摘要:
The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure —C(Rf)(Rf′)OR wherein Rf and Rf′ are the same or different fluoroalkyl groups of from one to about ten carbon atoms or taken together are (CF2)a wherein a is an integer ranging from 2 to about 10 and R is a hydrogen atom or an acid labile protecting group. Typically, the dissolution inhibitor has an absorption coefficient of less than about 4.0 μm at a wavelength of 157 nm.
摘要翻译:本发明涉及包含聚合物粘合剂的光致抗蚀剂组合物; 光活性成分; 和至少一种溶解抑制剂,其包含链烷烃或环烷烃化合物,其含有至少一个具有结构-C(R f) 一个或多个碳原子的相同或不同的氟代烷基或一起为(CF 2 N 2)