公开(公告)号：US07697129B2

公开(公告)日：2010-04-13

申请号：US12097172

申请日：2006-12-14

申请人： Kurt L. Haller ,  David Shortt ,  Christian Wolters

发明人： Kurt L. Haller ,  David Shortt ,  Christian Wolters

IPC分类号： G01N21/00

CPC分类号： G01N21/9501

摘要： Systems and methods for inspecting a wafer with increased sensitivity are provided. One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer. The system also includes a gas flow subsystem configured to replace a gas located proximate to the spot on the wafer with a medium that scatters less of the light than the gas thereby increasing the sensitivity of the system. In addition, the system includes a processor configured to detect defects on the wafer using the output signals.

摘要翻译： 提供了用于检查具有增加的灵敏度的晶片的系统和方法。 一个系统包括检查子系统，该检查子系统被配置为将光引导到晶片上的一个点上，并产生响应于从晶片上的点散射的光的输出信号。 该系统还包括气流子系统，该气流子系统被配置成用与气体相比散射的光更少的介质来替代位于晶片上的点附近的气体，从而增加了系统的灵敏度。 另外，该系统包括配置成使用输出信号来检测晶片上的缺陷的处理器。

公开(公告)号：US07372559B2

公开(公告)日：2008-05-13

申请号：US11302936

申请日：2005-12-14

申请人： Kurt L. Haller ,  David Shortt ,  Christian Wolters

发明人： Kurt L. Haller ,  David Shortt ,  Christian Wolters

IPC分类号： G01N21/00

CPC分类号： G01N21/9501

摘要： Systems and methods for inspecting a wafer with increased sensitivity are provided. One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer. The system also includes a gas flow subsystem configured to replace a gas located proximate to the spot on the wafer with a medium that scatters less of the light than the gas thereby increasing the sensitivity of the system. In addition, the system includes a processor configured to detect defects on the wafer using the output signals.

摘要翻译： 提供了用于检查具有增加的灵敏度的晶片的系统和方法。 一个系统包括检查子系统，该检查子系统被配置为将光引导到晶片上的一个点上，并产生响应于从晶片上的点散射的光的输出信号。 该系统还包括气流子系统，该气流子系统被配置成用与气体相比散射的光更少的介质来替代位于晶片上的点附近的气体，从而增加了系统的灵敏度。 另外，该系统包括配置成使用输出信号来检测晶片上的缺陷的处理器。

公开(公告)号：US20090009754A1

公开(公告)日：2009-01-08

申请号：US12097172

申请日：2006-12-14

申请人： Kurt L. Haller ,  David Shortt ,  Christian Wolters

发明人： Kurt L. Haller ,  David Shortt ,  Christian Wolters

IPC分类号： G01N21/88

CPC分类号： G01N21/9501

摘要： One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer. The system also includes a gas flow subsystem configured to replace a gas located proximate to the spot on the wafer with a medium that scatters less of the light than the gas thereby increasing the sensitivity of the system. In addition, the system includes a processor configured to detect defects on the wafer using the output signals.

摘要翻译： 一个系统包括检查子系统，该检查子系统被配置为将光引导到晶片上的一个点上，并产生响应于从晶片上的点散射的光的输出信号。 该系统还包括气流子系统，该气流子系统被配置成用与气体相比散射的光更少的介质来替代位于晶片上的点附近的气体，从而增加了系统的灵敏度。 另外，该系统包括配置成使用输出信号来检测晶片上的缺陷的处理器。

公开(公告)号：US07436505B2

公开(公告)日：2008-10-14

申请号：US11278624

申请日：2006-04-04

申请人： Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike D. Kirk ,  David Shortt ,  Brian L. Haas ,  Kurt L. Haller

发明人： Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike D. Kirk ,  David Shortt ,  Brian L. Haas ,  Kurt L. Haller

IPC分类号： G01N21/00

CPC分类号： G01N21/9501

摘要： Computer-implemented methods and systems for determining a configuration for a light scattering inspection system are provided. One computer-implemented method includes determining a three-dimensional map of signal-to-noise ratio values for data that would be acquired for a specimen and a potential defect on the specimen by the light scattering inspection system across a scattering hemisphere of the inspection system. The method also includes determining one or more portions of the scattering hemisphere in which the signal-to-noise ratio values are higher than in other portions of the scattering hemisphere based on the three-dimensional map. In addition, the method includes determining a configuration for a detection subsystem of the inspection system based on the one or more portions of the scattering hemisphere.

摘要翻译： 提供了用于确定光散射检查系统的配置的计算机实现的方法和系统。 一种计算机实现的方法包括：通过在检查系统的散射半球上的光散射检查系统来确定用于样本获取的数据和样本上的潜在缺陷的信噪比值的三维图 。 该方法还包括基于三维图确定散射半球的一个或多个部分，其中信噪比值高于散射半球的其它部分。 此外，该方法包括基于散射半球的一个或多个部分来确定检查系统的检测子系统的配置。

公开(公告)号：US07304310B1

公开(公告)日：2007-12-04

申请号：US10719347

申请日：2003-11-21

申请人： David Shortt ,  Christian Wolters

发明人： David Shortt ,  Christian Wolters

IPC分类号： G01J3/00

CPC分类号： G01N21/956 ,  G01N21/8806 ,  G01N21/94 ,  G01N2021/8854 ,  G01N2021/95676 ,  G03F7/7085 ,  G03F7/70916

摘要： Methods and systems for inspecting a specimen are provided. One method includes directing ultraviolet light to a specimen. The method also includes detecting light scattered from the specimen having a selected wavelength range. In addition, the method includes detecting features, defects, or light scattering properties of the specimen using signals representative of the detected light. One inspection system includes an illumination subsystem configured to direct ultraviolet light to a specimen. The system also includes a channel configured to detect light scattered from the specimen having a selected wavelength range. In addition, the system includes a processor configured to detect features, defects, or light scattering properties of the specimen using signals that are representative of the detected light.

摘要翻译： 提供了检查样本的方法和系统。 一种方法包括将紫外光引导到样品。 该方法还包括检测从具有选定波长范围的样本散射的光。 此外，该方法包括使用表示检测到的光的信号检测样本的特征，缺陷或光散射性质。 一个检查系统包括被配置为将紫外光引导到样本的照明子系统。 该系统还包括被配置为检测从具有选定波长范围的样本散射的光的通道。 另外，该系统包括处理器，其被配置为使用代表所检测到的光的信号来检测样本的特征，缺陷或光散射特性。

公开(公告)号：US20070132987A1

公开(公告)日：2007-06-14

申请号：US11302936

申请日：2005-12-14

申请人： Kurt Haller ,  David Shortt ,  Christian Wolters

发明人： Kurt Haller ,  David Shortt ,  Christian Wolters

IPC分类号： G01N21/88

CPC分类号： G01N21/9501

摘要： Systems and methods for inspecting a wafer with increased sensitivity are provided. One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer. The system also includes a gas flow subsystem configured to replace a gas located proximate to the spot on the wafer with a medium that scatters less of the light than the gas thereby increasing the sensitivity of the system. In addition, the system includes a processor configured to detect defects on the wafer using the output signals.

摘要翻译： 提供了用于检查具有增加的灵敏度的晶片的系统和方法。 一个系统包括检查子系统，该检查子系统被配置为将光引导到晶片上的一个点上，并产生响应于从晶片上的点散射的光的输出信号。 该系统还包括气流子系统，该气流子系统被配置成用与气体相比散射的光更少的介质来替代位于晶片上的点附近的气体，从而增加了系统的灵敏度。 另外，该系统包括配置成使用输出信号来检测晶片上的缺陷的处理器。

公开(公告)号：US08582094B1

公开(公告)日：2013-11-12

申请号：US11110383

申请日：2005-04-20

申请人： David Shortt ,  Stephen Biellak ,  Christian Wolters

发明人： David Shortt ,  Stephen Biellak ,  Christian Wolters

IPC分类号： G01N21/00 ,  G01J4/00

CPC分类号： G01N21/9501

摘要： Systems and methods for inspecting a specimen are provided. One system includes an illumination subsystem configured to direct light to the specimen at an oblique angle of incidence. The light is polarized in a plane that is substantially parallel to the plane of incidence. The system also includes a detection subsystem configured to detect light scattered from the specimen. The detected light is polarized in a plane that is substantially parallel to the plane of scattering. In addition, the system includes a processor configured to detect defects on the specimen using signals generated by the detection subsystem. In one embodiment, such a system may be configured to detect defects having a size that is less than half of a wavelength of the light directed to the specimen.

摘要翻译： 提供了检查样本的系统和方法。 一个系统包括被配置为以倾斜入射角将光引导到样本的照明子系统。 光在基本上平行于入射平面的平面中极化。 该系统还包括检测子系统，其被配置为检测从样本散射的光。 检测到的光在基本上平行于散射平面的平面中极化。 另外，该系统包括配置成使用由检测子系统产生的信号来检测样本上的缺陷的处理器。 在一个实施例中，这样的系统可以被配置为检测具有小于指向样本的光的波长的一半的尺寸的缺陷。

公开(公告)号：US07489393B2

公开(公告)日：2009-02-10

申请号：US11071072

申请日：2005-03-02

申请人： Stephen Biellak ,  David Shortt

发明人： Stephen Biellak ,  David Shortt

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/474 ,  G01N21/8806

摘要： A system and method for inspection is disclosed. The design includes focusing illumination beams of radiation at an optical axis to an array of illuminated elongated spots on the surface at oblique angle(s) of incidence to the surface, performing a linear scan along a linear axis, wherein the linear axis is offset from the optical axis by a not insubstantial angular quantity, and imaging scattered radiation from the spots onto an array of receivers so that each receiver in the array receives scattered radiation from a corresponding spot in the array of spots.

摘要翻译： 公开了一种用于检查的系统和方法。 该设计包括将光轴上的照射光束照射到表面上的照射细长光斑阵列的倾斜角度，沿着线性轴进行线性扫描，其中线性轴线偏离 通过非实质角度量的光轴，并且将来自斑点的散射辐射成像到接收器阵列上，使得阵列中的每个接收器接收来自点阵列中的对应点的散射辐射。

公开(公告)号：US20070229809A1

公开(公告)日：2007-10-04

申请号：US11278624

申请日：2006-04-04

申请人： Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike Kirk ,  David Shortt ,  Brian Haas ,  Kurt Haller

发明人： Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike Kirk ,  David Shortt ,  Brian Haas ,  Kurt Haller

IPC分类号： G01N21/88

CPC分类号： G01N21/9501

摘要： Computer-implemented methods and systems for determining a configuration for a light scattering inspection system are provided. One computer-implemented method includes determining a three-dimensional map of signal-to-noise ratio values for data that would be acquired for a specimen and a potential defect on the specimen by the light scattering inspection system across a scattering hemisphere of the inspection system. The method also includes determining one or more portions of the scattering hemisphere in which the signal-to-noise ratio values are higher than in other portions of the scattering hemisphere based on the three-dimensional map. In addition, the method includes determining a configuration for a detection subsystem of the inspection system based on the one or more portions of the scattering hemisphere.

摘要翻译： 提供了用于确定光散射检查系统的配置的计算机实现的方法和系统。 一种计算机实现的方法包括：通过在检查系统的散射半球上的光散射检查系统来确定用于样本获取的数据和样本上的潜在缺陷的信噪比值的三维图 。 该方法还包括基于三维图确定散射半球的一个或多个部分，其中信噪比值高于散射半球的其它部分。 此外，该方法包括基于散射半球的一个或多个部分来确定检查系统的检测子系统的配置。

公开(公告)号：US08060962B2

公开(公告)日：2011-11-22

申请号：US12554907

申请日：2009-09-05

申请人： David Shortt

发明人： David Shortt

IPC分类号： B25D1/00 ,  B44D3/16

CPC分类号： B25F1/006 ,  E04F21/161

摘要： A taping tool apparatus having an elongated hammer portion that has a central axis and a striker portion, the striker portion having a striking plane perpendicular to the hammer portion central axis; a blade affixed to the hammer portion so that no part of the blade crosses the striker portion striking plane; and a handle affixed to the elongated hammer portion perpendicular to the central axis, whereby a user applying mud to fill indents in drywall with the taping tool can rotate the apparatus a quarter turn to hammer down any raised nails encountered without the blade striking the drywall.

摘要翻译： 一种具有中心轴和撞针部的细长锤部分的攻丝工具装置，所述撞针部具有垂直于所述锤部中心轴线的冲击平面; 固定到锤部分上的刀片，使得刀片的任何部分都不穿过撞针部分打击平面; 以及固定到垂直于中心轴线的细长锤部分的手柄，由此使用泥浆以用胶带工具填充干墙中的凹痕的使用者可以使装置旋转四分之一圈，以锤击在没有叶片撞击干墙的情况下遇到的任何凸起的指甲。