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公开(公告)号：US20220277934A1
公开(公告)日：2022-09-01
申请号：US17747417
申请日：2022-05-18
IPC分类号： H01J37/32 , H05H1/46 , H03J7/00 , H01J37/244
摘要： Systems and methods for adjusting power and frequency based on three or more states are described. One of the methods includes receiving a pulsed signal having multiple states. The pulsed signal is received by multiple radio frequency (RF) generators. When the pulsed signal having a first state is received, an RF signal having a pre-set power level is generated by a first RF generator and an RF signal having a pre-set power level is generated by a second RF generator. Moreover, when the pulsed signal having a second state is received, RF signals having pre-set power levels are generated by the first and second RF generators. Furthermore, when the pulsed signal having a third state is received, RF signals having pre-set power levels are generated by the first and second RF generators.
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公开(公告)号：US11038483B2
公开(公告)日：2021-06-15
申请号：US16846807
申请日：2020-04-13
发明人： Karl Leeser , Sunil Kapoor , Bradford J. Lyndaker
摘要： A matching module includes an input terminal connected to an input node, a variable load capacitor, and a plurality of RF signal delivery branches. The input terminal is connected to receive RF signals from one or more RF generators. The load capacitor is connected between the input node and a reference ground potential. Each of the plurality of RF signal delivery branches has a respective ingress terminal connected to the input node and a respective egress terminal connected to a respective one of a plurality of output terminals. Each of the plurality of output terminals of the matching module is connected to deliver RF signals to a different one of a plurality of plasma processing stations/chambers. Each of the plurality of RF signal delivery branches includes a corresponding inductor and a corresponding variable tuning capacitor electrically connected in a serial manner between its ingress terminal and its egress terminal.
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公开(公告)号：US20200244244A1
公开(公告)日：2020-07-30
申请号：US16846807
申请日：2020-04-13
发明人： Karl Leeser , Sunil Kapoor , Bradford J. Lyndaker
摘要： A matching module includes an input terminal connected to an input node, a variable load capacitor, and a plurality of RF signal delivery branches. The input terminal is connected to receive RF signals from one or more RF generators. The load capacitor is connected between the input node and a reference ground potential. Each of the plurality of RF signal delivery branches has a respective ingress terminal connected to the input node and a respective egress terminal connected to a respective one of a plurality of output terminals. Each of the plurality of output terminals of the matching module is connected to deliver RF signals to a different one of a plurality of plasma processing stations/chambers. Each of the plurality of RF signal delivery branches includes a corresponding inductor and a corresponding variable tuning capacitor electrically connected in a serial manner between its ingress terminal and its egress terminal.
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公开(公告)号：US10707056B2
公开(公告)日：2020-07-07
申请号：US15808017
申请日：2017-11-09
摘要： Systems and methods for determining ion energy are described. One of the methods includes detecting output of a generator to identify a generator output complex voltage and current (V&I). The generator is coupled to an impedance matching circuit and the impedance matching circuit is coupled to an electrostatic chuck (ESC). The method further includes determining from the generator output complex V&I a projected complex V&I at a point along a path between an output of a model of the impedance matching circuit and a model of the ESC. The operation of determining of the projected complex V&I is performed using a model for at least part of the path. The method includes applying the projected complex V&I as an input to a function to map the projected complex V&I to a wafer bias value at the ESC model and determining an ion energy from the wafer bias value.
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公开(公告)号：US10319570B2
公开(公告)日：2019-06-11
申请号：US15450721
申请日：2017-03-06
摘要： Systems and methods for determining a malfunctioning device in a plasma system, are described. One of the methods includes receiving an indication whether plasma is generated within a plasma chamber of the plasma system. The plasma system includes a processing portion and a power delivery portion. The method further includes determining whether the plasma system operates within constraints in response to receiving the indication that the plasma is generated, determining a value of a variable at an output of the power delivery portion when the processing portion is decoupled from the power delivery portion, and comparing the determined value with a pre-recorded value of the variable. The method includes determining whether the determined value is outside a range of the pre-recorded value and determining that the malfunctioning device within the power delivery portion upon determining that the determined value is outside the range of the pre-recorded value.
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公开(公告)号：US20190027342A1
公开(公告)日：2019-01-24
申请号：US15986688
申请日：2018-05-22
IPC分类号： H01J37/32
摘要： Systems and methods for tuning a radio frequency (RF) generator are described. One of the methods includes supplying, by a high frequency RF generator, a high frequency RF signal to the IMN. The method includes accessing a plurality of measurement values of a variable measured at an output of the high frequency RF generator to generate a parameter. The variable is measured during a plurality of cycles of operation of a low frequency RF generator. The measurement values are associated with a plurality of values of power supplied by the high frequency RF generator. The method includes determining, for one of the cycles, a value of a frequency of the high frequency RF generator and a value of a factor associated with a shunt circuit of the IMN for which there is an increase in efficiency in power delivered by the high frequency RF generator.
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公开(公告)号：US09954508B2
公开(公告)日：2018-04-24
申请号：US14923329
申请日：2015-10-26
发明人： Karl Leeser , Sunil Kapoor , Bradford J. Lyndaker
CPC分类号： H03H7/38 , H01J37/32183
摘要： A matching module includes an input terminal connected to an input node, a variable load capacitor, and a plurality of RF signal delivery branches. The input terminal is connected to receive RF signals from one or more RF generators. The load capacitor is connected between the input node and a reference ground potential. Each of the plurality of RF signal delivery branches has a respective ingress terminal connected to the input node and a respective egress terminal connected to a respective one of a plurality of output terminals. Each of the plurality of output terminals of the matching module is connected to deliver RF signals to a different one of a plurality of plasma processing stations/chambers. Each of the plurality of RF signal delivery branches includes a corresponding inductor and a corresponding variable tuning capacitor electrically connected in a serial manner between its ingress terminal and its egress terminal.
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公开(公告)号：US09842725B2
公开(公告)日：2017-12-12
申请号：US14184639
申请日：2014-02-19
CPC分类号： H01J37/32183 , H01J37/32926 , H01J37/32935
摘要： Systems and methods for determining ion energy are described. One of the methods includes detecting output of a generator to identify a generator output complex voltage and current (V&I). The generator is coupled to an impedance matching circuit and the impedance matching circuit is coupled to an electrostatic chuck (ESC). The method further includes determining from the generator output complex V&I a projected complex V&I at a point along a path between an output of a model of the impedance matching circuit and a model of the ESC. The operation of determining of the projected complex V&I is performed using a model for at least part of the path. The method includes applying the projected complex V&I as an input to a function to map the projected complex V&I to a wafer bias value at the ESC model and determining an ion energy from the wafer bias value.
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公开(公告)号：US09812294B2
公开(公告)日：2017-11-07
申请号：US15172004
申请日：2016-06-02
CPC分类号： H01J37/32146 , H01J37/32082 , H01J37/32174 , H01J37/32183 , H01J37/3244 , H01J37/3255 , H01J2237/327 , H03K3/01 , H03L7/00 , H03L7/06 , H05H2001/4682
摘要： A method for achieving sub-pulsing during a state is described. The method includes receiving a clock signal from a clock source, the clock signal having two states and generating a pulsed signal from the clock signal. The pulsed signal has sub-states within one of the states. The sub-states alternate with respect to each other at a frequency greater than a frequency of the states. The method includes providing the pulsed signal to control power of a radio frequency (RF) signal that is generated by an RF generator. The power is controlled to be synchronous with the pulsed signal.
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10.发明申请METHODS AND APPARATUS FOR SYNCHRONIZING RF PULSES IN A PLASMA PROCESSING SYSTEM 审中-公开用于在等离子体处理系统中同步RF脉冲的方法和装置公开(公告)号：US20160268100A1
公开(公告)日：2016-09-15
申请号：US15162528
申请日：2016-05-23
IPC分类号： H01J37/32
CPC分类号： H01J37/32183 , H01J37/32146 , H01J37/32174
摘要： A synchronized pulsing arrangement for providing at least two synchronized pulsing RF signals to a plasma processing chamber of a plasma processing system is provided. The arrangement includes a first RF generator for providing a first RF signal. The first RF signal is provided to the plasma processing chamber to energize plasma therein, the first RF signal representing a pulsing RF signal. The arrangement also includes a second RF generator for providing a second RF signal to the plasma processing chamber. The second RF generator has a sensor subsystem for detecting values of at least one parameter associated with the plasma processing chamber that reflects whether the first RF signal is pulsed high or pulsed low and a pulse controlling subsystem for pulsing the second RF signal responsive to the detecting the values of at least one parameter.
摘要翻译： 提供了一种用于向等离子体处理系统的等离子体处理室提供至少两个同步脉冲RF信号的同步脉冲装置。 该装置包括用于提供第一RF信号的第一RF发生器。 第一RF信号被提供给等离子体处理室以激励其中的等离子体，第一RF信号表示脉冲RF信号。 该装置还包括用于向等离子体处理室提供第二RF信号的第二RF发生器。 第二RF发生器具有用于检测与等离子体处理室相关联的至少一个参数的值的传感器子系统，其反映第一RF信号是高电平脉冲还是脉冲低脉冲，以及响应于检测脉冲控制第二RF信号的脉冲控制子系统 至少有一个参数的值。
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