Protecting groups in polymers, photoresists and processes for microlithography
    7.
    发明申请
    Protecting groups in polymers, photoresists and processes for microlithography 有权
    聚合物,光致抗蚀剂和微光刻工艺中的保护基团

    公开(公告)号:US20050191579A1

    公开(公告)日:2005-09-01

    申请号:US11113695

    申请日:2005-04-25

    摘要: The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as 193 nm and 157 nm.

    摘要翻译: 本发明涉及一种具有保护基和掺入环状化学结构的保护材料的光致抗蚀剂组合物。 在本发明中,保护材料具有环状醚基或环状酯基作为保护基。 环醚基的具体实例是被一个或多个氟化烷基取代的环氧烷,例如氧杂环丁烷基。 环酯的具体实例是可被甲基取代的内酯。 光致抗蚀剂组合物还包括光活性组分。 本发明的光致抗蚀剂组合物对紫外线辐射具有高透明度,特别是在短波长如193nm和157nm处。

    PREPARATION AND USE OF EXO-2-FLUOROALKYL(BICYCLO[2.2.1] HEPT-5-ENES)
    8.
    发明申请
    PREPARATION AND USE OF EXO-2-FLUOROALKYL(BICYCLO[2.2.1] HEPT-5-ENES) 失效
    二-2-氟代烷基(双丙基[2.2.1]庚二烯-5-烯)的制备和使用)

    公开(公告)号:US20050058932A1

    公开(公告)日:2005-03-17

    申请号:US10664303

    申请日:2003-09-16

    摘要: There is disclosed a composition comprising a mixture of endo- and exo-2-(bicyclo[2.2.1]hept-5-en-2-yl)-2,2-fluoroalkyl-ethan-2-ol which is rich in the exo isomer, preferably the endo/exo concentration ratio is no greater than 5/95. The composition is useful for forming a repeat unit of a polymer which polymer may further comprise additional repeat units derived from tert-butyl acrylate, hydroxyadamantyl acrylate, protected or unprotected fluorinated olefins, 2-methyl-2-adamantyl acrylate, 2-propenoic acid, 2-hydroxy-1,1,2-trimethylpropyl ester. Polymers of this invention are useful as the binder component of a photoresist composition for microlithography.

    摘要翻译: 公开了一种组合物,其包含内 - 和外-2-(二环[2.2.1]庚-5-烯-2-基)-2,2-氟烷基 - 乙-2-醇的混合物,其富含 外异构体,优选内/外浓度比不大于5/95。 该组合物可用于形成聚合物的重复单元,该聚合物可以进一步包含衍生自丙烯酸叔丁酯,丙烯酸羟基金刚烷基酯,被保护或未保护的氟化烯烃,丙烯酸2-甲基-2-金刚烷基酯,2-丙烯酸, 2-羟基-1,1,2-三甲基丙基酯。 本发明的聚合物可用作微光刻用光致抗蚀剂组合物的粘合剂组分。

    Method for the application of active materials onto active surfaces and devices made with such methods
    9.
    发明申请
    Method for the application of active materials onto active surfaces and devices made with such methods 失效
    将活性物质施加到活性表面上的方法和用这种方法制造的装置

    公开(公告)号:US20050269550A1

    公开(公告)日:2005-12-08

    申请号:US11154925

    申请日:2005-06-16

    摘要: The invention provides methods for the application of active materials onto active surfaces useful in organic electronic devices. The methods of the invention include selecting a liquid composition including an active material and a suitable liquid medium whereby when the liquid composition is deposited on the desired active surface it has no greater than about a 40° contact angle; treating the active surface to raise its surface tension before the deposition of a liquid composition containing the desired active material is deposited thereon; and combination thereof. The invention also provides organic electronic devices having at least two active layers, wherein at least one active layer comprises an active material that was deposited using at least one practice of the method of the invention.

    摘要翻译: 本发明提供了将活性材料应用于可用于有机电子器件的有源表面上的方法。 本发明的方法包括选择包括活性材料和合适液体介质的液体组合物,由此当液体组合物沉积在所需活性表面上时,其具有不大于约40°的接触角; 在沉积含有所需活性材料的液体组合物之前,处理活性表面以提高其表面张力; 及其组合。 本发明还提供了具有至少两个活性层的有机电子器件,其中至少一个活性层包含使用本发明方法的至少一种实践沉积的活性材料。