公开(公告)号：US20050039852A1

公开(公告)日：2005-02-24

申请号：US10951084

申请日：2004-09-27

申请人： Gregory Roche ,  Leonard Mahoney ,  Daniel Carter ,  Steven Roberts

发明人： Gregory Roche ,  Leonard Mahoney ,  Daniel Carter ,  Steven Roberts

IPC分类号： H01J37/32 ,  H01L21/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01J37/32935 ,  H01L21/67253

摘要： There is provided by this invention a wafer probe for measuring plasma and surface characteristics in plasma processing environment that utilizes integrated sensors on a wafer substrate. A microprocessor mounted on the substrate receives input signals from the integrated sensors to process, store, and transmit the data. A wireless communication transceiver receives the data from the microprocessor and transmits information outside of the plasma processing system to a computer that collects the data during plasma processing. The integrated sensors may be dual floating Langmuir probes, temperature measuring devices, resonant beam gas sensors, or hall magnetic sensors. There is also provided a self-contained power source that utilizes the plasma for power that is comprised of a topographically dependent charging device or a charging structure that utilizes stacked capacitors.

摘要翻译： 本发明提供一种用于测量在晶片衬底上利用集成传感器的等离子体处理环境中的等离子体和表面特性的晶片探针。 安装在基板上的微处理器从集成传感器接收输入信号以处理，存储和发送数据。 无线通信收发器从微处理器接收数据并将等离子体处理系统外的信息传送到在等离子体处理期间收集数据的计算机。 集成传感器可以是双浮动朗缪尔探头，温度测量装置，谐振束气体传感器或霍尔磁传感器。 还提供了一种独立的电源，其利用由等离子体构成的地形学依赖的充电装置或利用堆叠的电容器的充电结构。

公开(公告)号：US20050034812A1

公开(公告)日：2005-02-17

申请号：US10951162

申请日：2004-09-27

申请人： Gregory Roche ,  Leonard Mahoney ,  Daniel Carter ,  Steven Roberts

发明人： Gregory Roche ,  Leonard Mahoney ,  Daniel Carter ,  Steven Roberts

IPC分类号： H01J37/32 ,  H01L21/00 ,  C23F1/00

CPC分类号： H01J37/32935 ,  H01L21/67253

摘要： There is provided by this invention a wafer probe for measuring plasma and surface characteristics in plasma processing environment that utilizes integrated sensors on a wafer substrate. A microprocessor mounted on the substrate receives input signals from the integrated sensors to process, store, and transmit the data. A wireless communication transceiver receives the data from the microprocessor and transmits information outside of the plasma processing system to a computer that collects the data during plasma processing. The integrated sensors may be dual floating Langmuir probes, temperature measuring devices, resonant beam gas sensors, or hall magnetic sensors. There is also provided a self-contained power source that utilizes the plasma for power that is comprised of a topographically dependent charging device or a charging structure that utilizes stacked capacitors.

摘要翻译： 本发明提供一种用于测量在晶片衬底上利用集成传感器的等离子体处理环境中的等离子体和表面特性的晶片探针。 安装在基板上的微处理器从集成传感器接收输入信号以处理，存储和发送数据。 无线通信收发器从微处理器接收数据并将等离子体处理系统外的信息传送到在等离子体处理期间收集数据的计算机。 集成传感器可以是双浮动朗缪尔探头，温度测量装置，谐振束气体传感器或霍尔磁传感器。 还提供了一种独立的电源，其利用由等离子体构成的地形学依赖的充电装置或利用堆叠的电容器的充电结构。

公开(公告)号：US20050011611A1

公开(公告)日：2005-01-20

申请号：US10920138

申请日：2004-08-17

申请人： Leonard Mahoney ,  Daniel Carter ,  Steven Roberts ,  Gregory Roche

发明人： Leonard Mahoney ,  Daniel Carter ,  Steven Roberts ,  Gregory Roche

IPC分类号： H01J37/32 ,  H01L21/00 ,  C23F1/00

CPC分类号： H01J37/32935 ,  H01L21/67253

摘要： There is provided by this invention a wafer probe for measuring plasma and surface characteristics in plasma processing environment that utilizes integrated sensors on a wafer substrate. A microprocessor mounted on the substrate receives input signals from the integrated sensors to process, store, and transmit the data. A wireless communication transceiver receives the data from the microprocessor and transmits information outside of the plasma processing system to a computer that collects the data during plasma processing. The integrated sensors may be dual floating Langmuir probes, temperature measuring devices, resonant beam gas sensors, optical emission sensors, or other sensors of plasma or surface properties. There is also provided a self-contained power source that utilizes the plasma for power that is comprised of a topographically dependent charging device or a charging structure that utilizes stacked capacitors.

摘要翻译： 本发明提供一种用于测量在晶片衬底上利用集成传感器的等离子体处理环境中的等离子体和表面特性的晶片探针。 安装在基板上的微处理器从集成传感器接收输入信号以处理，存储和发送数据。 无线通信收发器从微处理器接收数据并将等离子体处理系统外的信息传送到在等离子体处理期间收集数据的计算机。 集成传感器可以是双浮动Langmuir探针，温度测量装置，谐振束气体传感器，光发射传感器或其他等离子体或表面性质的传感器。 还提供了一种独立的电源，其利用由等离子体构成的地形学依赖的充电装置或利用堆叠的电容器的充电结构。

公开(公告)号：US20050284570A1

公开(公告)日：2005-12-29

申请号：US10875954

申请日：2004-06-24

申请人： Daniel Doran ,  Leonard Mahoney ,  Steven Roberts ,  Gregory Roche

发明人： Daniel Doran ,  Leonard Mahoney ,  Steven Roberts ,  Gregory Roche

IPC分类号： C23F1/00 ,  C23F4/00 ,  G01L21/30 ,  H01J37/32

CPC分类号： C23F4/00 ,  H01J37/32935

摘要： A diagnostic plasma measurement device is provided having sensors and features disposed using pattern transfer fabrication techniques. A measurement device comprises a primary substrate with sensors for measuring plasma or surface properties disposed by a stepped pattern transfer technique, such as step-and-repeat photolithography, about the surface of the probe. Sensor fields include sensors that measure physical and electrical properties of a plasma, as well as sensors that measure properties of the wafer surface. Fields or components for processing electronics, electrical interconnections, memory, photovoltaic power, and wireless communication are also provided. By utilizing pattern transfer fabrication techniques, the invention generally provides for reduced risks of contamination of a plasma processing environment and increased manufacturability and reliability of the completed sensor device.

摘要翻译： 提供诊断等离子体测量装置，其具有使用图案转移制造技术设置的传感器和特征。 测量装置包括具有传感器的初级衬底，该传感器用于通过阶梯式图案转移技术（诸如分步重复光刻法）围绕探针的表面测量等离子体或表面性质。 传感器领域包括测量等离子体的物理和电学特性的传感器以及测量晶片表面性质的传感器。 还提供了用于处理电子，电互连，存储器，光伏电力和无线通信的领域或组件。 通过利用图案转移制造技术，本发明通常提供降低等离子体处理环境的污染风险，并提高完整的传感器装置的可制造性和可靠性。

公开(公告)号：US20060171848A1

公开(公告)日：2006-08-03

申请号：US11047256

申请日：2005-01-31

申请人： Gregory Roche ,  Daniel Carter ,  David Madsen ,  Leonard Mahoney

发明人： Gregory Roche ,  Daniel Carter ,  David Madsen ,  Leonard Mahoney

IPC分类号： G01N27/00

CPC分类号： H01J37/32935 ,  G01R31/2642 ,  H01L22/34

摘要： A plasma measurement device comprises data sensors for sensing properties of the plasma environment together with diagnostic sensors for measuring properties related to the functional integrity of the measurement device. Events reported by the diagnostic sensors of the invention may be interpreted as failures of the measurement device, as warnings requiring operator attention or intervention, or alternatively may be employed as data in a predictive algorithm to estimate the remaining useful lifetime of the device. By providing an ability to detect events indicative of faults or failures in a plasma measurement device during use of the device, the invention provides enhanced certainty and confidence in the integrity of data collected by the plasma measurement device.

摘要翻译： 等离子体测量装置包括用于感测等离子体环境的属性的数据传感器以及用于测量与测量装置的功能完整性相关的属性的诊断传感器。 由本发明的诊断传感器报告的事件可被解释为测量装置的故障，作为需要操作者注意或干预的警告，或者替代地可以用作预测算法中的数据来估计设备的剩余使用寿命。 通过提供在使用装置期间检测指示等离子体测量装置中的故障或故障的事件的能力，本发明提供了由等离子体测量装置收集的数据的完整性的增强的确定性和置信度。

公开(公告)号：US20050034811A1

公开(公告)日：2005-02-17

申请号：US10640892

申请日：2003-08-14

申请人： Leonard Mahoney ,  Carl Almgren ,  Gregory Roche ,  William Saylor ,  William Sproul ,  Hendrik Walde

发明人： Leonard Mahoney ,  Carl Almgren ,  Gregory Roche ,  William Saylor ,  William Sproul ,  Hendrik Walde

IPC分类号： C23C16/00 ,  C23F1/00 ,  G01K11/00 ,  G01N27/60 ,  G01R27/26 ,  G01R27/28 ,  H01J20060101 ,  H01J37/32 ,  H01L21/00 ,  H01L21/302 ,  H01L21/306 ,  H01L21/461 ,  H05H1/00

CPC分类号： H01J37/32935 ,  H01J37/32954

摘要： A plasma processing system is provided with diagnostic apparatus for making in-situ measurements of plasma properties. The diagnostic apparatus generally comprises a non-invasive sensor array disposed within a plasma processing chamber, an electrical circuit for stimulating the sensors, and means for recording and communicating sensor measurements for monitoring or control of the plasma process. In one form, the sensors are dynamically pulsed dual floating Langmuir probes that measure incident charged particle currents and electron temperatures in proximity to the plasma boundary or boundaries within the processing system. The plasma measurements may be used to monitor the condition of the processing plasma or furnished to a process system controller for use in controlling the plasma process.

摘要翻译： 等离子体处理系统设置有用于等离子体性质的原位测量的诊断装置。 诊断装置通常包括设置在等离子体处理室内的非侵入式传感器阵列，用于刺激传感器的电路，以及用于记录和传送用于监测或控制等离子体处理的传感器测量的装置。 在一种形式中，传感器是动态脉冲双浮动Langmuir探头，其测量接近加工系统内的等离子体边界或边界的入射带电粒子电流和电子温度。 等离子体测量可以用于监视处理等离子体的状态或者提供给用于控制等离子体处理的过程系统控制器。

公开(公告)号：US20050151544A1

公开(公告)日：2005-07-14

申请号：US11066520

申请日：2005-02-25

申请人： Leonard Mahoney ,  Carl Almgren ,  Gregory Roche ,  William Saylor ,  William Sproul ,  Hendrik Walde

发明人： Leonard Mahoney ,  Carl Almgren ,  Gregory Roche ,  William Saylor ,  William Sproul ,  Hendrik Walde

IPC分类号： C23C16/00 ,  C23F1/00 ,  G01K11/00 ,  G01N27/60 ,  G01R27/26 ,  G01R27/28 ,  H01J20060101 ,  H01J37/32 ,  H01L21/00 ,  H01L21/302 ,  H01L21/306 ,  H01L21/461 ,  H05H1/00

CPC分类号： H01J37/32935 ,  H01J37/32954

摘要： A plasma processing system is provided with diagnostic apparatus for making in-situ measurements of plasma properties. The diagnostic apparatus generally comprises a non-invasive sensor array disposed within a plasma processing chamber, an electrical circuit for stimulating the sensors, and means for recording and communicating sensor measurements for monitoring or control of the plasma process. In one form, the sensors are dynamically pulsed dual floating Langmuir probes that measure incident charged particle currents and electron temperatures in proximity to the plasma boundary or boundaries within the processing system. The plasma measurements may be used to monitor the condition of the processing plasma or furnished to a process system controller for use in controlling the plasma process.

公开(公告)号：US20060043063A1

公开(公告)日：2006-03-02

申请号：US10933167

申请日：2004-09-02

申请人： Leonard Mahoney ,  Daniel Carter ,  Daniel Doran

发明人： Leonard Mahoney ,  Daniel Carter ,  Daniel Doran

IPC分类号： G01L21/30 ,  C23F1/00

CPC分类号： C23F4/00 ,  H01J37/32935 ,  H01L21/67253 ,  H05H1/0081

摘要： A diagnostic plasma probe comprises ion sensors for measuring kinetic properties of plasma ions. Ion sensors of the invention include sensors for measuring differential ion flux, ion energy distributions, and ion incidence angle distributions at or near the surface of the probe. The measurement probe is electrically floating so as to cause minimal disruption of the properties of the processing plasma when disposed into a processing environment. A floating electrical bias is applied to the sensors to obtain measurements of ion properties.

摘要翻译： 诊断等离子体探针包括用于测量等离子体离子的动力学性质的离子传感器。 本发明的离子传感器包括用于测量探针表面处或附近的差分离子通量，离子能量分布和离子入射角分布的传感器。 测量探头是电浮动的，以便当处理环境中时处理等离子体的性质几乎不受破坏。 对传感器施加漂浮的电偏压以获得离子特性的测量。

公开(公告)号：US20050217796A1

公开(公告)日：2005-10-06

申请号：US10815124

申请日：2004-03-31

申请人： Daniel Carter ,  Daniel Doran ,  Leonard Mahoney

发明人： Daniel Carter ,  Daniel Doran ,  Leonard Mahoney

IPC分类号： C23F1/00 ,  H01J37/32

CPC分类号： H01J37/32082 ,  H01J37/32935

摘要： An in-situ plasma measurement probe comprises a primary substrate, such as a silicon wafer, with sensor devices disposed about the surface of the probe. An electronics module contains electronic components or other elements of the diagnostic probe that require isolation and shielding from the plasma environment. The electronics module is disposed upon the probe substrate and electrically connected to the remote sensor devices through one or more electrical interconnection layers disposed upon the substrate. By integrating and modularizing the electronic components of a sensor probe, the probe design may be optimized for cost effective production techniques while ensuring mechanical, chemical, and thermal compatibility with the wafer or other carrying substrate and the environment to which it is exposed.

摘要翻译： 原位等离子体测量探针包括主基底，例如硅晶片，其中传感器装置围绕探针的表面设置。 电子模块包含需要隔离和屏蔽等离子体环境的电子元件或诊断探针的其他元件。 电子模块设置在探针基板上并且通过设置在基板上的一个或多个电互连层电连接到远程传感器装置。 通过集成和模块化传感器探头的电子部件，探针设计可以针对成本有效的生产技术进行优化，同时确保与晶片​​或其他承载基板及其所暴露的环境的机械，化学和热相容性。

公开(公告)号：US20060180570A1

公开(公告)日：2006-08-17

申请号：US11352012

申请日：2006-02-10

申请人： Leonard Mahoney

发明人： Leonard Mahoney

IPC分类号： G01L21/30 ,  C23F1/00

CPC分类号： H01J37/3299 ,  H01J37/32935 ,  H05H1/0006

摘要： A system and method for managing a plasma system is described. In one embodiment the method includes measuring at least one aspect of a state of plasma in the plasma system so as to obtain plasma state data, receiving subsystem data, which is indicative of at least one subsystem of the plasma system and utilizing both the plasma state data and the subsystem data to manage the plasma system.

摘要翻译： 描述了一种用于管理等离子体系统的系统和方法。 在一个实施例中，该方法包括测量等离子体系统中的等离子体的状态的至少一个方面，以便获得等离子体状态数据，接收子系统数据，其指示等离子体系统的至少一个子系统并利用等离子体状态 数据和子系统数据来管理等离子体系统。