公开(公告)号：US08771834B2

公开(公告)日：2014-07-08

申请号：US13826954

申请日：2013-03-14

Applicant: LINTEC Corporation

Inventor： Kazue Uemura ,  Takeshi Kondo ,  Yuta Suzuki

IPC: B32B27/16

CPC classification number: B32B27/16 ,  C08J7/04 ,  C08J7/042 ,  C08J7/123 ,  C08J2323/06 ,  C08J2483/16 ,  C23C14/48 ,  G02F1/133305 ,  H01L23/293 ,  H01L2924/0002 ,  Y10T428/31667 ,  H01L2924/00

Abstract: The present invention is a formed article sequentially comprising a base layer, a primer layer that includes a hydroxyl group-containing polymer, and a gas barrier layer, the gas barrier layer being formed of a material that includes at least an oxygen atom and a silicon atom, a surface layer part of the gas barrier layer having an oxygen atom content rate of 60 to 75%, a nitrogen atom content rate of 0 to 10%, and a silicon atom content rate of 25 to 35%, based on a total content rate of oxygen atoms, nitrogen atoms, and silicon atoms, and the surface layer part of the gas barrier layer having a film density of 2.4 to 4.0 g/cm3. According to the present invention, provided is a formed article, a method for producing the same, an electronic device member including the formed article, and an electronic device including the electronic device member, with an excellent gas barrier capability and excellent transparency.

Abstract translation: 本发明是依次包含基层，包含含羟基聚合物的底漆层和气体阻隔层的成形制品，所述气体阻隔层由至少包含氧原子和硅的材料形成 原子，氧原子含有率为60〜75％，氮原子含有率为0〜10％，硅原子含有率为25〜35％的阻气层的表层部， 氧原子，氮原子和硅原子的含有率，阻气层的表层部分的膜密度为2.4〜4.0g / cm 3。 根据本发明，提供一种成型制品，其制造方法，包括成型制品的电子装置构件和包括该电子装置构件的电子装置，具有优异的阻气能力和优异的透明度。

公开(公告)号：US10967618B2

公开(公告)日：2021-04-06

申请号：US16085858

申请日：2017-03-16

Applicant: LINTEC CORPORATION

Inventor： Takumi Furuya ,  Satoshi Naganawa ,  Yuta Suzuki ,  Kenta Nishijima

IPC: B32B27/30 ,  B32B27/32 ,  C09D123/02 ,  C09D4/06 ,  C08J7/04 ,  C08J5/18 ,  C08L23/02 ,  C08K5/5419

Abstract: The present invention is: a curable composition for forming a primer layer of a gas barrier laminated film, comprising at least a polar group-containing polyolefin polymer and a polyfunctional acrylate compound; a gas barrier laminated film having a primer layer made of a cured product of the curable composition; and a gas barrier laminate including an organic compound-containing layer laminated on the surface of the gas barrier laminated film. The present invention provides: a curable composition that is for forming a primer layer suitably used in manufacturing a gas barrier laminate excellent in interlayer adhesion, a gas barrier laminated film having a primer layer made of the cured product of the curable composition, and a gas barrier laminate comprising an organic compound-containing layer laminated on the surface of the gas barrier laminated film.

公开(公告)号：US09234272B2

公开(公告)日：2016-01-12

申请号：US14354252

申请日：2012-10-12

Applicant: LINTEC CORPORATION

Inventor： Satoshi Naganawa ,  Yuta Suzuki

IPC: C23C14/48 ,  C01B21/082 ,  C08J7/12 ,  C08J7/04 ,  C23C14/06

CPC classification number: C23C14/48 ,  C01B21/0823 ,  C08J7/047 ,  C08J7/123 ,  C08J2367/02 ,  C08J2483/16 ,  C23C14/0676 ,  Y10T428/265

Abstract: Disclosed are a gas barrier film obtained by forming a gas barrier layer on a base material, and a method for producing such a gas barrier film, in which the gas barrier layer contains at least oxygen atoms, silicon atoms and nitrogen atoms, and in connection with the amount of nitrogen, the amount of silicon and the amount of oxygen measured by an XPS analysis, the gas barrier layer includes a first region constituted in the order of the amount of oxygen>the amount of silicon>the amount of nitrogen; a second region constituted in the order of the amount of silicon>the amount of oxygen>the amount of nitrogen; and a third region constituted in the order of the amount of oxygen>the amount of silicon>the amount of nitrogen, from a surface side toward a base material side.

Abstract translation: 公开了通过在基材上形成阻气层而获得的阻气膜，以及其中气体阻隔层至少含有氧原子，硅原子和氮原子并且连接的阻气膜的制造方法 通过XPS分析测量的氮的量，硅的量和氧的量，阻气层包括以氧的量>硅的量>氮的量的顺序构成的第一区; 以硅的量>氧的量>氮的量的顺序构成的第二区域; 以及从表面侧朝向基材侧的氧的量>硅的量>氮的量的顺序构成的第三区域。

公开(公告)号：US20150287954A1

公开(公告)日：2015-10-08

申请号：US14367252

申请日：2012-11-27

Applicant: LINTEC Corporation

Inventor： Satoshi Naganawa ,  Yuta Suzuki

IPC: H01L51/52 ,  C23C14/48

CPC classification number: H01L51/5253 ,  C08J7/047 ,  C08J2367/02 ,  C08J2483/16 ,  C23C14/48 ,  Y10T428/24942

Abstract: The present invention is aiming to provide a gas barrier film having excellent gas barrier properties and also having superior transparency and the like, and an efficient method for producing such a gas barrier film.The present invention provides a gas barrier film having a gas barrier layer on a base material, and a method for producing such a gas barrier film, in which the gas barrier layer includes, from the surface side toward the base material side, a first region and a second region having different refractive indices, the value of the refractive index in the first region is adjusted to a value within the range of 1.50 to 1.68, and the value of the refractive index in the second region is adjusted to a value within the range of 1.40 to below 1.50.

Abstract translation: 本发明的目的在于提供阻气性优异且透明性优异的阻气膜，以及制造这种阻气膜的有效方法。 本发明提供一种在基材上具有阻气层的阻气膜及其制造方法，其中阻气层从表面侧向基材侧包括第一区域 和具有不同折射率的第二区域，将第一区域中的折射率值调整为1.50至1.68的范围内的值，将第二区域中的折射率值调整为 范围1.40〜1.50。

公开(公告)号：US09698370B2

公开(公告)日：2017-07-04

申请号：US14367252

申请日：2012-11-27

Applicant: LINTEC Corporation

Inventor： Satoshi Naganawa ,  Yuta Suzuki

IPC: H01L51/52 ,  C23C14/48 ,  C08J7/04

CPC classification number: H01L51/5253 ,  C08J7/047 ,  C08J2367/02 ,  C08J2483/16 ,  C23C14/48 ,  Y10T428/24942

Abstract: The present invention is aiming to provide a gas barrier film having excellent gas barrier properties and also having superior transparency and the like, and an efficient method for producing such a gas barrier film.The present invention provides a gas barrier film having a gas barrier layer on a base material, and a method for producing such a gas barrier film, in which the gas barrier layer includes, from the surface side toward the base material side, a first region and a second region having different refractive indices, the value of the refractive index in the first region is adjusted to a value within the range of 1.50 to 1.68, and the value of the refractive index in the second region is adjusted to a value within the range of 1.40 to below 1.50.

公开(公告)号：US20140342149A1

公开(公告)日：2014-11-20

申请号：US14354252

申请日：2012-10-12

Applicant: LINTEC CORPORATION

Inventor： Satoshi Naganawa ,  Yuta Suzuki

IPC: C23C14/48 ,  C01B21/082

CPC classification number: C23C14/48 ,  C01B21/0823 ,  C08J7/047 ,  C08J7/123 ,  C08J2367/02 ,  C08J2483/16 ,  C23C14/0676 ,  Y10T428/265

Abstract: A gas barrier film having excellent gas barrier properties, and a method for producing such a gas barrier film are provided.Disclosed are a gas barrier film obtained by forming a gas barrier layer on a base material, and a method for producing such a gas barrier film, in which the gas barrier layer contains at least oxygen atoms, silicon atoms and nitrogen atoms, and in connection with the amount of nitrogen, the amount of silicon and the amount of oxygen measured by an XPS analysis, when the surface of the gas barrier layer that is in contact with the base material is designated as a base material side, and the opposite surface is designated as a surface side, the gas barrier layer includes a first region constituted in the order of the amount of oxygen>the amount of silicon>the amount of nitrogen; a second region constituted in the order of the amount of silicon>the amount of oxygen>the amount of nitrogen; and a third region constituted in the order of the amount of oxygen>the amount of silicon>the amount of nitrogen, from the surface side toward the base material side.

Abstract translation: 提供阻气性优异的阻气膜及其制造方法。 公开了通过在基材上形成阻气层而获得的阻气膜，以及其中气体阻隔层至少含有氧原子，硅原子和氮原子并且连接的阻气膜的制造方法 当与基材接触的阻气层的表面被指定为基材侧时，氮的量，硅的量和通过XPS分析测量的氧的量是相反的表面是 指定为表面侧，阻气层包括以氧的量>硅的量>氮的量的顺序构成的第一区域; 以硅的量>氧的量>氮的量的顺序构成的第二区域; 以及从表面侧朝向基材侧的氧的量>硅的量>氮的量的顺序构成的第三区域。