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公开(公告)号：US10397717B2
公开(公告)日：2019-08-27
申请号：US15988539
申请日：2018-05-24
Applicant: MING CHI UNIVERSITY OF TECHNOLOGY
Inventor： Jyh-Wei Lee , Jen-Chun Chang , Yi-Jie Liao
Abstract: The present invention provides an acoustic diaphragm including: a cone and a surround mounted around the cone; wherein an amorphous titanium-zirconium film is formed on a cone substrate, a surround substrate, or both of the substrates. The present invention also provides a speaker containing the acoustic diaphragm.
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Patent Agency Ranking
公开(公告)号：US20230193435A1
公开(公告)日：2023-06-22
申请号：US18097567
申请日：2023-01-17
Applicant: MING CHI UNIVERSITY OF TECHNOLOGY
Inventor： Jyh-Wei Lee , Bih-Show Lou , Yung-Chin Yang , Hsin Chao
Abstract: A high-entropy alloy film, the composition of which includes titanium, zirconium, niobium, tantalum and iron. The high-entropy alloy film is made with a combination of elements with high biocompatibility, and its formation of non-crystalline structure is further improved by adding iron. Furthermore, as the content of titanium in the high-entropy alloy film is adjusted, the microstructure, mechanical properties, and corrosion resistance of the high-entropy alloy film is changed as well.
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公开(公告)号：US20220259706A1
公开(公告)日：2022-08-18
申请号：US17368987
申请日：2021-07-07
Applicant: MING CHI UNIVERSITY OF TECHNOLOGY
Inventor： Jyh-Wei Lee , Bih-Show Lou , Yung-Chin Yang , Hsin Chao
Abstract: A high-entropy alloy film, the composition of which includes titanium, zirconium, niobium, tantalum and iron. The high-entropy alloy film is made with a combination of elements with high biocompatibility, and its formation of non-crystalline structure is further improved by adding iron. Furthermore, as the content of titanium in the high-entropy alloy film is adjusted, the microstructure, mechanical properties, and corrosion resistance of the high-entropy alloy film is changed as well.
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公开(公告)号：US09566131B2
公开(公告)日：2017-02-14
申请号：US14711136
申请日：2015-05-13
Applicant: MING CHI UNIVERSITY OF TECHNOLOGY
Inventor： Jyh-Wei Lee , Yu-Lun Deng , Chun-Pin Lin
IPC: A61C5/02
CPC classification number: A61C5/42 , A61C2201/007
Abstract: An endodontic file with improved fatigue resistance comprising a conical body made of a metal alloy and an amorphous titanium-zirconium-boron film deposited on a surface of the conical body.
Abstract translation: 具有改善的抗疲劳性的牙髓质文件包括由金属合金制成的圆锥体和沉积在锥体的表面上的无定形钛 - 锆 - 硼薄膜。
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公开(公告)号：US09484198B1
公开(公告)日：2016-11-01
申请号：US14687474
申请日：2015-04-15
Applicant: Ming Chi University of Technology
Inventor： Chen-Te Chang , Yung-Chin Yang , Jyh-Wei Lee
IPC: H01L21/02
CPC classification number: C23C14/0617 , C23C14/0036 , C23C14/345 , C23C14/3485
Abstract: A method for physical vapor deposition of an aluminum nitride film, comprising: positioning a substrate and an aluminum target in a chamber; vacuuming the chamber so that a chamber pressure is at a base pressure between 7.1×10−7-5×10−6 torr; conducting a working gas composed of argon gas and nitrogen gas into the chamber so that the chamber pressure is at a working pressure between 3-7 mtorr; and depositing the aluminum nitride film on the substrate by applying a high power impulse power supply to the aluminum target and applying a direct current bias power supply to the substrate under the working pressure and a substrate temperature between room temperature (25° C.) to 200° C.; wherein a power of the high power impulse power supply is between 500-600 W and a frequency thereof is between 750-1250 Hz, and a bias of the direct current bias power supply is between −50-0 V.
Abstract translation: 一种用于氮化铝膜的物理气相沉积的方法，包括：将基底和铝靶定位在腔室中; 对腔室进行抽真空，使得腔室压力在7.1×10-7-5×10-6乇之间的基础压力; 将由氩气和氮气组成的工作气体引入室中，使得室压力在3-7mtorr之间的工作压力; 以及通过向铝靶施加大功率脉冲电源并在工作压力和基板温度（室温（25℃）至+ 25℃）之间向衬底施加直流偏压电源，将氮化铝膜沉积在衬底上 200°C。 其中高功率脉冲电源的功率在500-600W之间，其频率在750-1250Hz之间，直流偏置电源的偏压在-50-0V之间。
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公开(公告)号：US20160307749A1
公开(公告)日：2016-10-20
申请号：US14687474
申请日：2015-04-15
Applicant: Ming Chi University of Technology
Inventor： Chen-Te Chang , Yung-Chin Yang , Jyh-Wei Lee
IPC: H01L21/02
CPC classification number: C23C14/0617 , C23C14/0036 , C23C14/345 , C23C14/3485
Abstract: A method for physical vapor deposition of an aluminum nitride film, comprising: positioning a substrate and an aluminum target in a chamber; vacuuming the chamber so that a chamber pressure is at a base pressure between 7.1×10−7-5×10−6 torr; conducting a working gas composed of argon gas and nitrogen gas into the chamber so that the chamber pressure is at a working pressure between 3-7 mtorr; and depositing the aluminum nitride film on the substrate by applying a high power impulse power supply to the aluminum target and applying a direct current bias power supply to the substrate under the working pressure and a substrate temperature between room temperature (25° C.) to 200° C.; wherein a power of the high power impulse power supply is between 500-600 W and a frequency thereof is between 750-1250 Hz, and a bias of the direct current bias power supply is between −50-0 V.
Abstract translation: 一种用于氮化铝膜的物理气相沉积的方法，包括：将基底和铝靶定位在腔室中; 对腔室进行抽真空，使得腔室压力在7.1×10-7-5×10-6乇之间的基础压力; 将由氩气和氮气组成的工作气体引入室中，使得室压力在3-7mtorr之间的工作压力; 以及通过向铝靶施加大功率脉冲电源并在工作压力和基板温度（室温（25℃）至+ 25℃）之间向衬底施加直流偏压电源，将氮化铝膜沉积在衬底上 200°C。 其中高功率脉冲电源的功率在500-600W之间，其频率在750-1250Hz之间，直流偏置电源的偏压在-50-0V之间。
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