公开(公告)号：US20240210163A1

公开(公告)日：2024-06-27

申请号：US17913902

申请日：2021-03-24

申请人： LAM RESEARCH CORPORATION

发明人： Goon Heng WONG ,  Xuefeng HUA ,  Anthony Paul VAN SELOW ,  Daniel TORRES ,  Jack CHEN

IPC分类号： G01B11/06 ,  C23C14/54 ,  C23C16/52 ,  G01B11/14

CPC分类号： G01B11/0683 ,  C23C14/547 ,  C23C16/52 ,  G01B11/0625 ,  G01B11/14

摘要： A system for determining a thickness of a substrate arranged in a processing chamber includes an emitter configured to transmit a signal toward a gap between the substrate and a component of the processing chamber arranged above the substrate, a receiver configured to receive at least a portion of the transmitted signal and generate a measurement signal based on a characteristic of the received portion of the signal, and a system controller configured to receive the measurement signal and selectively adjust a parameter of the processing chamber based on a relationship between values of the measurement signal and at least one of the thickness of the substrate, a width of the gap between the substrate and the component of the processing chamber, and an amount to adjust the parameter of the processing chamber.

公开(公告)号：US20230352278A1

公开(公告)日：2023-11-02

申请号：US17913935

申请日：2021-03-26

申请人： LAM RESEARCH CORPORATION

发明人： Xuefeng HUA ,  Jack CHEN ,  Gnanamani AMBUROSE ,  Dan ZHANG ,  Chang-Wei HUANG ,  Chia-Shin LIN

IPC分类号： H01J37/32

CPC分类号： H01J37/32642 ,  H01J2237/3321 ,  H01J2237/3341

摘要： A plasma-exclusion-zone ring for a substrate processing system that is configured to process a substrate includes a ring-shaped body, an upper portion of the ring-shaped body, a base and a plasma-exclusion-zone ring notch. The upper portion of the ring-shaped body defines a radially inner surface and a top surface. The base of the ring-shaped body defines a radially outer surface, a first bottom surface extending radially inward from the radially outer surface, and a second bottom surface extending radially inward from the first bottom surface. The plasma-exclusion-zone ring notch is proportional to an alignment notch of the substrate. The first bottom surface is tapered and extends at an acute angle from the second bottom surface to the radially outer surface. The first bottom surface is configured to extend over and oppose a periphery of the substrate.