Thin film transistor substrate having metal oxide and method for manufacturing
    2.
    发明授权
    Thin film transistor substrate having metal oxide and method for manufacturing 有权
    具有金属氧化物的薄膜晶体管基板及其制造方法

    公开(公告)号:US08835919B2

    公开(公告)日:2014-09-16

    申请号:US13727269

    申请日:2012-12-26

    Inventor: Sanghee Yu

    CPC classification number: H01L29/66742 H01L27/1225 H01L27/1248 H01L29/786

    Abstract: A thin film transistor substrate and a method for manufacturing the same are disclosed. The thin film transistor substrate includes a gate electrode disposed on a substrate, a gate insulating film disposed on the gate electrode, an active layer disposed on the gate insulating film and including metal oxide, a source electrode contacted with one side of the active layer and a pixel electrode contacted with the other side of the active layer; and an etch stopper interposed between the source electrode and the pixel electrode.

    Abstract translation: 公开了一种薄膜晶体管基板及其制造方法。 薄膜晶体管基板包括设置在基板上的栅极电极,设置在栅电极上的栅极绝缘膜,设置在栅极绝缘膜上并包括金属氧化物的有源层,与活性层一侧接触的源电极和 与活性层的另一侧接触的像素电极; 以及插入在源极和像素电极之间的蚀刻阻挡层。

    THIN FILM TRANSISTOR SUBSTRATE HAVING METAL OXIDE AND METHOD FOR MANUFACTURING
    3.
    发明申请
    THIN FILM TRANSISTOR SUBSTRATE HAVING METAL OXIDE AND METHOD FOR MANUFACTURING 有权
    具有金属氧化物的薄膜晶体管基板和制造方法

    公开(公告)号:US20140008645A1

    公开(公告)日:2014-01-09

    申请号:US13727269

    申请日:2012-12-26

    Inventor: Sanghee Yu

    CPC classification number: H01L29/66742 H01L27/1225 H01L27/1248 H01L29/786

    Abstract: A thin film transistor substrate and a method for manufacturing the same are disclosed. The thin film transistor substrate includes a gate electrode disposed on a substrate, a gate insulating film disposed on the gate electrode, an active layer disposed on the gate insulating film and including metal oxide, a source electrode contacted with one side of the active layer and a pixel electrode contacted with the other side of the active layer; and an etch stopper interposed between the source electrode and the pixel electrode.

    Abstract translation: 公开了一种薄膜晶体管基板及其制造方法。 薄膜晶体管基板包括设置在基板上的栅极电极,设置在栅电极上的栅极绝缘膜,设置在栅极绝缘膜上并包括金属氧化物的有源层,与活性层一侧接触的源电极和 与活性层的另一侧接触的像素电极; 以及插入在源极和像素电极之间的蚀刻阻挡层。

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