Electrode slurry coating apparatus and method

    公开(公告)号:US11050046B2

    公开(公告)日:2021-06-29

    申请号:US16615021

    申请日:2018-12-14

    申请人: LG Chem, Ltd.

    IPC分类号: H01M4/04

    摘要: The present invention relates to an electrode slurry coating apparatus comprising a lower die applying electrode slurry on a collector, an intermediate die, an upper die, a first discharge part primarily applying the electrode slurry on the collector to form a first coating layer; an intermediate pressing part pressing the first coating layer to adjust a thickness of the first coating layer; a second discharge part secondarily applying the electrode slurry on a surface of the first coating layer to form a second coating layer; and an upper pressing part pressing the first coating layer and the second coating layer, which are stacked, at the same time to adjust a thickness of each of the first coating layer and the second coating layer, wherein the first discharge part has a width less than that of the second discharge part.

    Method of manufacturing irregular electrode

    公开(公告)号:US11283057B2

    公开(公告)日:2022-03-22

    申请号:US16604334

    申请日:2018-11-09

    申请人: LG CHEM, LTD.

    摘要: A method of manufacturing an irregular electrode includes forming a first electrode line by continuously coating a first electrode slurry on a metal sheet, forming at least one second electrode line formed with a dotted line shape including uncoated portions positioned in parallel to the first electrode line by intermittently coating a second electrode slurry on the metal sheet that does not overlap the first electrode line, and forming the irregular electrode by notching the metal sheet with an irregular shape including the second electrode line and the first electrode line except for the uncoated portions of the at least one second electrode line.

    Method for monitoring dry state of electrode substrate

    公开(公告)号:US11448597B2

    公开(公告)日:2022-09-20

    申请号:US16652290

    申请日:2018-12-17

    申请人: LG Chem, Ltd.

    摘要: The present invention relates to an apparatus and method for monitoring a dry state of an electrode substrate in which electrode slurry is applied to a collector. The monitoring method comprises emitting light onto a surface of the electrode substrate; receiving the light reflected by the surface of the electrode substrate; and analyzing a luminous intensity or spectrum of the received light to estimate a drying rate of the electrode substrate.
    The apparatus includes a light emitting part emitting light from a light source onto a surface of the electrode substrate; a light receiving part receiving the light reflected by the surface of the electrode substrate; and a computing device analyzing a luminous intensity or spectrum of the received light and comparing analyzed characteristics of the light with the reference data of the reflected light to the drying rate of the electrode substrate.

    Electrode Slurry Coating Apparatus and Method

    公开(公告)号:US20200185696A1

    公开(公告)日:2020-06-11

    申请号:US16615021

    申请日:2018-12-14

    申请人: LG Chem, Ltd.

    IPC分类号: H01M4/04

    摘要: The present invention relates to an electrode slurry coating apparatus comprising a lower die applying electrode slurry on a collector, an intermediate die, and an upper die, a first discharge part primarily applying the electrode slurry on the collector to form a first coating layer; an intermediate pressing part pressing the first coating layer to adjust a thickness of the first coating layer; a second discharge part secondarily applying the electrode slurry on a surface of the first coating layer to form a second coating layer; and an upper pressing part pressing the first coating layer and the second coating layer, which are stacked, at the same time to to adjust a thickness of each of the first coating layer and the second coating layer, wherein the first discharge part has a width less than that of the second discharge part.