THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    1.
    发明申请
    THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 有权
    薄膜晶体管阵列基板及其制造方法

    公开(公告)号:US20140353661A1

    公开(公告)日:2014-12-04

    申请号:US14109339

    申请日:2013-12-17

    Abstract: A thin film transistor (TFT) array substrate is disclosed. The TFT array substrate includes a gate line, a first gate electrode branched from the gate line, a gate insulating film formed over the substrate, an active layer formed on the gate insulating film, a data line formed to comprise a plurality of metal layers including a first metal layer and a second metal layer formed of copper (Cu), a source electrode formed on the gate insulating film to comprise the remaining metal layer excluding the second metal layer among the plurality of the metal layers, and a drain electrode formed on the gate insulating film to comprise the remaining metal layer excluding the second metal layer among the plurality of the metal layers.

    Abstract translation: 公开了薄膜晶体管(TFT)阵列基板。 TFT阵列基板包括栅极线,从栅极线分支的第一栅极电极,在基板上形成的栅极绝缘膜,形成在栅极绝缘膜上的有源层,形成为包括多个金属层的数据线,包括 由铜(Cu)形成的第一金属层和第二金属层,形成在所述栅极绝缘膜上以在所述多个金属层中包括除了所述第二金属层之外的剩余金属层的源电极和形成在 所述栅极绝缘膜在所述多个金属层中包括除了所述第二金属层之外的剩余金属层。

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