公开(公告)号：US09040365B2

公开(公告)日：2015-05-26

申请号：US13622913

申请日：2012-09-19

Applicant: LG DISPLAY CO., LTD.

Inventor： JungSun Beak ,  Jeong Oh Kim ,  Jong Won Lee

IPC: H01L21/84 ,  H01L27/12 ,  H01L21/3213 ,  H01L29/66 ,  H01L29/786 ,  G02F1/1343 ,  G02F1/1362

CPC classification number: H01L27/1288 ,  G02F1/136227 ,  G02F1/136286 ,  G02F2001/134318 ,  G02F2001/134372 ,  H01L21/32139 ,  H01L27/124 ,  H01L29/66765 ,  H01L29/78669

Abstract: A method of fabricating a thin film transistor array substrate is disclosed. The method includes: sequentially forming a first passivation layer, a photo acryl layer and a first transparent metal layer on the substrate provided with the source/drain electrodes and so on; forming a common electrode, which is disposed in the pixel region, and first through third contact holes, which are positioned in regions of the drain electrode, the gate pad and the data pad, respectively, using one of a half-tone mask and a diffractive mask; forming a second passivation layer on the substrate provided with the first through third contact holes; exposing the drain electrode, the gate pad and the data pad by removing the first and second passivation layers from the drain electrode region, the gate pad region and data pad region; and forming a pixel electrode on the second passivation layer opposite to the common electrode by forming a second transparent metal layer on the substrate and performing a third mask procedure for the second transparent metal layer.

Abstract translation: 公开了制造薄膜晶体管阵列基板的方法。 该方法包括：在设置有源极/漏极等的基板上依次形成第一钝化层，光致丙烯酸层和第一透明金属层; 使用半色调掩模和半色调掩模中的一种分别形成设置在像素区域中的公共电极和第一至第三接触孔，其位于漏电极，栅极焊盘和数据焊盘的区域中 衍射面膜; 在设置有第一至第三接触孔的基板上形成第二钝化层; 通过从漏极区域，栅极焊盘区域和数据焊盘区域移除第一和第二钝化层来暴露漏电极，栅极焊盘和数据焊盘; 以及通过在所述衬底上形成第二透明金属层并对所述第二透明金属层执行第三掩模步骤，在所述第二钝化层上与所述公共电极相对形成像素电极。

公开(公告)号：US20130071973A1

公开(公告)日：2013-03-21

申请号：US13622913

申请日：2012-09-19

Applicant: LG Display Co., Ltd.

Inventor： JungSun Beak ,  Jeong Oh Kim ,  Jong Won Lee

IPC: H01L21/84

CPC classification number: H01L27/1288 ,  G02F1/136227 ,  G02F1/136286 ,  G02F2001/134318 ,  G02F2001/134372 ,  H01L21/32139 ,  H01L27/124 ,  H01L29/66765 ,  H01L29/78669

Abstract: A method of fabricating a thin film transistor array substrate is disclosed. The method includes: sequentially forming a first passivation layer, a photo acryl layer and a first transparent metal layer on the substrate provided with the source/drain electrodes and so on; forming a common electrode, which is disposed in the pixel region, and first through third contact holes, which are positioned in regions of the drain electrode, the gate pad and the data pad, respectively, using one of a half-tone mask and a diffractive mask; forming a second passivation layer on the substrate provided with the first through third contact holes; exposing the drain electrode, the gate pad and the data pad by removing the first and second passivation layers from the drain electrode region, the gate pad region and data pad region; and forming a pixel electrode on the second passivation layer opposite to the common electrode by forming a second transparent metal layer on the substrate and performing a third mask procedure for the second transparent metal layer.

Abstract translation: 公开了制造薄膜晶体管阵列基板的方法。 该方法包括：在设置有源极/漏极等的基板上依次形成第一钝化层，光致丙烯酸层和第一透明金属层; 使用半色调掩模和半色调掩模中的一种分别形成设置在像素区域中的公共电极和第一至第三接触孔，其位于漏电极，栅极焊盘和数据焊盘的区域中 衍射面膜; 在设置有第一至第三接触孔的基板上形成第二钝化层; 通过从漏极区域，栅极焊盘区域和数据焊盘区域移除第一和第二钝化层来暴露漏电极，栅极焊盘和数据焊盘; 以及通过在所述衬底上形成第二透明金属层并对所述第二透明金属层执行第三掩模步骤，在所述第二钝化层上与所述公共电极相对形成像素电极。