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公开(公告)号:US20210245483A1
公开(公告)日:2021-08-12
申请号:US16973339
申请日:2019-10-25
Applicant: LG CHEM, LTD.
Inventor: Eun Seon LEE , Ha Neul KIM , Seungil BAEK , Woo Han KIM
Abstract: The present disclosure relates to a hard coating laminate having an internal bending property and an external bending property including: a supporting substrate layer containing a thermoplastic resin; and a hard coating layer having a thickness of 50 to 240 μm, wherein the hard coating layer includes a cured product of a resin composition including a siloxane resin having a predetermined glycidoxypropyl modified silicone structure and an elastomeric polymer.
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公开(公告)号:US20240083865A1
公开(公告)日:2024-03-14
申请号:US18265754
申请日:2022-01-28
Applicant: LG CHEM, LTD.
Inventor: Changyoung JUNG , Sunmin KIM , Woochul LEE , Kyung Seok JEONG , Woo Han KIM , Changmin KIM
IPC: C07D307/91 , C07B59/00 , C07C15/28 , C07D209/86 , C07D307/77 , C07D493/04 , H10K85/60
CPC classification number: C07D307/91 , C07B59/001 , C07B59/002 , C07C15/28 , C07D209/86 , C07D307/77 , C07D493/04 , H10K85/626 , H10K85/6572 , H10K85/6574 , H10K50/11
Abstract: Provided is a method for preparing a deuterated anthracene compound, the method including synthesizing a deuterated anthracene compound by reacting a halogenated benzene having at least one deuterium with an enolate. Also provided is a reaction composition; a deuterated anthracene compound; and a composition containing the deuterated anthracene compound.
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公开(公告)号:US20210115210A1
公开(公告)日:2021-04-22
申请号:US17041121
申请日:2019-04-29
Applicant: LG CHEM, LTD.
Inventor: Seungil BAEK , Eun Seon LEE , Ha Neul KIM , Woo Han KIM
Abstract: Provided is a hard coating film exhibiting improved flexibility and curling properties together with excellent hardness property, the hard coating film including a top coating layer and a bottom coating layer each disposed on the top surface and the bottom surface of a support substrate layer, wherein the top coating layer includes a cured product of a first resin composition containing epoxy polysiloxane of the following Chemical Formula 1, and the bottom coating layer includes a cured product of a second resin composition containing epoxy polysiloxane of the following Chemical Formula 1 and an elastomer at a weight ratio of 95:5 to 60:40: (R1SiO3/2)a(R2SiO3/2)b(OR)c [Chemical Formula 1] wherein in Chemical Formula 1, R1, R2, R, a, b, and c are the same as defined in the specification.
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公开(公告)号:US20240002312A1
公开(公告)日:2024-01-04
申请号:US18039774
申请日:2022-01-21
Applicant: LG CHEM, LTD.
Inventor: Sunmin KIM , Kyung Seok JEONG , Woo Han KIM , Changyoung JUNG
IPC: C07B59/00 , C07C15/28 , C07C1/00 , C07D307/91 , C07D209/86 , C07C17/06 , C07C25/22 , C07D307/77 , C07D493/04
CPC classification number: C07B59/002 , C07B59/001 , C07C15/28 , C07C1/00 , C07D307/91 , C07D209/86 , C07C17/06 , C07C25/22 , C07D307/77 , C07D493/04 , C07B2200/05 , C07C2603/24
Abstract: Provided is a method for preparing a deuterated anthracene compound, the method including synthesizing a deuterated anthracene compound by reacting a halogenated benzene having at least one deuterium with a compound of Chemical Formula 1:
wherein Ar1 is deuterium, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group; and Ar2 is hydrogen, deuterium, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group. Also provided are a reaction composition, a deuterated anthracene compound, and a composition containing the deuterated anthracene compound.-
公开(公告)号:US20210246265A1
公开(公告)日:2021-08-12
申请号:US17053260
申请日:2020-01-09
Applicant: LG CHEM, LTD.
Inventor: Tae Seob LEE , Yoon Bin LIM , Jae Gu LIM , Seung Joon LIM , Se Jeong KIM , Woo Han KIM , Gieun PARK
Abstract: The present disclosure relates to a poly(amide-imide) copolymer in which at least one of an imide repeating unit and an amide repeating unit is substituted with a specific functional group, and a composition and a polymer film comprising the same.
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公开(公告)号:US20210072427A1
公开(公告)日:2021-03-11
申请号:US17101967
申请日:2020-11-23
Applicant: LG CHEM, LTD.
Inventor: Ha Neul KIM , Eun Seon LEE , Seungil BAEK , Se Jeong KIM , Woo Han KIM , Yeongkyu CHOI
IPC: G02B1/14 , C09D5/00 , C09D183/06 , C09D127/18 , C09D133/06 , G02B1/18 , G02B5/30
Abstract: The present disclosure provides an optical laminate which exhibits improved adhesive strength and scratch resistance together with excellent hardness and fingerprint resistance properties, by further including a fingerprint-resistant layer including an organosilane having excellent adhesion strength with the hard coating layer and an anti-fouling function on the hard coating layer including the transparent support substrate layer and the hard coating layer.
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公开(公告)号:US20240208991A1
公开(公告)日:2024-06-27
申请号:US18278828
申请日:2022-08-04
Applicant: LG CHEM, LTD.
Inventor: Minjun KIM , Young Seok KIM , Dong Hoon LEE , Sang Duk SUH , Woo Han KIM
IPC: C07D498/04 , C07D513/04 , C07D519/00 , H10K50/11 , H10K85/60
CPC classification number: C07D498/04 , C07D513/04 , C07D519/00 , H10K50/11 , H10K85/656 , H10K85/6572
Abstract: Provided is a novel compound of Chemical Formula 1 or Chemical Formula 2:
wherein X1 and X2 are each independently O or S; each R1 is independently hydrogen, deuterium, a substituted or unsubstituted C6-60 aryl or C2-60 heteroaryl containing any one or more of N, O, and S; L is a direct bond or a substituted or unsubstituted C6-60 arylene or C2-60 heteroarylene containing any one or more of N, O, and S; and Z is the following Chemical Formula 3 or Chemical Formula 4:
wherein each A is independently a substituted or unsubstituted C6-60 aromatic ring or C2-60 heteroaromatic ring containing any one or more of N, O, and S fused with an adjacent five-membered ring; and the other substituents are as defined in the specification; and an organic light emitting device including the same.-
公开(公告)号:US20220220308A1
公开(公告)日:2022-07-14
申请号:US17432886
申请日:2020-04-09
Applicant: LG CHEM, LTD.
Inventor: Gieun PARK , Jae Gu LIM , Yoon Bin LIM , Tae Seob LEE , Seung Joon LIM , Se Jeong KIM , Woo Han KIM
Abstract: The polyamide-imide block copolymer according to the present invention makes it possible to provide a polyamide-imide film having excellent thermal stability and chemical resistance and, at the same time, having excellent mechanical properties.
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