摘要:
An X-ray optical configuration for irradiation of a sample (1) with an X-ray beam having a line-shaped cross-section, wherein the configuration contains an X-ray source (2) and a beam-conditioning X-ray optics, is characterized in that the X-ray source (2) comprises a brilliant point source (4) and the X-ray optics comprises an X-ray optical element (3) which conditions X-ray light emitted by the point source in such a fashion that the X-ray beam is rendered parallel in one direction perpendicular to the beam propagation direction and remains divergent in a direction which is perpendicular thereto and also to the beam propagation direction. An X-ray optical element of this type enables use of both point-shaped and line-shaped beam geometries without complicated and time-consuming conversion work.
摘要:
An X-ray optical configuration for irradiation of a sample (1) with an X-ray beam having a line-shaped cross-section, wherein the configuration contains an X-ray source (2) and a beam-conditioning X-ray optics, is characterized in that the X-ray source (2) comprises a brilliant point source (4) and the X-ray optics comprises an X-ray optical element (3) which conditions X-ray light emitted by the point source in such a fashion that the X-ray beam is rendered parallel in one direction perpendicular to the beam propagation direction and remains divergent in a direction which is perpendicular thereto and also to the beam propagation direction. An X-ray optical element of this type enables use of both point-shaped and line-shaped beam geometries without complicated and time-consuming conversion work.
摘要:
A method for manufacturing a reflector (5) for X-ray radiation (2, 3, 10, 11) which is curved in a non-circular arc shape, along a first cross-section (13) in a plane (XZ) which contains a x-direction, wherein the reflector (5) is also curved along a second cross-section (14) in a plane (YZ) which is perpendicular to the x-direction, is characterized in that the reflector (5) has a curvature along the second cross-section (14) which also differs from the shape of a circular arc. This makes the design of X-ray mirrors and the beam profile of reflected X-ray radiation more flexible, facilitates production of X-ray mirrors and at the same time provides high reflection capacity and good focusing properties for X-ray mirrors.
摘要:
A tool (20) for use in the separation of elements in a building set, said elements having a face provided with coupling means which have a wall part extending transversely to the face, and which are preferably disposed in parallel with a side edge, comprises a lever (25) and a gripper means. The gripper means is disposed at one end of the lever and comprises a first jaw area (21,23) intended to tightly engage the side edge of the element, and a second jaw area (22,24) intended to tightly engage the portion of the wall part of said coupling means which faces away from said side edge. The gripper means may moreover comprise complementary coupling means for at least some of said coupling means.
摘要:
An X-ray analysis instrument, in particular, an X-ray diffractometer (21), has an X-ray source (22; SC) that emits an X-ray beam (23), an X-ray optics (24), in particular a multi-layer X-ray mirror, and a collimator mechanism (BM), wherein the collimator mechanism (BM) forms an aperture window (2, 2′) with an aperture opening (3, 3′) through which at least part (26) of the X-ray beam (23) passes. The collimator mechanism (BM) comprises means for gradual movement of the aperture window (2, 2′) in at least one direction (A/B, x, y) transversely to the X-ray beam (23), the aperture opening (3, 3′) is at least as large as the cross-section (32) of the X-ray beam (23) at the location of the aperture window (2, 2′), and the path of movement (VWx, VWy) of the aperture window (2, 2′), which is accessible by the collimator mechanism (BM), in the at least one direction (A/B, x, y) is at least twice as large as the extension (RSx, RSy) of the X-ray beam (23) at the location of the aperture window (2, 2′) in this direction (A/B, x, y). The X-ray analysis instrument offers a wider scope of beam conditioning possibilities.
摘要:
A device for adjusting optical elements, in particular, for X-ray analysis, comprising a holding device (2) for receiving the optical element and at least two adjusting units at least one of the two longitudinal ends of the holding device (2), wherein the adjusting units each comprise one plunger (6, 6a, 6b, 6c, 6d), characterized in that each adjusting unit comprises a rotatably disposed adjusting ring (4, 4a, 4b, 4c, 4d) with an eccentric recess, and the optical element is mechanically coupled to the inner surfaces (7) of the adjusting rings (4, 4a, 4b, 4c, 4d) via the plungers (6, 6a, 6b, 6c, 6d). The adjusting device is compact, can be flexibly used and provides simple adjustment of the optical element.
摘要:
In an apparatus and a method for the analysis of atomic or molecular elements contained in a sample by wavelength dispersive X-ray spectrometry, wherein primary x ray or electron radiation is directed onto the sample whereby fluorescence radiation is emitted from the sample, the fluorescence radiation is directed onto a mirror or focussing device consisting of a multi-layer structure including pairs of layers of which one layer of a pair comprises carbon or scandium and the other comprises a metal oxide or a metal nitride and the fluorescence radiation is reflected from the mirror or focussing device onto an analysis detector for the analysis of the atomic or molecular elements contained in the sample.
摘要:
A method for manufacturing a reflector (5) for X-ray radiation (2, 3, 10, 11) which is curved in a non-circular arc shape, along a first cross-section (13) in a plane (XZ) which contains a x-direction, wherein the reflector (5) is also curved along a second cross-section (14) in a plane (YZ) which is perpendicular to the x-direction, is characterized in that the reflector (5) has a curvature along the second cross-section (14) which also differs from the shape of a circular arc. This makes the design of X-ray mirrors and the beam profile of reflected X-ray radiation more flexible, facilitates production of X-ray mirrors and at the same time provides high reflection capacity and good focusing properties for X-ray mirrors.
摘要:
In an apparatus and a method for the analysis of atomic or molecular elements contained in a sample by wavelength dispersive X-ray spectrometry, wherein primary x ray or electron radiation is directed onto the sample whereby fluorescence radiation is emitted from the sample, the fluorescence radiation is directed onto a mirror or focussing device consisting of a multi-layer structure including pairs of layers of which one layer of a pair consists of lanthanum and the other consists of carbon and the fluorescence radiation is reflected from the mirror or focussing device onto an analysis detector for the analysis of the atomic or molecular elements contained in the sample.
摘要:
An X-ray analysis instrument, in particular, an X-ray diffractometer (21), has an X-ray source (22; SC) that emits an X-ray beam (23), an X-ray optics (24), in particular a multi-layer X-ray mirror, and a collimator mechanism (BM), wherein the collimator mechanism (BM) forms an aperture window (2, 2′) with an aperture opening (3, 3′) through which at least part (26) of the X-ray beam (23) passes. The collimator mechanism (BM) comprises means for gradual movement of the aperture window (2, 2′) in at least one direction (A/B, x,y) transversely to the X-ray beam (23), the aperture opening (3, 3′) is at least as large as the cross-section (32) of the X-ray beam (23) at the location of the aperture window (2, 2′), and the path of movement (VWx, VWy) of the aperture window (2, 2′), which is accessible by the collimator mechanism (BM), in the at least one direction (A/B, x, y) is at least twice as large as the extension (RSx, RSy) of the X-ray beam (23) at the location of the aperture window (2, 2′) in this direction (A/B, x, y). The X-ray analysis instrument offers a wider scope of beam conditioning possibilities.