dispensing system used in a spin coater is provided to transport a solvent to a wafer. The dispensing, system includes a switch valve, a sucking-back valve, a solenoid valve, a speed control unit of the sucking-back valve, and a speed control unit of the switch valve. The switch valve controls a solvent dispensing status. The sucking-back valve receives the solvent from the switch valve and exports the solvent to a wafer. The solenoid valve controls the switch valve and the sucking-back valve. The speed control unit of the switch valve is coupled between the switch valve and the solenoid valve and is used for a control of action speed on the switch valve. The speed control unit of the sucking-back valve is coupled between the switch valve and the sucking-back valve, and is used for a control of action speed of the sucking-back valve by a sufficient delay time of action.

摘要翻译： 提供用于旋转涂布机中的分配系统以将溶剂输送到晶片。 分配系统包括开关阀，回吸阀，电磁阀，回吸阀的速度控制单元和开关阀的速度控制单元。 开关阀控制溶剂分配状态。 吸回阀从开关阀接收溶剂并将溶剂输出到晶片。 电磁阀控制开关阀和回吸阀。 开关阀的速度控制单元连接在开关阀和电磁阀之间，用于控制开关阀上的动作速度。 回抽阀的速度控制单元联接在开关阀和回吸阀之间，用于通过足够的延迟动作来控制回抽阀的动作速度。

公开(公告)号：USD690235S1

公开(公告)日：2013-09-24

申请号：US29422786

申请日：2012-05-24

申请人： Wen-Yung Wu ,  Kuo-Feng Huang ,  Kai-Tong Yang

设计人： Wen-Yung Wu ,  Kuo-Feng Huang ,  Kai-Tong Yang

公开(公告)号：USD601928S1

公开(公告)日：2009-10-13

申请号：US29332829

申请日：2009-02-26

申请人： Chia-Ching Chen ,  Cheng-Wei Lin ,  Kuo-Feng Huang

设计人： Chia-Ching Chen ,  Cheng-Wei Lin ,  Kuo-Feng Huang

公开(公告)号：US06295683B1

公开(公告)日：2001-10-02

申请号：US09457308

申请日：1999-12-09

申请人： Kuei-Si Lai ,  Shih-Hsun Chiou ,  Kuo-Feng Huang ,  Ching-Chih Cheng

发明人： Kuei-Si Lai ,  Shih-Hsun Chiou ,  Kuo-Feng Huang ,  Ching-Chih Cheng

IPC分类号： B08B104

CPC分类号： B08B1/04 ,  B08B3/02

摘要： The present invention provides equipment for brushing the underside of a semiconductorwafer that is placed on a rotary wafer chuck. The equipment comprises a brush rod, a brush with a channel in it mounted at an end point of the brush rod, a nozzle for spraying water on the underside of the semiconductor wafer, and a driving device connected to the brush rod for driving the brush rod in a reciprocating motion. The wafer chuck rotates the semiconductor wafer and, simultaneously, water drives the blade and the brush to raise and rotate so as to spray water over the underside of the semiconductor wafer. The driving device drives the brush to brush the underside of the semiconductor wafer along a radial direction of the semiconductor wafer.

摘要翻译： 本发明提供了用于刷涂放置在旋转晶片卡盘上的半导体晶片的下侧的设备。 该设备包括一个刷杆，一个刷子，其中安装在刷杆端部的通道，用于在半导体晶片的下侧喷水的喷嘴，以及连接到刷杆的驱动装置，用于驱动刷子 杆往复运动。 晶片卡盘旋转半导体晶片，同时，水驱动叶片和刷子以升高和旋转，以便在半导体晶片的下侧喷射水。 驱动装置驱动刷子沿着半导体晶片的径向刷刷半导体晶片的下侧。

公开(公告)号：US06177874B1

公开(公告)日：2001-01-23

申请号：US09074057

申请日：1998-05-07

申请人： Ching-Chih Cheng ,  Wen-Liang Fang ,  Kuo-Feng Huang ,  Hung-Lung Ma

发明人： Ching-Chih Cheng ,  Wen-Liang Fang ,  Kuo-Feng Huang ,  Hung-Lung Ma

IPC分类号： G08B2100

CPC分类号： G01F23/2925 ,  Y10S250/902 ,  Y10S250/904

摘要： A liquid supplying device comprising a liquid container for storing a liquid so as to supply an external device and a liquid level sensor for detecting the liquid level. As the liquid within the liquid container is gradually used up, liquid level drops. As soon as the remaining liquid in the container drops to a predetermined amount, the liquid level sensor emits a warning signal to the operator, and the operator can then replenish the liquid in the container.

摘要翻译： 一种液体供应装置，包括用于存储液体以供应外部装置的液体容器和用于检测液面的液位传感器。 随着液体容器内的液体逐渐消耗，液面下降。 一旦容器中的剩余液体下降到预定量，液位传感器向操作者发出警告信号，然后操作者可以补充容器中的液体。