公开(公告)号：US20150030829A1

公开(公告)日：2015-01-29

申请号：US14383500

申请日：2013-03-05

Applicant: LINTEC CORPORATION

Inventor： Suguru Kenmochi ,  Satoshi Naganawa ,  Koichi Nagamoto

IPC: B32B27/08 ,  C09J7/00 ,  B32B27/30 ,  B32B7/12 ,  B32B27/36

CPC classification number: B32B27/08 ,  B32B7/12 ,  B32B27/30 ,  B32B27/36 ,  B32B2255/10 ,  B32B2255/102 ,  B32B2255/26 ,  B32B2307/7242 ,  B32B2307/7246 ,  B32B2405/00 ,  B32B2457/00 ,  B32B2457/12 ,  B32B2457/20 ,  C08G18/6229 ,  C08G18/6254 ,  C08G2170/20 ,  C08J5/128 ,  C08J7/123 ,  C08J2383/08 ,  C08J2433/06 ,  C08L75/04 ,  C09J7/00 ,  C09J7/22 ,  C09J7/25 ,  C09J7/38 ,  C09J133/066 ,  C09J133/08 ,  C09J175/04 ,  C09J2201/622 ,  C09J2203/326 ,  C09J2433/00 ,  C09J2475/00 ,  C09J2483/006 ,  Y10T428/24942 ,  Y10T428/263 ,  Y10T428/2835 ,  Y10T428/31598 ,  Y10T428/31663 ,  C08F2220/1825 ,  C08F220/06 ,  C08F220/14 ,  C08F2220/1858 ,  C08F2220/185 ,  C08F220/20

Abstract: The present invention relates to a gas barrier film laminate comprising at least two gas barrier films, the gas barrier film laminate having a configuration in which two adjacent gas barrier films are stacked through a pressure-sensitive adhesive layer, and the pressure-sensitive adhesive layer having a shear load reduction ratio α (%) given by an expression (I) in claim 1, of 70% or less; and an adhesive film that is used to produce a gas barrier film laminate that includes at least two gas barrier films, and has a configuration in which two adjacent gas barrier films are stacked through a pressure-sensitive adhesive layer, the adhesive film comprising at least a gas barrier film and a pressure-sensitive adhesive layer that are stacked adjacent to each other, the pressure-sensitive adhesive layer having a shear load reduction ratio α (%) given by an expression (I) in claim 11, of 70% or less. Provided is a gas barrier film laminate that exhibits an excellent water vapor barrier capability, and rarely shows a deterioration in external appearance (e.g., air bubbles) even when subjected to a high temperature and a high humidity for a long time, the adhesive film that is useful for producing the gas barrier film laminate, and an electronic member that includes the gas barrier film laminate.

Abstract translation: 本发明涉及一种阻气膜层压体，其包含至少两个阻气膜，所述阻气膜层压体具有其中两个相邻的阻气膜通过压敏粘合剂层堆叠的构造，并且压敏粘合剂层 在权利要求1中由式（I）表示的剪切负荷减少率α（％）为70％以下; 以及用于制造包含至少两个阻气膜的阻气膜层压体的粘合膜，并且具有其中两个相邻的阻气膜通过压敏粘合剂层堆叠的构造，所述粘合膜至少包括 粘合剂层，相对于彼此层叠的粘合剂层，由权利要求11所述的（I）表示的剪切负荷减少率α（％）为70％以上的压敏粘合剂层， 减。 提供具有优异的水蒸汽阻隔能力的阻气膜层压体，即使长时间经受高温高湿也很少显示外观劣化（例如气泡），粘合剂膜 可用于制造阻气膜层叠体，以及包含阻气膜层叠体的电子部件。

公开(公告)号：US20150206700A1

公开(公告)日：2015-07-23

申请号：US14420777

申请日：2013-09-12

Applicant: LINTEC Corporation

Inventor： Satoshi Naganawa ,  Daisuke Goto ,  Suguru Kenmochi

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/04 ,  C23C14/48 ,  C23C14/562 ,  H01J37/3171 ,  H01J37/32412 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/3277 ,  H05H1/46 ,  H05H2001/485

Abstract: An ion implantation device equipped with a vacuum chamber (11), an electrode roll (13) on a portion of the outer circumferential part of which a film (2) is wound, a voltage application means (21) that applies a voltage to the electrode roll, and a gas introduction means (31) that introduces a gas into the vacuum chamber, wherein a voltage is applied to the electrode roll by means of the voltage application means and a gas is introduced by means of the gas introduction means, and an ion implantation process is performed on the surface of the film. In addition, electrode members (42) are provided opposing the surface of the electrode roll on which the film is wound.

Abstract translation: 一种离子注入装置，其具有真空室（11），在其外周部分的一部分卷绕有薄膜（2）的部分上的电极辊（13），向所述真空室施加电压的电压施加装置（21） 电极辊和气体引入装置（31），其将气体引入真空室，其中通过电压施加装置将电压施加到电极辊，并且气体通过气体引入装置引入，并且 在膜的表面上进行离子注入工艺。 此外，电极构件（42）设置成与其上缠绕有薄膜的电极辊的表面相对。

公开(公告)号：US09330880B2

公开(公告)日：2016-05-03

申请号：US14420777

申请日：2013-09-12

Applicant: LINTEC Corporation

Inventor： Satoshi Naganawa ,  Daisuke Goto ,  Suguru Kenmochi

IPC: G21K5/04 ,  H01J37/04 ,  C23C14/48 ,  H05H1/46 ,  H01J37/32 ,  C23C14/56 ,  H01J37/317 ,  H05H1/48

CPC classification number: H01J37/04 ,  C23C14/48 ,  C23C14/562 ,  H01J37/3171 ,  H01J37/32412 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/3277 ,  H05H1/46 ,  H05H2001/485

Abstract: An ion implantation device equipped with a vacuum chamber (11), an electrode roll (13) on a portion of the outer circumferential part of which a film (2) is wound, a voltage application means (21) that applies a voltage to the electrode roll, and a gas introduction means (31) that introduces a gas into the vacuum chamber, wherein a voltage is applied to the electrode roll by means of the voltage application means and a gas is introduced by means of the gas introduction means, and an ion implantation process is performed on the surface of the film. In addition, electrode members (42) are provided opposing the surface of the electrode roll on which the film is wound.

Abstract translation: 一种离子注入装置，其具有真空室（11），在其外周部分的一部分卷绕有薄膜（2）的部分上的电极辊（13），向所述真空室施加电压的电压施加装置（21） 电极辊和气体引入装置（31），其将气体引入真空室，其中通过电压施加装置将电压施加到电极辊，并且气体通过气体引入装置引入，并且 在膜的表面上进行离子注入工艺。 此外，电极构件（42）设置成与其上缠绕有薄膜的电极辊的表面相对。

公开(公告)号：US09336991B2

公开(公告)日：2016-05-10

申请号：US14420377

申请日：2013-09-12

Applicant: LINTEC Corporation

Inventor： Satoshi Naganawa ,  Daisuke Goto ,  Suguru Kenmochi

IPC: H01J37/30 ,  H01J37/317 ,  C23C14/48 ,  H05H1/46 ,  H01J37/32 ,  C23C14/56 ,  H05H1/48

CPC classification number: H01J37/3171 ,  C23C14/48 ,  C23C14/562 ,  H01J37/32 ,  H01J37/32412 ,  H01J37/3244 ,  H01J37/3277 ,  H01J2237/006 ,  H01J2237/18 ,  H01J2237/31701 ,  H05H1/46 ,  H05H2001/485

Abstract: The disclosed ion implantation apparatus has a vacuum chamber 11, a roller electrode 13 having a portion of an outer circumferential part on which a film 3 is wound, voltage application unit 23 for applying a voltage to the roller electrode, and a gas introduction unit having a gas supply outlet for supplying an ion implantation gas into the vacuum chamber, wherein the gas introduction unit and a gas discharge outlet are disposed so as to be opposite each other along the axial direction of the roller electrode, the roller electrode intervening therebetween.

Abstract translation: 所公开的离子注入装置具有真空室11，具有卷绕有膜3的外周部的一部分的辊电极13，向辊电极施加电压的电压施加单元23，以及具有 用于将离子注入气体供给到真空室中的气体供给口，其特征在于，所述气体导入单元和气体排出口沿所述辊电极的轴向彼此相对配置，所述辊电极介于其间。

公开(公告)号：US20150206710A1

公开(公告)日：2015-07-23

申请号：US14420377

申请日：2013-09-12

Applicant: LINTEC Corporation

Inventor： Satoshi Naganawa ,  Daisuke Goto ,  Suguru Kenmochi

IPC: H01J37/317 ,  H01J37/32

CPC classification number: H01J37/3171 ,  C23C14/48 ,  C23C14/562 ,  H01J37/32 ,  H01J37/32412 ,  H01J37/3244 ,  H01J37/3277 ,  H01J2237/006 ,  H01J2237/18 ,  H01J2237/31701 ,  H05H1/46 ,  H05H2001/485

Abstract: The disclosed ion implantation apparatus has a vacuum chamber 11, a roller electrode 13 having a portion of an outer circumferential part on which a film 3 is wound, voltage application unit 23 for applying a voltage to the roller electrode, and. a gas introduction unit having a. gas supply outlet for supplying an ion implantation gas into the vacuum chamber, wherein the gas introduction unit and a gas discharge outlet are disposed, so as to be opposite each other along the axial direction of the roller electrode, the roller electrode intervening therebetween.

Abstract translation: 所公开的离子注入装置具有真空室11，具有卷绕有膜3的外周部的一部分的辊电极13，向辊电极施加电压的电压施加单元23。 气体导入单元，具有a。 用于将离子注入气体供给到真空室中的气体供给口，其中，设置气体导入单元和气体排出口，沿着辊电极的轴向彼此相对，辊电极介于其间。