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公开(公告)号：US11119395B2
公开(公告)日：2021-09-14
申请号：US16031406
申请日：2018-07-10
Applicant: Mitutoyo Corporation
Inventor： Ryusuke Kato , Eisuke Moriuchi
Abstract: An image pickup apparatus that is capable of improving measurement accuracy and measurement workability of an optical measurement apparatus, an optical measurement apparatus including the image pickup apparatus, and a measurement system. An image pickup apparatus according to an embodiment includes a base section, a beam splitter, and an image pickup section. The base is configured to detachably attach to an optical measurement apparatus including an optical projection system configured to project an image of a subject on a screen. The beam splitter is disposed on an optical axis of the optical projection system upon attachment of the base to the optical measurement apparatus. The image pickup circuitry includes an image pickup device configured to receive light generated through splitting at the beam splitter and is configured to take an image of the subject upon attachment of the base.
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公开(公告)号：US09989356B2
公开(公告)日：2018-06-05
申请号：US14197715
申请日：2014-03-05
Applicant: MITUTOYO CORPORATION
Inventor： Masaoki Yamagata , Kentaro Nemoto , Eisuke Moriuchi , Tadashi Iwamoto
CPC classification number: G01B11/24 , G01B11/005 , G01B11/25
Abstract: A shape measuring apparatus includes: an irradiating part configured to irradiate work with a linear line laser, the irradiating part including: a light source configured to produce laser light; a first optical member configured to linearly spread the laser light from the light source and generate the line laser; and a second optical member, provided between the light source and the first optical member, configured to adjust an area of irradiation with a line laser on the work; a first sensor configured to receive a line laser reflected by the work and capture an image of the work; a lens configured to form an image of a line laser reflected by the work on an imaging surface of the first sensor; and a control part configured to control adjustment of the area of irradiation with the line laser on the work by the second optical member.
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Patent Agency Ranking
公开(公告)号：US09733464B2
公开(公告)日：2017-08-15
申请号：US14718349
申请日：2015-05-21
Applicant: MITUTOYO CORPORATION
Inventor： Eisuke Moriuchi , Tatsuya Nagahama , Yuko Shishido
CPC classification number: G02B21/244 , G02B7/34 , G02B7/38 , G02B21/245
Abstract: A focus detection unit to adjust a focal point of an image, of an object, formed by an optical system includes a first output section, a second output section, and a projection optical system. The first output section includes a first light modulation element configured to generate a first pattern image based on incident light and is configured to output the generated first pattern image. The second output section includes a second light modulation element configured to generate a second pattern image based on incident light and is configured to output the generated second pattern image. The projection optical system is configured to project the output first pattern image and the output second pattern image such that the output first pattern image and the output second pattern image have a predetermined positional relationship at an in-focus position of the optical system.
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公开(公告)号：US10852128B2
公开(公告)日：2020-12-01
申请号：US14184132
申请日：2014-02-19
Applicant: MITUTOYO CORPORATION
Inventor： Masaoki Yamagata , Kentaro Nemoto , Eisuke Moriuchi , Tadashi Iwamoto
Abstract: A shape measuring apparatus includes a first light source, a second light source, an optical system, an image capturer, and a controller. The first light source emits visible light. The second light source emits measurement light used in a measurement. The optical system emits the visible light and the measurement light at the same position on a work piece. The image capturer captures an image of the measurement light reflected by the work piece. The controller is configured to cause the emission of the visible light onto the work piece with the first light source when determining a measurement position, and to control the emission of the measurement light onto the work piece with the second light source when making the measurement.
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公开(公告)号：US20190011823A1
公开(公告)日：2019-01-10
申请号：US16031406
申请日：2018-07-10
Applicant: Mitutoyo Corporation
Inventor： Ryusuke KATO , Eisuke Moriuchi
Abstract: An image pickup apparatus that is capable of improving measurement accuracy and measurement workability of an optical measurement apparatus, an optical measurement apparatus including the image pickup apparatus, and a measurement system. An image pickup apparatus according to an embodiment includes a base section, a beam splitter, and an image pickup section. The base is configured to detachably attach to an optical measurement apparatus including an optical projection system configured to project an image of a subject on a screen. The beam splitter is disposed on an optical axis of the optical projection system upon attachment of the base to the optical measurement apparatus. The image pickup circuitry includes an image pickup device configured to receive light generated through splitting at the beam splitter and is configured to take an image of the subject upon attachment of the base.
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公开(公告)号：US10030970B2
公开(公告)日：2018-07-24
申请号：US14947368
申请日：2015-11-20
Applicant: MITUTOYO CORPORATION
Inventor： Yukimasa Nishio , Toshikazu Iwata , Eisuke Moriuchi
Abstract: An image measuring apparatus includes a sample stage having a placement surface on which an object to be measured is placed; an image capture apparatus facing the placement surface of the sample stage and capturing an image of the object to be measured; and a pattern projection apparatus projecting a predetermined pattern onto the sample stage, the predetermined pattern providing a reference for at least one of a placement position and direction of the object to be measured on the placement surface.
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公开(公告)号：US09255792B2
公开(公告)日：2016-02-09
申请号：US14612467
申请日：2015-02-03
Applicant: MITUTOYO CORPORATION
Inventor： Kentaro Nemoto , Masaoki Yamagata , Eisuke Moriuchi , Tadashi Iwamoto
CPC classification number: G01B11/30 , G01B11/026 , G01B11/24 , G02B1/11 , G02B5/003 , G02B27/0018
Abstract: An optical probe includes a probe cover, within which is installed an optical system having an illuminating optical system and a receiving optical system. An emitting region and an incidence region through which light passes are provided to a bottom surface of the probe cover, the bottom surface forming an opposing region opposite a work piece. The bottom surface forms a surface where, of the light reflected from the work piece, light following a direct reflection direction is reflected in a direction moving away from the incidence region, from a position where light emitted from the emitting region is emitted at the work piece. Accordingly, an amount of second order reflected light striking the incidence region can be suppressed and, therefore, an occurrence of an erroneous value in received light distribution can be suppressed.
Abstract translation: 光探头包括探针盖，在其中安装有具有照明光学系统和接收光学系统的光学系统。 发光区域和光通过的入射区域被提供到探针盖的底表面，底面形成与工件相对的相对区域。 底表面形成一个表面，其中从工件反射的光，沿着直接反射方向的光沿着从入射区域移开的方向从在发光区域发射的光在工作中发射的位置被反射 片。 因此，可以抑制入射入射区域的二次反射光的量，因此能够抑制接收光分布中的错误值的发生。
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