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    Method of manufacturing array substrate for liquid crystal display device
    1.
    发明授权
    Method of manufacturing array substrate for liquid crystal display device 有权
    制造液晶显示装置用阵列基板的方法

    公开(公告)号：US07525630B2

    公开(公告)日：2009-04-28

    申请号：US11256004

    申请日：2005-10-24

    申请人： Kyoung-Mook Lee ,  Nack-Bong Choi ,  Seung-Hee Nam ,  Jae-Young Oh

    发明人： Kyoung-Mook Lee ,  Nack-Bong Choi ,  Seung-Hee Nam ,  Jae-Young Oh

    IPC分类号： G02F1/1345 ,  G02F1/1343 ,  H01L29/04 ,  G09G3/36

    CPC分类号： G02F1/13458 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/136231 ,  G02F2001/136295 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/66765

    摘要： A method for manufacturing an array substrate for a display device, includes forming a gate electrode, a gate line, and a gate pad on a substrate, disposing a first metal mask on the gate pad, forming a gate insulating layer, an amorphous silicon layer, a doped silicon layer, and a metal layer on the substrate, removing the first metal mask, patterning the metal layer, the doped silicon layer, and the amorphous silicon layer to form source and drain electrodes, a data line, a data pad, an ohmic contact layer, and an active layer, forming a pixel electrode, forming a gate pad terminal and a data pad terminal covering the gate pad and the data pad, respectively, disposing second and third metal masks on the gate pad and data pad terminals, respectively, forming a passivation layer on the substrate, and removing the second and the third masks.

    摘要翻译： 一种制造用于显示装置的阵列基板的方法，包括在基板上形成栅极电极，栅极线和栅极焊盘，在栅极焊盘上设置第一金属掩模，形成栅极绝缘层，非晶硅层 ，掺杂硅层和金属层，去除第一金属掩模，图案化金属层，掺杂硅层和非晶硅层以形成源极和漏极，数据线，数据焊盘， 欧姆接触层和有源层，形成像素电极，分别形成覆盖栅极焊盘和数据焊盘的栅极焊盘端子和数据焊盘端子，在栅极焊盘和数据焊盘端子上设置第二和第三金属掩模 分别在衬底上形成钝化层，并去除第二和第三掩模。

    Method of manufacturing array substrate for liquid crystal display device with gate pad terminal acting as etching mask
    3.
    发明授权
    Method of manufacturing array substrate for liquid crystal display device with gate pad terminal acting as etching mask 有权
    制造具有作为蚀刻掩模的栅极焊盘端子的液晶显示装置的阵列基板的方法

    公开(公告)号：US07760318B2

    公开(公告)日：2010-07-20

    申请号：US11255869

    申请日：2005-10-24

    申请人： Kyoung-Mook Lee ,  Nack-Bong Choi ,  Seung-Hee Nam ,  Jae-Young Oh

    发明人： Kyoung-Mook Lee ,  Nack-Bong Choi ,  Seung-Hee Nam ,  Jae-Young Oh

    IPC分类号： G02F1/1345 ,  G09G3/36

    CPC分类号： G02F1/13458 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/136231 ,  G02F2001/136295 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/66765

    摘要： A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate electrode, a gate line, and a gate pad on a substrate, forming a gate insulating layer on the gate electrode, the gate line, and the gate pad, forming an active layer on the gate insulating layer, forming an ohmic contact layer on the active layer, forming source and drain electrodes, a data line and a data pad on the ohmic contact layer, forming a pixel electrode, forming a gate pad terminal on the gate insulating layer, forming a data pad terminal covering the data pad, forming a passivation layer on the pixel electrode, the gate pad terminal and the data pad terminal, exposing the gate pad terminal and the gate pad by etching the passivation layer and the gate insulating layer, and exposing the data pad terminal by etching the passivation layer.

    摘要翻译： 制造液晶显示装置用阵列基板的方法包括在基板上形成栅电极，栅极线，栅极焊盘，在栅电极，栅极线和栅极焊盘上形成栅极绝缘层， 在栅极绝缘层上形成有源层，在有源层上形成欧姆接触层，在欧姆接触层上形成源极和漏极，数据线和数据焊盘，形成像素电极，形成栅极焊盘端子 栅极绝缘层，形成覆盖数据焊盘的数据焊盘端子，在像素电极上形成钝化层，栅极焊盘端子和数据焊盘端子，通过蚀刻钝化层暴露栅极焊盘端子和栅极焊盘， 栅极绝缘层，并且通过蚀刻钝化层来暴露数据焊盘端子。

    Method of manufacturing array substrate for liquid crystal display device
    5.
    发明申请
    Method of manufacturing array substrate for liquid crystal display device 有权
    制造液晶显示装置用阵列基板的方法

    公开(公告)号：US20060038956A1

    公开(公告)日：2006-02-23

    申请号：US11255869

    申请日：2005-10-24

    申请人： Kyoung-Mook Lee ,  Nack-Bong Choi ,  Seung-Hee Nam ,  Jae-Young Oh

    发明人： Kyoung-Mook Lee ,  Nack-Bong Choi ,  Seung-Hee Nam ,  Jae-Young Oh

    IPC分类号： G02F1/13

    CPC分类号： G02F1/13458 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/136231 ,  G02F2001/136295 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/66765

    摘要： A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate electrode, a gate line, and a gate pad on a substrate, forming a gate insulating layer on the gate electrode, the gate line, and the gate pad, forming an active layer on the gate insulating layer, forming an ohmic contact layer on the active layer, forming source and drain electrodes, a data line and a data pad on the ohmic contact layer, forming a pixel electrode, forming a gate pad terminal on the gate insulating layer, forming a data pad terminal covering the data pad, forming a passivation layer on the pixel electrode, the gate pad terminal and the data pad terminal, exposing the gate pad terminal and the gate pad by etching the passivation layer and the gate insulating layer, and exposing the data pad terminal by etching the passivation layer.

    摘要翻译： 制造液晶显示装置用阵列基板的方法包括在基板上形成栅电极，栅极线，栅极焊盘，在栅电极，栅极线和栅极焊盘上形成栅极绝缘层， 在栅极绝缘层上形成有源层，在有源层上形成欧姆接触层，在欧姆接触层上形成源极和漏极，数据线和数据焊盘，形成像素电极，形成栅极焊盘端子 栅极绝缘层，形成覆盖数据焊盘的数据焊盘端子，在像素电极上形成钝化层，栅极焊盘端子和数据焊盘端子，通过蚀刻钝化层暴露栅极焊盘端子和栅极焊盘， 栅极绝缘层，并且通过蚀刻钝化层来暴露数据焊盘端子。

    Method of manufacturing array substrate for liquid crystal display device
    6.
    发明授权
    Method of manufacturing array substrate for liquid crystal display device 有权
    制造液晶显示装置用阵列基板的方法

    公开(公告)号：US07215399B2

    公开(公告)日：2007-05-08

    申请号：US11256003

    申请日：2005-10-24

    申请人： Kyoung-Mook Lee ,  Nack-Bong Choi ,  Seung-Hee Nam ,  Jae-Young Oh

    发明人： Kyoung-Mook Lee ,  Nack-Bong Choi ,  Seung-Hee Nam ,  Jae-Young Oh

    IPC分类号： G02F1/1343 ,  G02F1/136 ,  G09G3/34 ,  H01L31/036

    CPC分类号： G02F1/13458 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/136231 ,  G02F2001/136295 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/66765

    摘要： A method of manufacturing an array substrate for a liquid crystal display device which includes forming a gate electrode, a gate line, and a gate pad on a substrate by sequentially depositing a metal layer and a transparent conductive layer and patterning, forming a gate insulating layer on the gate electrode, the gate line, and the gate pad, forming an active layer on the gate insulating layer over the gate electrode, forming an ohmic contact layer on the active layer, forming source and drain electrodes, a data line and a data pad on the ohmic contact layer, forming a pixel electrode, forming a data pad terminal covering the data pad, forming a passivation layer on the pixel electrode and the data pad terminal, exposing the gate pad by etching the passivation layer and the gate insulating layer, and exposing the data pad terminal by etching the passivation layer.

    摘要翻译： 一种液晶显示装置用阵列基板的制造方法，其特征在于，通过依次层叠金属层和透明导电层，在基板上形成栅电极，栅极线和栅极焊盘，并形成栅极绝缘层 在栅极电极，栅极线和栅极焊盘上，在栅电极上的栅极绝缘层上形成有源层，在有源层上形成欧姆接触层，形成源极和漏极，数据线和数据 形成像素电极，形成覆盖数据焊盘的数据焊盘端子，在像素电极和数据焊盘端子上形成钝化层，通过蚀刻钝化层和栅极绝缘层露出栅极焊盘 并且通过蚀刻钝化层来曝光数据焊盘端子。

    Method of manufacturing array substrate for liquid crystal display device
    7.
    发明申请
    Method of manufacturing array substrate for liquid crystal display device 有权
    制造液晶显示装置用阵列基板的方法

    公开(公告)号：US20060038957A1

    公开(公告)日：2006-02-23

    申请号：US11256003

    申请日：2005-10-24

    申请人： Kyoung-Mook Lee ,  Nack-Bong Choi ,  Seung-Hee Nam ,  Jae-Young Oh

    发明人： Kyoung-Mook Lee ,  Nack-Bong Choi ,  Seung-Hee Nam ,  Jae-Young Oh

    IPC分类号： G02F1/13

    CPC分类号： G02F1/13458 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/136231 ,  G02F2001/136295 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/66765

    摘要： A method of manufacturing an array substrate for a liquid crystal display device which includes forming a gate electrode, a gate line, and a gate pad on a substrate by sequentially depositing a metal layer and a transparent conductive layer and patterning, forming a gate insulating layer on the gate electrode, the gate line, and the gate pad, forming an active layer on the gate insulating layer over the gate electrode, forming an ohmic contact layer on the active layer, forming source and drain electrodes, a data line and a data pad on the ohmic contact layer, forming a pixel electrode, forming a data pad terminal covering the data pad, forming a passivation layer on the pixel electrode and the data pad terminal, exposing the gate pad by etching the passivation layer and the gate insulating layer, and exposing the data pad terminal by etching the passivation layer.

    摘要翻译： 一种液晶显示装置用阵列基板的制造方法，其特征在于，通过依次层叠金属层和透明导电层，在基板上形成栅电极，栅极线和栅极焊盘，并形成栅极绝缘层 在栅极电极，栅极线和栅极焊盘上，在栅电极上的栅极绝缘层上形成有源层，在有源层上形成欧姆接触层，形成源极和漏极，数据线和数据 形成像素电极，形成覆盖数据焊盘的数据焊盘端子，在像素电极和数据焊盘端子上形成钝化层，通过蚀刻钝化层和栅极绝缘层露出栅极焊盘 并且通过蚀刻钝化层来曝光数据焊盘端子。