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公开(公告)号：US20220220308A1
公开(公告)日：2022-07-14
申请号：US17432886
申请日：2020-04-09
Applicant: LG CHEM, LTD.
Inventor： Gieun PARK , Jae Gu LIM , Yoon Bin LIM , Tae Seob LEE , Seung Joon LIM , Se Jeong KIM , Woo Han KIM
Abstract: The polyamide-imide block copolymer according to the present invention makes it possible to provide a polyamide-imide film having excellent thermal stability and chemical resistance and, at the same time, having excellent mechanical properties.
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2.发明申请公开(公告)号：US20190146338A1
公开(公告)日：2019-05-16
申请号：US16091263
申请日：2018-03-16
Applicant: LG CHEM, LTD.
Inventor： Min Young LIM , Tae Seob LEE , Ji Hye KIM
Abstract: The present invention relates to a positive photoresist composition including an acrylic resin including a repeat unit of a specific structure, and a photosensitive acid-generating compound, a photoresist pattern using the same, and a method for manufacturing a pattern.
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公开(公告)号：US20240317914A1
公开(公告)日：2024-09-26
申请号：US18259705
申请日：2021-12-31
Applicant: LG CHEM, LTD.
Inventor： Tae Seob LEE , Yoon Bin LIM , Ha Neul KIM , Jeong Gon KIM , Kwan JEGAL , I Seul LIM
IPC: C08F220/18 , H10K50/844 , H10K71/10
CPC classification number: C08F220/1811 , H10K50/844 , H10K71/10
Abstract: The encapsulating composition according to the present invention comprises a radical-curable compound having at least one or more radical-curable functional groups, and has composition polarizability of 1.8 or less, wherein the composition polarizability is the sum of values obtained by multiplying each “compound polarizability of radical-curable compounds” constituting the encapsulating composition and “the weight ratio of the relevant radical-curable compound to the encapsulating composition” and the compound polarizability may be calculated by the following general equation 1.
Compound polarizability=(the value obtained by combining the number of carbons and the number of oxygens included in the molecular structure of the relevant radical-curable compound)/(the value obtained by subtracting the number of oxygens from the number of carbons in the molecular structure of the relevant radical-curable compound) [General Equation 1]-
公开(公告)号：US20210011379A1
公开(公告)日：2021-01-14
申请号：US16498829
申请日：2018-07-25
Applicant: LG CHEM, LTD.
Inventor： Min Young LIM , Tae Seob LEE , Ji Hye KIM
Abstract: The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.
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Patent Agency Ranking
5.发明申请公开(公告)号：US20200033725A1
公开(公告)日：2020-01-30
申请号：US16489560
申请日：2018-08-24
Applicant: LG CHEM, LTD.
Inventor： Min Young LIM , Tae Seob LEE , Hyun Min PARK
IPC: G03F7/004 , C07D221/14 , G03F7/039
Abstract: The present invention relates to a photoacid generator, and a chemically amplified photoresist composition for a thick film including the same, wherein the photoacid generator has excellent solubility and sensitivity, and also has an anti-corrosion effect, in addition to the effect as a photoacid generator. Thus, a chemically amplified photoresist composition for a thick film including the photoacid generator reduces scum and/or footing at the exposed part after development. The photoacid generator represented by the following Chemical Formula 1: In Chemical Formula 1, the definition of each substituents is the same as the detail description of the specification.
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公开(公告)号：US20180226590A1
公开(公告)日：2018-08-09
申请号：US15750983
申请日：2016-10-27
Applicant: LG CHEM, LTD.
Inventor： Ji Hye KIM , Sung-Ho CHUN , Jung Ha PARK , Chan Yeup CHUNG , Tae Seob LEE
CPC classification number: H01L51/0077 , C07F7/24 , H01L51/0007 , H01L51/0026 , H01L51/005 , H01L51/0056 , H01L51/006 , H01L51/422 , H01L51/4226 , H01L2031/0344 , Y02E10/549
Abstract: The present invention relates to a method for preparing a perovskite compound usable as a light absorber of a solar cell, and provides a method for preparing a light absorber of a solar cell in which the crystallinity of a perovskite compound is increased, resulting in an increase in the stability and efficiency of the solar cell.
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公开(公告)号：US20210246265A1
公开(公告)日：2021-08-12
申请号：US17053260
申请日：2020-01-09
Applicant: LG CHEM, LTD.
Inventor： Tae Seob LEE , Yoon Bin LIM , Jae Gu LIM , Seung Joon LIM , Se Jeong KIM , Woo Han KIM , Gieun PARK
Abstract: The present disclosure relates to a poly(amide-imide) copolymer in which at least one of an imide repeating unit and an amide repeating unit is substituted with a specific functional group, and a composition and a polymer film comprising the same.
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公开(公告)号：US20200218153A1
公开(公告)日：2020-07-09
申请号：US16631765
申请日：2018-07-24
Applicant: LG CHEM, LTD.
Inventor： Hyun Min PARK , Minyoung LIM , Tae Seob LEE
Abstract: The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin including a (meth)acrylate-based resin containing a (meth)acrylate-based repeating unit in which a heterocyclic compound is substituted via a divalent functional group containing an alkylene sulfide having 1 to 20 carbon atoms.
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9.发明申请公开(公告)号：US20200033724A1
公开(公告)日：2020-01-30
申请号：US16337280
申请日：2018-04-03
Applicant: LG CHEM, LTD.
Inventor： Min Young LIM , Tae Seob LEE , Ji Hye KIM
IPC: G03F7/004 , G03F7/039 , C07D221/14
Abstract: A non-ionic photoacid generator and a chemically amplified positive-type photoresist composition for a thick film including the non-ionic photoacid generator. The non-ionic photoacid generator may not only exhibit high solubility in a solvent of the photoresist composition, but may also exhibit chemical and thermal stability and high sensitivity. In particular, the non-ionic photoacid generator is decomposed by light to generate an acid, and at the same time, can exhibit a corrosion preventing effect on a metal substrate.
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